Low refractive index surface layers and related methods
Abstract
The disclosure relates to a method for forming a low refractive index layer on a substrate. The method generally includes (a) applying a block copolymer layer on a substrate, the block copolymer including a polar polymeric block and a non-polar polymeric block; (b) swelling the block copolymer layer with a solvent to increase the block copolymer layer thickness; (c) depositing a metal oxide or metalloid oxide layer on polar polymeric blocks of the block copolymer layer; and (d) removing the block copolymer layer from the substrate, thereby forming a porous metal oxide or metalloid oxide layer on the substrate.
- Inventors:
- Issue Date:
- Research Org.:
- Argonne National Laboratory (ANL), Argonne, IL (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 2222150
- Patent Number(s):
- 11725275
- Application Number:
- 15/649,448
- Assignee:
- UChicago Argonne, LLC (Chicago, IL)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- DOE Contract Number:
- AC02-06CH11357
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 07/13/2017
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Shevchenko, Elena, Berman, Diana, and Guha, Supratik. Low refractive index surface layers and related methods. United States: N. p., 2023.
Web.
Shevchenko, Elena, Berman, Diana, & Guha, Supratik. Low refractive index surface layers and related methods. United States.
Shevchenko, Elena, Berman, Diana, and Guha, Supratik. Tue .
"Low refractive index surface layers and related methods". United States. https://www.osti.gov/servlets/purl/2222150.
@article{osti_2222150,
title = {Low refractive index surface layers and related methods},
author = {Shevchenko, Elena and Berman, Diana and Guha, Supratik},
abstractNote = {The disclosure relates to a method for forming a low refractive index layer on a substrate. The method generally includes (a) applying a block copolymer layer on a substrate, the block copolymer including a polar polymeric block and a non-polar polymeric block; (b) swelling the block copolymer layer with a solvent to increase the block copolymer layer thickness; (c) depositing a metal oxide or metalloid oxide layer on polar polymeric blocks of the block copolymer layer; and (d) removing the block copolymer layer from the substrate, thereby forming a porous metal oxide or metalloid oxide layer on the substrate.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2023},
month = {8}
}
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