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Title: Apparatus and method for producing a crystalline film on a substrate surface

Abstract

An apparatus and method is provided for coating a surface of a material with a film of porous coordination polymer. A first substrate having a first surface to be coated is positioned in a processing chamber such that the first surface is placed in a substantially opposing relationship to a second surface. In some embodiments, the second surface is provided by a wall of the processing chamber, and in other embodiments the second surface is provided by a second substrate to be coated. The first substrate is held such that a gap exists between the first and second surfaces, and the gap is filled with at least one reaction mixture comprising reagents sufficient to form the crystalline film on at least the first surface. A thin gap (e.g., having a thickness less than 2 mm) between the first and second surfaces is effective for producing a high quality film having a thickness less than 100 μm. Confining the volume of the reaction mixture to a thin layer adjacent the substrate surface significantly reduces problems with sedimentation and concentration control. In some embodiments, the size, shape, or average thickness of the gap is adjusted during formation of the film in responsemore » to feedback from at least one film growth monitor.

Inventors:
; ;
Issue Date:
Research Org.:
Matrix Sensors, Inc., San Diego, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1998354
Patent Number(s):
11643751
Application Number:
17/198,204
Assignee:
Matrix Sensors, Inc. (San Diego, CA)
DOE Contract Number:  
AR0000933
Resource Type:
Patent
Resource Relation:
Patent File Date: 03/10/2021
Country of Publication:
United States
Language:
English

Citation Formats

Britt, David K., Wilkinson, Paul R., and Yamamoto, Steven. Apparatus and method for producing a crystalline film on a substrate surface. United States: N. p., 2023. Web.
Britt, David K., Wilkinson, Paul R., & Yamamoto, Steven. Apparatus and method for producing a crystalline film on a substrate surface. United States.
Britt, David K., Wilkinson, Paul R., and Yamamoto, Steven. Tue . "Apparatus and method for producing a crystalline film on a substrate surface". United States. https://www.osti.gov/servlets/purl/1998354.
@article{osti_1998354,
title = {Apparatus and method for producing a crystalline film on a substrate surface},
author = {Britt, David K. and Wilkinson, Paul R. and Yamamoto, Steven},
abstractNote = {An apparatus and method is provided for coating a surface of a material with a film of porous coordination polymer. A first substrate having a first surface to be coated is positioned in a processing chamber such that the first surface is placed in a substantially opposing relationship to a second surface. In some embodiments, the second surface is provided by a wall of the processing chamber, and in other embodiments the second surface is provided by a second substrate to be coated. The first substrate is held such that a gap exists between the first and second surfaces, and the gap is filled with at least one reaction mixture comprising reagents sufficient to form the crystalline film on at least the first surface. A thin gap (e.g., having a thickness less than 2 mm) between the first and second surfaces is effective for producing a high quality film having a thickness less than 100 μm. Confining the volume of the reaction mixture to a thin layer adjacent the substrate surface significantly reduces problems with sedimentation and concentration control. In some embodiments, the size, shape, or average thickness of the gap is adjusted during formation of the film in response to feedback from at least one film growth monitor.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2023},
month = {5}
}

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