Wafer-based charged particle accelerator, wafer components, methods, and applications
Abstract
A wafer-based charged particle accelerator includes a charged particle source and at least one RF charged particle accelerator wafer sub-assembly and a power supply coupled to the at least one RF charged particle accelerator wafer sub-assembly. The wafer-based charged particle accelerator may further include a beam current-sensor. The wafer-based charged particle accelerator may further include at least a second RF charged particle accelerator wafer sub-assembly and at least one ESQ charged particle focusing wafer. Fabrication methods are disclosed for RF charged particle accelerator wafer sub-assemblies, ESQ charged particle focusing wafers, and the wafer-based charged particle accelerator.
- Inventors:
- Issue Date:
- Research Org.:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1805487
- Patent Number(s):
- 10912184
- Application Number:
- 16/538,563
- Assignee:
- Cornell University (Ithaca, NY)
- DOE Contract Number:
- AC02-05CH11231
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 08/12/2019
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Lal, Amit, Schenkel, Thomas, Persaud, Arun, Ji, Qing, Seidl, Peter, Waldron, Will, Ardanuc, Serhan, and Kadayra Basavarajappa, Vinaya Kumar. Wafer-based charged particle accelerator, wafer components, methods, and applications. United States: N. p., 2021.
Web.
Lal, Amit, Schenkel, Thomas, Persaud, Arun, Ji, Qing, Seidl, Peter, Waldron, Will, Ardanuc, Serhan, & Kadayra Basavarajappa, Vinaya Kumar. Wafer-based charged particle accelerator, wafer components, methods, and applications. United States.
Lal, Amit, Schenkel, Thomas, Persaud, Arun, Ji, Qing, Seidl, Peter, Waldron, Will, Ardanuc, Serhan, and Kadayra Basavarajappa, Vinaya Kumar. Tue .
"Wafer-based charged particle accelerator, wafer components, methods, and applications". United States. https://www.osti.gov/servlets/purl/1805487.
@article{osti_1805487,
title = {Wafer-based charged particle accelerator, wafer components, methods, and applications},
author = {Lal, Amit and Schenkel, Thomas and Persaud, Arun and Ji, Qing and Seidl, Peter and Waldron, Will and Ardanuc, Serhan and Kadayra Basavarajappa, Vinaya Kumar},
abstractNote = {A wafer-based charged particle accelerator includes a charged particle source and at least one RF charged particle accelerator wafer sub-assembly and a power supply coupled to the at least one RF charged particle accelerator wafer sub-assembly. The wafer-based charged particle accelerator may further include a beam current-sensor. The wafer-based charged particle accelerator may further include at least a second RF charged particle accelerator wafer sub-assembly and at least one ESQ charged particle focusing wafer. Fabrication methods are disclosed for RF charged particle accelerator wafer sub-assemblies, ESQ charged particle focusing wafers, and the wafer-based charged particle accelerator.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2021},
month = {2}
}
Save to My Library
You must Sign In or Create an Account in order to save documents to your library.