Steep slope transistors with threshold switching devices
Abstract
A steep-slope (SS) field effect transistor (FET) including a FET having a source region and a drain region, and a threshold switching device in direct contact with the source region or the drain region of the FET. Fabricating the steep-slope (SS) field effect transistor (FET) includes fabricating an AlGaN/GaN metal-insulator-semiconductor high electron mobility transistor (MIS-HEMT) having a source region and a drain region, depositing a first electrode layer directly on the source region or the drain region, depositing a threshold switching layer directly on the first electrode layer, and depositing a second electrode layer directly on the threshold switching layer.
- Inventors:
- Issue Date:
- Research Org.:
- Arizona State Univ., Scottsdale, AZ (United States)
- Sponsoring Org.:
- USDOE; National Aeronautics and Space Administration (NASA)
- OSTI Identifier:
- 1860130
- Patent Number(s):
- 11189717
- Application Number:
- 16/739,333
- Assignee:
- Arizona Board of Regents on Behalf of the Arizona State University (Scottsdale, AZ)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
- DOE Contract Number:
- 80NSSC 17K0768; AR0000868
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 01/10/2020
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Huang, Xuanqi, Zhao, Yuji, Fang, Runchen, and Barnaby, Hugh James. Steep slope transistors with threshold switching devices. United States: N. p., 2021.
Web.
Huang, Xuanqi, Zhao, Yuji, Fang, Runchen, & Barnaby, Hugh James. Steep slope transistors with threshold switching devices. United States.
Huang, Xuanqi, Zhao, Yuji, Fang, Runchen, and Barnaby, Hugh James. Tue .
"Steep slope transistors with threshold switching devices". United States. https://www.osti.gov/servlets/purl/1860130.
@article{osti_1860130,
title = {Steep slope transistors with threshold switching devices},
author = {Huang, Xuanqi and Zhao, Yuji and Fang, Runchen and Barnaby, Hugh James},
abstractNote = {A steep-slope (SS) field effect transistor (FET) including a FET having a source region and a drain region, and a threshold switching device in direct contact with the source region or the drain region of the FET. Fabricating the steep-slope (SS) field effect transistor (FET) includes fabricating an AlGaN/GaN metal-insulator-semiconductor high electron mobility transistor (MIS-HEMT) having a source region and a drain region, depositing a first electrode layer directly on the source region or the drain region, depositing a threshold switching layer directly on the first electrode layer, and depositing a second electrode layer directly on the threshold switching layer.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Nov 30 00:00:00 EST 2021},
month = {Tue Nov 30 00:00:00 EST 2021}
}
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