Systems and methods of electron beam induced processing
Abstract
Embodiments of the present disclosure provide for methods and systems for making structures using an electrospray system while under vacuum. In particular, embodiments of the present disclosure provide for methods and systems for ultra-fast growth of high aspect ratio nano/meso/micro-structures with three dimensional topological complexity and control of phase and composition of the structure formed.
- Inventors:
- Issue Date:
- Research Org.:
- Georgia Institute of Technology, Atlanta, GA (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- OSTI Identifier:
- 1987157
- Patent Number(s):
- 11583875
- Application Number:
- 17/223,620
- Assignee:
- Georgia Tech Research Corporation (Atlanta, GA)
- DOE Contract Number:
- SC0010729
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 04/06/2021
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Fedorov, Andrei G. Systems and methods of electron beam induced processing. United States: N. p., 2023.
Web.
Fedorov, Andrei G. Systems and methods of electron beam induced processing. United States.
Fedorov, Andrei G. Tue .
"Systems and methods of electron beam induced processing". United States. https://www.osti.gov/servlets/purl/1987157.
@article{osti_1987157,
title = {Systems and methods of electron beam induced processing},
author = {Fedorov, Andrei G.},
abstractNote = {Embodiments of the present disclosure provide for methods and systems for making structures using an electrospray system while under vacuum. In particular, embodiments of the present disclosure provide for methods and systems for ultra-fast growth of high aspect ratio nano/meso/micro-structures with three dimensional topological complexity and control of phase and composition of the structure formed.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2023},
month = {2}
}
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