Arrays of high-aspect-ratio germanium nanostructures with nanoscale pitch and methods for the fabrication thereof
Abstract
Methods for fabricating thin, high-aspect-ratio Ge nanostructures from high-quality, single-crystalline Ge substrates are provided. Also provided are grating structures made using the methods. The methods utilize a thin layer of graphene between a surface of a Ge substrate, and an overlying resist layer. The graphene passivates the surface, preventing the formation of water-soluble native Ge oxides that can result in the lift-off of the resist during the development of the resist.
- Inventors:
- Issue Date:
- Research Org.:
- Wisconsin Alumni Research Foundation, Madison, WI (United States); Univ. of New Mexico, Albuquerque, NM (United States); Univ. of Wisconsin, Madison, WI (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- OSTI Identifier:
- 1805542
- Patent Number(s):
- 10930490
- Application Number:
- 16/727,201
- Assignee:
- Wisconsin Alumni Research Foundation (WARF) (Madison, WI); The Regents of the University of New Mexico (Albuquerque, NM)
- DOE Contract Number:
- FG02-03ER46028
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 12/26/2019
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Lagally, Max G., Cavallo, Francesca, and Mangu, Vijay Saradhi. Arrays of high-aspect-ratio germanium nanostructures with nanoscale pitch and methods for the fabrication thereof. United States: N. p., 2021.
Web.
Lagally, Max G., Cavallo, Francesca, & Mangu, Vijay Saradhi. Arrays of high-aspect-ratio germanium nanostructures with nanoscale pitch and methods for the fabrication thereof. United States.
Lagally, Max G., Cavallo, Francesca, and Mangu, Vijay Saradhi. Tue .
"Arrays of high-aspect-ratio germanium nanostructures with nanoscale pitch and methods for the fabrication thereof". United States. https://www.osti.gov/servlets/purl/1805542.
@article{osti_1805542,
title = {Arrays of high-aspect-ratio germanium nanostructures with nanoscale pitch and methods for the fabrication thereof},
author = {Lagally, Max G. and Cavallo, Francesca and Mangu, Vijay Saradhi},
abstractNote = {Methods for fabricating thin, high-aspect-ratio Ge nanostructures from high-quality, single-crystalline Ge substrates are provided. Also provided are grating structures made using the methods. The methods utilize a thin layer of graphene between a surface of a Ge substrate, and an overlying resist layer. The graphene passivates the surface, preventing the formation of water-soluble native Ge oxides that can result in the lift-off of the resist during the development of the resist.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2021},
month = {2}
}
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