Title: System and method for sub micron additive manufacturing

Abstract

An apparatus is disclosed for performing an additive manufacturing operation to form a structure by processing a photopolymer resist material. The apparatus may incorporate a laser for generating a laser beam, and a tunable mask for receiving the laser beam which has an optically dispersive element. The mask splits the laser beam into a plurality of emergent beams each having a subplurality of beamlets of varying or identical intensity, with each beamlet emerging from a unique subsection of illuminated regions of the mask. A collimator collimates at least one of the emergent beams to form a collimated beam. One or more focusing elements focuses the collimated beam into a focused beam which is projected as a focused image plane on or within the resist material. The focused beam simultaneously illuminates a layer of the resist material to process an entire layer in a parallel fashion.

Inventors:

Saha, Sourabh Kumar; Panas, Robert Matthew; Chen, Shih-Chi

Issue Date:

2022-04-26

Research Org.:

Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)

Sponsoring Org.:

USDOE

OSTI Identifier:

1892864

Patent Number(s):

11312067

Application Number:

15/857,917

Assignee:

Lawrence Livermore National Security, LLC (Livermore, CA)

Patent Classifications (CPCs):

B - PERFORMING OPERATIONS B29 - WORKING OF PLASTICS B29C - SHAPING OR JOINING OF PLASTICS

B - PERFORMING OPERATIONS B33 - ADDITIVE MANUFACTURING TECHNOLOGY B33Y - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING

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B - PERFORMING OPERATIONS B29 - WORKING OF PLASTICS B29C - SHAPING OR JOINING OF PLASTICS

B29C64/135 - the energy source being concentrated, e.g. scanning lasers or focused light sources
B29C64/268 - using laser beams
B29C64/273 - pulsed
B29C64/277 - using multiple radiation means, e.g. micromirrors or multiple light-emitting diodes [LED]
B29C64/286 - Optical filters, e.g. masks
B29C64/393 - for controlling or regulating additive manufacturing processes

B - PERFORMING OPERATIONS B33 - ADDITIVE MANUFACTURING TECHNOLOGY B33Y - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING

B33Y10/00 - Processes of additive manufacturing
B33Y30/00 - Apparatus for additive manufacturing

G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS

G02B26/0833 - {the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
G02B27/285 - {comprising arrays of elements, e.g. microprisms}

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

G03F7/70258 - {Projection system adjustment, alignment during assembly of projection system
G03F7/70291 - {Addressable masks}
G03F7/70508 - {Data handling, in all parts of the microlithographic apparatus, e.g. addressable masks}
G03F7/7085 - {Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load}

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DOE Contract Number:  

AC52-07NA27344

Resource Type:

Patent

Resource Relation:

Patent File Date: 12/29/2017

Country of Publication:

United States

Language:

English