Planarization of optical substrates
Abstract
A method of making a laser mirror in which a mirror substrate has at least a one micron size nodular defect includes depositing a planarization layer over the mirror substrate and the nodular defect, depositing a layer of silicon dioxide over the planarization layer, and etching away a portion of the layer of silicon dioxide. The method also includes thereafter, depositing a layer of hafnium dioxide over the layer of silicon dioxide and repeating the steps of depositing a layer of silicon dioxide, etching away a portion of the layer of silicon dioxide, and depositing a layer of hafnium dioxide until the nodular defect is reduced in size a predetermined amount.
- Inventors:
- Issue Date:
- Research Org.:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1805430
- Patent Number(s):
- 10901121
- Application Number:
- 16/183,491
- Assignee:
- Lawrence Livermore National Security, LLC (Livermore, CA); Colorado State University Research Foundation (Fort Collins, CO)
- DOE Contract Number:
- AC52-07NA27344
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 11/07/2018
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Stolz, Christopher J., Folta, James A., Mirkarimi, Paul B., Soufli, Regina, Walton, Christopher Charles, Wolfe, Justin, Menoni, Carmen S., and Patel, Dinesh. Planarization of optical substrates. United States: N. p., 2021.
Web.
Stolz, Christopher J., Folta, James A., Mirkarimi, Paul B., Soufli, Regina, Walton, Christopher Charles, Wolfe, Justin, Menoni, Carmen S., & Patel, Dinesh. Planarization of optical substrates. United States.
Stolz, Christopher J., Folta, James A., Mirkarimi, Paul B., Soufli, Regina, Walton, Christopher Charles, Wolfe, Justin, Menoni, Carmen S., and Patel, Dinesh. Tue .
"Planarization of optical substrates". United States. https://www.osti.gov/servlets/purl/1805430.
@article{osti_1805430,
title = {Planarization of optical substrates},
author = {Stolz, Christopher J. and Folta, James A. and Mirkarimi, Paul B. and Soufli, Regina and Walton, Christopher Charles and Wolfe, Justin and Menoni, Carmen S. and Patel, Dinesh},
abstractNote = {A method of making a laser mirror in which a mirror substrate has at least a one micron size nodular defect includes depositing a planarization layer over the mirror substrate and the nodular defect, depositing a layer of silicon dioxide over the planarization layer, and etching away a portion of the layer of silicon dioxide. The method also includes thereafter, depositing a layer of hafnium dioxide over the layer of silicon dioxide and repeating the steps of depositing a layer of silicon dioxide, etching away a portion of the layer of silicon dioxide, and depositing a layer of hafnium dioxide until the nodular defect is reduced in size a predetermined amount.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2021},
month = {1}
}