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Title: System and methods for fabricating boron nitride nanostructures

Abstract

This disclosure provides systems, methods, and apparatus related to boron nitride nanomaterials. In one aspect, a method includes generating a directed flow of plasma. A boron-containing species is introduced to the directed flow of the plasma. Boron nitride nanostructures are formed in a chamber. In another aspect, a method includes generating a directed flow of plasma using nitrogen gas. A boron-containing species is introduced to the directed flow of the plasma. The boron-containing species can consist of boron powder, boron nitride powder, and/or boron oxide powder. Boron nitride nanostructures are formed in a chamber, with a pressure in the chamber being about 3 atmospheres or greater.

Inventors:
; ; ;
Issue Date:
Research Org.:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE; National Science Foundation (NSF)
OSTI Identifier:
1892981
Patent Number(s):
11345595
Application Number:
15/321,177
Assignee:
The Regents of the University of California (Oakland, CA)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
DOE Contract Number:  
AC02-05CH11231; EEC-0832819
Resource Type:
Patent
Resource Relation:
Patent File Date: 06/24/2015
Country of Publication:
United States
Language:
English

Citation Formats

Fathalizadeh, Aidin, Pham, Thang, Mickelson, William, and Zettl, Alexander K. System and methods for fabricating boron nitride nanostructures. United States: N. p., 2022. Web.
Fathalizadeh, Aidin, Pham, Thang, Mickelson, William, & Zettl, Alexander K. System and methods for fabricating boron nitride nanostructures. United States.
Fathalizadeh, Aidin, Pham, Thang, Mickelson, William, and Zettl, Alexander K. Tue . "System and methods for fabricating boron nitride nanostructures". United States. https://www.osti.gov/servlets/purl/1892981.
@article{osti_1892981,
title = {System and methods for fabricating boron nitride nanostructures},
author = {Fathalizadeh, Aidin and Pham, Thang and Mickelson, William and Zettl, Alexander K.},
abstractNote = {This disclosure provides systems, methods, and apparatus related to boron nitride nanomaterials. In one aspect, a method includes generating a directed flow of plasma. A boron-containing species is introduced to the directed flow of the plasma. Boron nitride nanostructures are formed in a chamber. In another aspect, a method includes generating a directed flow of plasma using nitrogen gas. A boron-containing species is introduced to the directed flow of the plasma. The boron-containing species can consist of boron powder, boron nitride powder, and/or boron oxide powder. Boron nitride nanostructures are formed in a chamber, with a pressure in the chamber being about 3 atmospheres or greater.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2022},
month = {5}
}

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