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Title: Mitigation of the harmful effects of stray-light reflections in high-energy laser systems

Abstract

Reduction or elimination of negative consequences of reflected stray light from lens surfaces is achieved by propagating a laser beam through an eccentric pupil that excludes the optical axis of the system, which is rotationally symmetric. In such systems, stray light reflections eventually are focused onto the unique optical axis of the system, in either a real or virtual focal region. By using an eccentric pupil, all damage due to focusing of the stray light lies outside of the beam. These focal regions can, e.g., be physically blocked to eliminate beam paths that lead to optical damage, re-pulse beams and parasitic lasing.

Inventors:
;
Issue Date:
Research Org.:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1986785
Patent Number(s):
11493756
Application Number:
16/603,774
Assignee:
Lawrence Livermore National Security, LLC (Livermore, CA)
DOE Contract Number:  
AC52-07NA27344
Resource Type:
Patent
Resource Relation:
Patent File Date: 04/19/2018
Country of Publication:
United States
Language:
English

Citation Formats

Seppala, Lynn G., and Erlandson, Alvin C. Mitigation of the harmful effects of stray-light reflections in high-energy laser systems. United States: N. p., 2022. Web.
Seppala, Lynn G., & Erlandson, Alvin C. Mitigation of the harmful effects of stray-light reflections in high-energy laser systems. United States.
Seppala, Lynn G., and Erlandson, Alvin C. Tue . "Mitigation of the harmful effects of stray-light reflections in high-energy laser systems". United States. https://www.osti.gov/servlets/purl/1986785.
@article{osti_1986785,
title = {Mitigation of the harmful effects of stray-light reflections in high-energy laser systems},
author = {Seppala, Lynn G. and Erlandson, Alvin C.},
abstractNote = {Reduction or elimination of negative consequences of reflected stray light from lens surfaces is achieved by propagating a laser beam through an eccentric pupil that excludes the optical axis of the system, which is rotationally symmetric. In such systems, stray light reflections eventually are focused onto the unique optical axis of the system, in either a real or virtual focal region. By using an eccentric pupil, all damage due to focusing of the stray light lies outside of the beam. These focal regions can, e.g., be physically blocked to eliminate beam paths that lead to optical damage, re-pulse beams and parasitic lasing.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2022},
month = {11}
}

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illumination Optical Unit for a Metrology System and Metrology System Comprising Such an Illumination Optical Unit
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