DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Optically enhanced patternable photosensitivity via oxygen excitation

Abstract

The present disclosure relates to a method for performing a three dimensional (3D) printing process. A primary light beam having a wavelength sufficient to initiate polymerization of a photoresin is generated and patterned into a patterned primary beam. The patterned primary beam is directed toward an ultraviolet (UV) or visible light sensitive photoresin to initiate polymerization of select areas of the photoresin. The photoresin is also illuminated with a secondary light beam having a wavelength of at least one of about 765 nm, 1064 nm, or 1273 nm. The secondary light beam stimulates triplet oxygen into singlet oxygen, which controls oxygen inhibition in additional areas bordering the select areas, to enable controlled polymerization inhibition in the additional areas bordering the select areas.

Inventors:
;
Issue Date:
Research Org.:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1840435
Patent Number(s):
11117361
Application Number:
16/844,669
Assignee:
Lawrence Livermore National Security, LLC (Livermore, CA)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B29 - WORKING OF PLASTICS B29C - SHAPING OR JOINING OF PLASTICS
B - PERFORMING OPERATIONS B33 - ADDITIVE MANUFACTURING TECHNOLOGY B33Y - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
DOE Contract Number:  
AC52-07NA27344
Resource Type:
Patent
Resource Relation:
Patent File Date: 04/09/2020
Country of Publication:
United States
Language:
English

Citation Formats

Hensleigh, Ryan, and Duoss, Eric B. Optically enhanced patternable photosensitivity via oxygen excitation. United States: N. p., 2021. Web.
Hensleigh, Ryan, & Duoss, Eric B. Optically enhanced patternable photosensitivity via oxygen excitation. United States.
Hensleigh, Ryan, and Duoss, Eric B. Tue . "Optically enhanced patternable photosensitivity via oxygen excitation". United States. https://www.osti.gov/servlets/purl/1840435.
@article{osti_1840435,
title = {Optically enhanced patternable photosensitivity via oxygen excitation},
author = {Hensleigh, Ryan and Duoss, Eric B.},
abstractNote = {The present disclosure relates to a method for performing a three dimensional (3D) printing process. A primary light beam having a wavelength sufficient to initiate polymerization of a photoresin is generated and patterned into a patterned primary beam. The patterned primary beam is directed toward an ultraviolet (UV) or visible light sensitive photoresin to initiate polymerization of select areas of the photoresin. The photoresin is also illuminated with a secondary light beam having a wavelength of at least one of about 765 nm, 1064 nm, or 1273 nm. The secondary light beam stimulates triplet oxygen into singlet oxygen, which controls oxygen inhibition in additional areas bordering the select areas, to enable controlled polymerization inhibition in the additional areas bordering the select areas.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2021},
month = {9}
}

Works referenced in this record:

Additive Manufacturing with Laser and Gas Flow
patent-application, June 2017


Photochemical method to eliminate oxygen inhibition of free radical polymerizations
patent-application, August 2004


Direct 765 nm Optical Excitation of Molecular Oxygen in Solution and in Single Mammalian Cells
journal, April 2015


Stereolithographic Object, Product, and Method of Manufacturing Product
patent-application, May 2018


Fabrication of a polymeric prosthetic implant
patent-application, November 2002


Three Dimensional Printing Adhesion Reduction Using Photoinhibition
patent-application, March 2016


A comparison of rapid prototyping technologies
journal, October 1998


Additive Manufacturing Apparatus, Processing Device, and Additive Manufacturing Method
patent-application, September 2018


Direct write and freeform fabrication apparatus and method
patent-application, December 2005


Scanner Device and Device for Measuring Three-Dimensional Shape of Object
patent-application, March 2013


Design and optimization of a light-emitting diode projection micro-stereolithography three-dimensional manufacturing system
journal, December 2012


Dual Cure Article of Manufacture with Portions of Differing Solubility
patent-application, May 2017


Optical fabricating method and apparatus
patent-application, January 2003


Rate Constants for the Decay and Reactions of the Lowest Electronically Excited Singlet State of Molecular Oxygen in Solution. An Expanded and Revised Compilation
journal, March 1995


Resin composition for stereolithography
patent, December 1998


Process for adjusting the sensitivity to radiation of photopolymerizable compositions
patent, November 1996


Strategies to Reduce Oxygen Inhibition in Photoinduced Polymerization
journal, September 2013


Additive Manufacturing with Laser and Plasma
patent-application, July 2017


Continuous and Scalable 3D Nanoprinting
patent-application, January 2018


Polymerizable Composition for Stereolithography
patent-application, August 2015