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Title: Functionalized foams

Abstract

A method of fabricating an foam includes providing a foam comprising a base material. The base material is coated with an inorganic material using at least one of an atomic layer deposition (ALD), a molecular layer deposition (MLD), or sequential infiltration synthesis (SIS) process. The SIS process includes at least one cycle of exposing the foam to a first metal precursor for a first predetermined time and a first partial pressure. The first metal precursor infiltrates at least a portion of the base material and binds with the base material. The foam is exposed to a second co-reactant precursor for a second predetermined time and a second partial pressure. The second co-reactant precursor reacts with the first metal precursor, thereby forming the inorganic material on the base material. The inorganic material infiltrating at least the portion of the base material. The inorganic material is functionalized with a material.

Inventors:
; ; ;
Issue Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1771743
Patent Number(s):
10870917
Application Number:
15/644,569
Assignee:
UChicago Argonne, LLC (Chicago, IL)
Patent Classifications (CPCs):
E - FIXED CONSTRUCTIONS E02 - HYDRAULIC ENGINEERING E02B - HYDRAULIC ENGINEERING
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
DOE Contract Number:  
AC02-06CH11357; W-31-109-ENG-38
Resource Type:
Patent
Resource Relation:
Patent File Date: 07/07/2017
Country of Publication:
United States
Language:
English

Citation Formats

Darling, Seth B., Elam, Jeffrey W., Mane, Anil U., and Snyder, Seth W. Functionalized foams. United States: N. p., 2020. Web.
Darling, Seth B., Elam, Jeffrey W., Mane, Anil U., & Snyder, Seth W. Functionalized foams. United States.
Darling, Seth B., Elam, Jeffrey W., Mane, Anil U., and Snyder, Seth W. Tue . "Functionalized foams". United States. https://www.osti.gov/servlets/purl/1771743.
@article{osti_1771743,
title = {Functionalized foams},
author = {Darling, Seth B. and Elam, Jeffrey W. and Mane, Anil U. and Snyder, Seth W.},
abstractNote = {A method of fabricating an foam includes providing a foam comprising a base material. The base material is coated with an inorganic material using at least one of an atomic layer deposition (ALD), a molecular layer deposition (MLD), or sequential infiltration synthesis (SIS) process. The SIS process includes at least one cycle of exposing the foam to a first metal precursor for a first predetermined time and a first partial pressure. The first metal precursor infiltrates at least a portion of the base material and binds with the base material. The foam is exposed to a second co-reactant precursor for a second predetermined time and a second partial pressure. The second co-reactant precursor reacts with the first metal precursor, thereby forming the inorganic material on the base material. The inorganic material infiltrating at least the portion of the base material. The inorganic material is functionalized with a material.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2020},
month = {12}
}

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