Planarization of optical substrates
Abstract
A method of making a laser mirror in which a mirror substrate has at least a one micron size nodular defect includes depositing a planarization layer over the mirror substrate and the nodular defect, depositing a layer of silicon dioxide over the planarization layer, and etching away a portion of the layer of silicon dioxide. The method also includes thereafter, depositing a layer of hafnium dioxide over the layer of silicon dioxide and repeating the steps of depositing a layer of silicon dioxide, etching away a portion of the layer of silicon dioxide, and depositing a layer of hafnium dioxide until the nodular defect is reduced in size a predetermined amount.
- Inventors:
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1805430
- Patent Number(s):
- 10901121
- Application Number:
- 16/183,491
- Assignee:
- Lawrence Livermore National Security, LLC (Livermore, CA); Colorado State University Research Foundation (Fort Collins, CO)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C03 - GLASS C03C - CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
- DOE Contract Number:
- AC52-07NA27344
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 11/07/2018
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Stolz, Christopher J., Folta, James A., Mirkarimi, Paul B., Soufli, Regina, Walton, Christopher Charles, Wolfe, Justin, Menoni, Carmen S., and Patel, Dinesh. Planarization of optical substrates. United States: N. p., 2021.
Web.
Stolz, Christopher J., Folta, James A., Mirkarimi, Paul B., Soufli, Regina, Walton, Christopher Charles, Wolfe, Justin, Menoni, Carmen S., & Patel, Dinesh. Planarization of optical substrates. United States.
Stolz, Christopher J., Folta, James A., Mirkarimi, Paul B., Soufli, Regina, Walton, Christopher Charles, Wolfe, Justin, Menoni, Carmen S., and Patel, Dinesh. Tue .
"Planarization of optical substrates". United States. https://www.osti.gov/servlets/purl/1805430.
@article{osti_1805430,
title = {Planarization of optical substrates},
author = {Stolz, Christopher J. and Folta, James A. and Mirkarimi, Paul B. and Soufli, Regina and Walton, Christopher Charles and Wolfe, Justin and Menoni, Carmen S. and Patel, Dinesh},
abstractNote = {A method of making a laser mirror in which a mirror substrate has at least a one micron size nodular defect includes depositing a planarization layer over the mirror substrate and the nodular defect, depositing a layer of silicon dioxide over the planarization layer, and etching away a portion of the layer of silicon dioxide. The method also includes thereafter, depositing a layer of hafnium dioxide over the layer of silicon dioxide and repeating the steps of depositing a layer of silicon dioxide, etching away a portion of the layer of silicon dioxide, and depositing a layer of hafnium dioxide until the nodular defect is reduced in size a predetermined amount.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jan 26 00:00:00 EST 2021},
month = {Tue Jan 26 00:00:00 EST 2021}
}
Works referenced in this record:
Planarization of substrate pits and scratches
patent-application, June 2005
- Mirkarimi, Paul B.; Baker, Sherry L.; Stearns, Daniel G.
- US Patent Application 10/964048; 20050118533
Maskless fabrication of waveguide mirrors
patent-application, March 2005
- Leon, Francisco A.; West, Lawrence C.; Wojcik, Gregory L.
- US Patent Application 10/858524; 20050054130
Planarization of optical substrates
patent-application, October 2015
- Stolz, Christopher J.; Folta, Jim; Mirkarimi, Paul B.
- US Patent Application 14/434699; 20150276993
Light-emitting element and display device
patent-application, June 2007
- Omura, Tetsuji; Nakai, Masaya; Shirakawa, Makoto
- US Patent Application 11/602879; 20070126012
Ion-assisted deposition techniques for the planarization of topological defects
patent-application, September 2003
- Mirkarimi, Paul B.; Spiller, Eberhard A.; Stearns, Daniel G.
- US Patent Application 10/086614; 20030164998
Fluorine plasma treatment of high-k gate stack for defect passivation
patent-application, March 2008
- Kraus, Philip Allan; Olsen, Christopher; Ahmed, Khaled Z.
- US Patent Application 11/861578; 20080076268