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Title: Energy storage technology with extreme high energy density capability

Abstract

A capacitor includes a first electrode having a substrate and a plurality of nanostructures physically and electrically coupled to the substrate. The capacitor also includes a solid, non-conductive interlayer deposited over the nanostructures to coat the nanostructures, and extending between the nanostructures, and a second electrode deposited over the interlayer and extending between the nanostructures. The interlayer insulates the first and second electrode layers from one another.

Inventors:
Issue Date:
Research Org.:
Argonne National Laboratory (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1824084
Patent Number(s):
11037737
Application Number:
15/634,529
Assignee:
UChicago Argonne, LLC (Chicago, IL)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01G - CAPACITORS
DOE Contract Number:  
AC02-06CH11357
Resource Type:
Patent
Resource Relation:
Patent File Date: 06/27/2017
Country of Publication:
United States
Language:
English

Citation Formats

Gao, Kaizhong. Energy storage technology with extreme high energy density capability. United States: N. p., 2021. Web.
Gao, Kaizhong. Energy storage technology with extreme high energy density capability. United States.
Gao, Kaizhong. Tue . "Energy storage technology with extreme high energy density capability". United States. https://www.osti.gov/servlets/purl/1824084.
@article{osti_1824084,
title = {Energy storage technology with extreme high energy density capability},
author = {Gao, Kaizhong},
abstractNote = {A capacitor includes a first electrode having a substrate and a plurality of nanostructures physically and electrically coupled to the substrate. The capacitor also includes a solid, non-conductive interlayer deposited over the nanostructures to coat the nanostructures, and extending between the nanostructures, and a second electrode deposited over the interlayer and extending between the nanostructures. The interlayer insulates the first and second electrode layers from one another.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2021},
month = {6}
}

Works referenced in this record:

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patent-application, January 2015


Method for forming capacitor of semiconductor device
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Fabrication of Enhanced Supercapacitors Using Atomic Layer Deposition of Metal Oxide on Nanostructures
patent-application, October 2015


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patent-application, September 2008


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patent-application, December 2010