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Title: Light scattering structures for thin-film solar cells and methods of making the same

Abstract

The present disclosure relates to a method that includes contacting a surface of a first layer that includes a Group III element and a Group V element with a gas that includes HCl, where the first layer is positioned in thermal contact with a wafer positioned in a chamber of a reactor, and the contacting results in a roughening of the surface.

Inventors:
; ;
Issue Date:
Research Org.:
National Renewable Energy Laboratory (NREL), Golden, CO (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1860078
Patent Number(s):
11177402
Application Number:
16/565,827
Assignee:
Alliance for Sustainable Energy, LLC (Golden, CO)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE Y02E - REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
DOE Contract Number:  
AC36-08GO28308
Resource Type:
Patent
Resource Relation:
Patent File Date: 09/10/2019
Country of Publication:
United States
Language:
English

Citation Formats

Ptak, Aaron Joseph, Schulte, Kevin Louis, and Simon, John David. Light scattering structures for thin-film solar cells and methods of making the same. United States: N. p., 2021. Web.
Ptak, Aaron Joseph, Schulte, Kevin Louis, & Simon, John David. Light scattering structures for thin-film solar cells and methods of making the same. United States.
Ptak, Aaron Joseph, Schulte, Kevin Louis, and Simon, John David. Tue . "Light scattering structures for thin-film solar cells and methods of making the same". United States. https://www.osti.gov/servlets/purl/1860078.
@article{osti_1860078,
title = {Light scattering structures for thin-film solar cells and methods of making the same},
author = {Ptak, Aaron Joseph and Schulte, Kevin Louis and Simon, John David},
abstractNote = {The present disclosure relates to a method that includes contacting a surface of a first layer that includes a Group III element and a Group V element with a gas that includes HCl, where the first layer is positioned in thermal contact with a wafer positioned in a chamber of a reactor, and the contacting results in a roughening of the surface.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2021},
month = {11}
}

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