Ion beam profiling system and related methods
Abstract
An ion beam profiling system include a beam profiling element, an ion sensitive element electrically isolated from the beam profiling element, an ion source configured to emit an ion beam at the beam profiling element and the ion sensitive element, and a current measuring device coupled to the ion sensitive element. The beam profiling element includes a plate of material having two parallel major surfaces, a first slit aperture extending through the plate of material and having a first longitudinal length extending in a direction parallel to the two parallel major surfaces, and a second slit aperture extending through the plate of material and having a second longitudinal length extending in a direction parallel to the two parallel major surfaces, wherein the first longitudinal length of the first slit aperture is perpendicular to the second longitudinal length of the second slit aperture.
- Inventors:
- Issue Date:
- Research Org.:
- Idaho National Laboratory (INL), Idaho Falls, ID (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1987203
- Patent Number(s):
- 11598890
- Application Number:
- 16/946,344
- Assignee:
- Battelle Energy Alliance, LLC (Idaho Falls, ID)
- Patent Classifications (CPCs):
-
G - PHYSICS G01 - MEASURING G01T - MEASUREMENT OF NUCLEAR OR X-RADIATION
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- DOE Contract Number:
- AC07-05ID14517
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 06/17/2020
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Taylor, Chase N. Ion beam profiling system and related methods. United States: N. p., 2023.
Web.
Taylor, Chase N. Ion beam profiling system and related methods. United States.
Taylor, Chase N. Tue .
"Ion beam profiling system and related methods". United States. https://www.osti.gov/servlets/purl/1987203.
@article{osti_1987203,
title = {Ion beam profiling system and related methods},
author = {Taylor, Chase N.},
abstractNote = {An ion beam profiling system include a beam profiling element, an ion sensitive element electrically isolated from the beam profiling element, an ion source configured to emit an ion beam at the beam profiling element and the ion sensitive element, and a current measuring device coupled to the ion sensitive element. The beam profiling element includes a plate of material having two parallel major surfaces, a first slit aperture extending through the plate of material and having a first longitudinal length extending in a direction parallel to the two parallel major surfaces, and a second slit aperture extending through the plate of material and having a second longitudinal length extending in a direction parallel to the two parallel major surfaces, wherein the first longitudinal length of the first slit aperture is perpendicular to the second longitudinal length of the second slit aperture.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2023},
month = {3}
}
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