DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Variable-focus magnetostatic lens

Abstract

Variable-focus solenoidal lenses for charged particle beams with integrated emittance filtering are disclosed. The emittance may be controlled via selection of collimating irises. The focal length may be changed by altering the spacing between two permanent ring magnets.

Inventors:
; ; ;
Issue Date:
Research Org.:
Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1823930
Patent Number(s):
10998158
Application Number:
16/444,412
Assignee:
Triad National Security, LLC (Los Alamos, NM)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
DOE Contract Number:  
89233218CNA000001
Resource Type:
Patent
Resource Relation:
Patent File Date: 06/18/2019
Country of Publication:
United States
Language:
English

Citation Formats

Lewellen, John, Nichols, Kimberly, Andrews, Heather, and Fleming, Ryan. Variable-focus magnetostatic lens. United States: N. p., 2021. Web.
Lewellen, John, Nichols, Kimberly, Andrews, Heather, & Fleming, Ryan. Variable-focus magnetostatic lens. United States.
Lewellen, John, Nichols, Kimberly, Andrews, Heather, and Fleming, Ryan. Tue . "Variable-focus magnetostatic lens". United States. https://www.osti.gov/servlets/purl/1823930.
@article{osti_1823930,
title = {Variable-focus magnetostatic lens},
author = {Lewellen, John and Nichols, Kimberly and Andrews, Heather and Fleming, Ryan},
abstractNote = {Variable-focus solenoidal lenses for charged particle beams with integrated emittance filtering are disclosed. The emittance may be controlled via selection of collimating irises. The focal length may be changed by altering the spacing between two permanent ring magnets.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2021},
month = {5}
}

Works referenced in this record:

Electron beam excited plasma system
patent, March 1995


Ion sources
patent-application, October 2004