Method for fabricating superconducting devices using a focused ion beam

Cybart, Shane A.; Cho, Ethan Y.; Dynes, Robert C.; Wong, Travis J.

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Title: Method for fabricating superconducting devices using a focused ion beam

Abstract

Nano-scale junctions, wires, and junction arrays are created by using a focused high-energy ion beam to direct-write insulating or poorly conducting barriers into thin films of materials that are sensitive to disorder, including superconductors, ferromagnetic materials and semiconductors.

Inventors:: Cybart, Shane A.; Cho, Ethan Y.; Dynes, Robert C.; Wong, Travis J.

Issue Date:: Tue Jul 13 00:00:00 EDT 2021

Research Org.:: Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 1840263

Patent Number(s):: 11063201

Application Number:: 16/255,499

Assignee:: The Regents of the University of California (Oakland, CA)

DOE Contract Number:: AC02-05CH11231

Resource Type:: Patent

Resource Relation:: Patent File Date: 01/23/2019

Country of Publication:: United States

Language:: English

Citation Formats


                    Cybart, Shane A., Cho, Ethan Y., Dynes, Robert C., and Wong, Travis J. Method for fabricating superconducting devices using a focused ion beam.  United States: N. p., 2021. 
        Web.

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                    Cybart, Shane A., Cho, Ethan Y., Dynes, Robert C., & Wong, Travis J. Method for fabricating superconducting devices using a focused ion beam.  United States.

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                    Cybart, Shane A., Cho, Ethan Y., Dynes, Robert C., and Wong, Travis J. Tue .  
        "Method for fabricating superconducting devices using a focused ion beam".  United States.  https://www.osti.gov/servlets/purl/1840263.

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@article{osti_1840263,

  title        = {Method for fabricating superconducting devices using a focused ion beam},

  author       = {Cybart, Shane A. and Cho, Ethan Y. and Dynes, Robert C. and Wong, Travis J.},

  abstractNote = {Nano-scale junctions, wires, and junction arrays are created by using a focused high-energy ion beam to direct-write insulating or poorly conducting barriers into thin films of materials that are sensitive to disorder, including superconductors, ferromagnetic materials and semiconductors.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {Tue Jul 13 00:00:00 EDT 2021},

  month        = {Tue Jul 13 00:00:00 EDT 2021}

}

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