Isotropic etchback method of linewidth tailoring multilayer dielectric diffraction gratings for improvement of laser damage resistance and diffraction efficiency
Abstract
A method of fabricating a multilayer dielectric (MLD) diffraction grating by providing a multilayer stack having a grating layer, and anisotropically etching the grating layer to form grating lines having an initial lineheight, an initial linewidth, and an initial grating duty cycle, that are greater than a target lineheight, a target linewidth, and a target grating duty cycle, respectively. An isotropic wet etch solution is then used to etch back the grating lines to the target lineheight, the target linewidth, and the target grating duty cycle so as to minimize electric field intensities and maximize diffraction efficiency for a given set of MLD illumination conditions.
- Inventors:
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1840316
- Patent Number(s):
- 11079543
- Application Number:
- 13/244,033
- Assignee:
- Lawrence Livermore National Security, LLC (Livermore, CA)
- Patent Classifications (CPCs):
-
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01S - DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT
- DOE Contract Number:
- AC52-07NA27344
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 09/23/2011
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Britten, Jerald A., Larson, Cindy C., and Nguyen, Hoang K. Isotropic etchback method of linewidth tailoring multilayer dielectric diffraction gratings for improvement of laser damage resistance and diffraction efficiency. United States: N. p., 2021.
Web.
Britten, Jerald A., Larson, Cindy C., & Nguyen, Hoang K. Isotropic etchback method of linewidth tailoring multilayer dielectric diffraction gratings for improvement of laser damage resistance and diffraction efficiency. United States.
Britten, Jerald A., Larson, Cindy C., and Nguyen, Hoang K. Tue .
"Isotropic etchback method of linewidth tailoring multilayer dielectric diffraction gratings for improvement of laser damage resistance and diffraction efficiency". United States. https://www.osti.gov/servlets/purl/1840316.
@article{osti_1840316,
title = {Isotropic etchback method of linewidth tailoring multilayer dielectric diffraction gratings for improvement of laser damage resistance and diffraction efficiency},
author = {Britten, Jerald A. and Larson, Cindy C. and Nguyen, Hoang K.},
abstractNote = {A method of fabricating a multilayer dielectric (MLD) diffraction grating by providing a multilayer stack having a grating layer, and anisotropically etching the grating layer to form grating lines having an initial lineheight, an initial linewidth, and an initial grating duty cycle, that are greater than a target lineheight, a target linewidth, and a target grating duty cycle, respectively. An isotropic wet etch solution is then used to etch back the grating lines to the target lineheight, the target linewidth, and the target grating duty cycle so as to minimize electric field intensities and maximize diffraction efficiency for a given set of MLD illumination conditions.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2021},
month = {8}
}
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Works referenced in this record:
Piezoelectric transducer and process for its production
patent, June 1987
- Kushida, Keiko; Takeuchi, Hiroshi
- US Patent Document 4,677,336
Thermally activated micromirror and fabrication method
patent-application, September 2011
- Abele, Nicolas; Khechana, Faouzi; Renaud, Philippe
- US Patent Application 13/001247; 20110217804
Method for making large scale multilayer dielectric diffraction gratings on thick substrates using reactive ion etching
patent, August 2007
- Barton, Ian; Perry, Michael D.
- US Patent Document 7,256,938
Method of qualifying a diffraction grating and method of manufacturing an optical element
patent-application, December 2006
- Hetzler, Jochen; Andiel, Ulrich; Brandenburg, Hartmut
- US Patent Application 11/439719; 20060274325
Semiconductor buried grating fabrication method
patent-application, October 2009
- Li, Yabo; Song, Kechang; Visovsky, Nicholas John
- US Patent Application 12/079524; 20090246707
Tool for embossing high aspect ratio microstructures
patent-application, October 2003
- Harker, Alan B.; DeNatale, Jeffrey F.; Strauss, Dennis R.
- US Patent Application 10/439528; 20030201241
Method for etching insulating film and method for manufacturing semiconductor optical device
patent-application, March 2012
- Tsuji, Yukihiro
- US Patent Application 13/223586; 20120058582
Complex-coupled distributed feedback semiconductor laser device
patent-application, January 2004
- Kise, Tomofuimi; Funabashi, Masaki
- US Patent Application 10/046267; 20040013144
Blazed diffraction grating structures and method of manufacturing the same
patent, September 1983
- Fujii, Yohji; Minowa, Junichiro
- US Patent Document 4,405,405
Low-efficiency gratings for third-harmonic diagnostics applications
conference, December 1995
- Britten, Jerald A.; Boyd, Robert D.; Perry, Michael D.
- Solid State Lasers for Application to Inertial Confinement Fusion (ICF)
Structures for polarization and beam control
patent-application, June 2006
- Deng, Xuegong; Wang, Jian; Liu, Feng
- US Patent Application 11/265813; 20060127829
Multiscale, multifunction diffractive structures wet etched into fused silica for high-laser damage threshold applications
journal, October 1998
- Britten, Jerald A.; Summers, Leslie J.
- Applied Optics, Vol. 37, Issue 30
Etch‐stop characteristics of Sc2O3 and HfO2 films for multilayer dielectric grating applications
journal, September 1996
- Britten, J. A.; Nguyen, H. T.; Falabella, S. F.
- Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 14, Issue 5