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Title: Ultra-hard carbon film from epitaxial two-layer graphene

Abstract

An ultra-hard carbon film is formed by the uniaxial compression of thin films of graphene. The graphene films are two or three layers thick (2-L or 3-L). High pressure compression forms a diamond-like film and provides improved properties to the coated substrates.

Inventors:
; ; ; ;
Issue Date:
Research Org.:
City Univ. of New York (CUNY), NY (United States); New York Univ. (NYU), NY (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1987173
Patent Number(s):
11591716
Application Number:
16/757,306
Assignee:
Research Foundation of the City University of New York (New York, NY); New York University (New York, NY)
DOE Contract Number:  
SC0016204
Resource Type:
Patent
Resource Relation:
Patent File Date: 10/22/2018
Country of Publication:
United States
Language:
English

Citation Formats

Gao, Yang, Cao, Tengfei, Cellini, Filippo, Riedo, Elisa, and Bongiorno, Angelo. Ultra-hard carbon film from epitaxial two-layer graphene. United States: N. p., 2023. Web.
Gao, Yang, Cao, Tengfei, Cellini, Filippo, Riedo, Elisa, & Bongiorno, Angelo. Ultra-hard carbon film from epitaxial two-layer graphene. United States.
Gao, Yang, Cao, Tengfei, Cellini, Filippo, Riedo, Elisa, and Bongiorno, Angelo. Tue . "Ultra-hard carbon film from epitaxial two-layer graphene". United States. https://www.osti.gov/servlets/purl/1987173.
@article{osti_1987173,
title = {Ultra-hard carbon film from epitaxial two-layer graphene},
author = {Gao, Yang and Cao, Tengfei and Cellini, Filippo and Riedo, Elisa and Bongiorno, Angelo},
abstractNote = {An ultra-hard carbon film is formed by the uniaxial compression of thin films of graphene. The graphene films are two or three layers thick (2-L or 3-L). High pressure compression forms a diamond-like film and provides improved properties to the coated substrates.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2023},
month = {2}
}

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