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Title: Three dimensional vertically structured MISFET/MESFET

Abstract

According to one embodiment, an apparatus includes a substrate, and at least one three dimensional (3D) structure above the substrate. The substrate and the 3D structure each include a semiconductor material. The 3D structure also includes: a first region having a first conductivity type, and a second region coupled to a portion of at least one vertical sidewall of the 3D structure.

Inventors:
; ; ; ; ;
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1805436
Patent Number(s):
10903371
Application Number:
14/990,561
Assignee:
Lawrence Livermore National Security, LLC (Livermore, CA); The Regents of the University of California (Oakland, CA)
DOE Contract Number:  
AC52-07NA27344
Resource Type:
Patent
Resource Relation:
Patent File Date: 01/07/2016
Country of Publication:
United States
Language:
English

Citation Formats

Conway, Adam, Harrison, Sara Elizabeth, Nikolic, Rebecca J., Shao, Qinghui, Voss, Lars, and Chowdhury, Srabanti. Three dimensional vertically structured MISFET/MESFET. United States: N. p., 2021. Web.
Conway, Adam, Harrison, Sara Elizabeth, Nikolic, Rebecca J., Shao, Qinghui, Voss, Lars, & Chowdhury, Srabanti. Three dimensional vertically structured MISFET/MESFET. United States.
Conway, Adam, Harrison, Sara Elizabeth, Nikolic, Rebecca J., Shao, Qinghui, Voss, Lars, and Chowdhury, Srabanti. Tue . "Three dimensional vertically structured MISFET/MESFET". United States. https://www.osti.gov/servlets/purl/1805436.
@article{osti_1805436,
title = {Three dimensional vertically structured MISFET/MESFET},
author = {Conway, Adam and Harrison, Sara Elizabeth and Nikolic, Rebecca J. and Shao, Qinghui and Voss, Lars and Chowdhury, Srabanti},
abstractNote = {According to one embodiment, an apparatus includes a substrate, and at least one three dimensional (3D) structure above the substrate. The substrate and the 3D structure each include a semiconductor material. The 3D structure also includes: a first region having a first conductivity type, and a second region coupled to a portion of at least one vertical sidewall of the 3D structure.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2021},
month = {1}
}