Method for fabricating superconducting devices using a focused ion beam
Abstract
Nano-scale junctions, wires, and junction arrays are created by using a focused high-energy ion beam to direct-write insulating or poorly conducting barriers into thin films of materials that are sensitive to disorder, including superconductors, ferromagnetic materials and semiconductors.
- Inventors:
- Issue Date:
- Research Org.:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1840263
- Patent Number(s):
- 11063201
- Application Number:
- 16/255,499
- Assignee:
- The Regents of the University of California (Oakland, CA)
- DOE Contract Number:
- AC02-05CH11231
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 01/23/2019
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Cybart, Shane A., Cho, Ethan Y., Dynes, Robert C., and Wong, Travis J. Method for fabricating superconducting devices using a focused ion beam. United States: N. p., 2021.
Web.
Cybart, Shane A., Cho, Ethan Y., Dynes, Robert C., & Wong, Travis J. Method for fabricating superconducting devices using a focused ion beam. United States.
Cybart, Shane A., Cho, Ethan Y., Dynes, Robert C., and Wong, Travis J. Tue .
"Method for fabricating superconducting devices using a focused ion beam". United States. https://www.osti.gov/servlets/purl/1840263.
@article{osti_1840263,
title = {Method for fabricating superconducting devices using a focused ion beam},
author = {Cybart, Shane A. and Cho, Ethan Y. and Dynes, Robert C. and Wong, Travis J.},
abstractNote = {Nano-scale junctions, wires, and junction arrays are created by using a focused high-energy ion beam to direct-write insulating or poorly conducting barriers into thin films of materials that are sensitive to disorder, including superconductors, ferromagnetic materials and semiconductors.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2021},
month = {7}
}
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