skip to main content
DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Optically clear photo-polymerization resists for additive manufacturing of radiopaque parts

Abstract

According to one embodiment, a method includes contacting a triiodobenzoic acid with an oxalyl chloride in a solvent whereby triiodobenzoyl chloride is formed, contacting diethanolamine with triiodobenzoyl chloride where triiodobenzoic diol amine is formed, and forming an acrylate of triiodobenzoic diol amine with acryloyl chloride where an organoiodine compound is formed. According to another embodiment, an optically clear photopolymer resist blend for additive manufacturing includes a radiopaque pre-polymer compound where the compound includes at least one of the following: iodine, bromine, tin, lead, or bismuth. The resist blend also includes a photoinitiator, a polymerization inhibitor, and a base pre-polymer.

Inventors:
;
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1735288
Patent Number(s):
10781315
Application Number:
15/367,069
Assignee:
Lawrence Livermore National Security, LLC (Livermore, CA)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B33 - ADDITIVE MANUFACTURING TECHNOLOGY B33Y - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
C - CHEMISTRY C07 - ORGANIC CHEMISTRY C07C - ACYCLIC OR CARBOCYCLIC COMPOUNDS
DOE Contract Number:  
AC52-07NA27344
Resource Type:
Patent
Resource Relation:
Patent File Date: 12/01/2016
Country of Publication:
United States
Language:
English

Citation Formats

Saha, Sourabh Kumar, and Oakdale, James Spencer. Optically clear photo-polymerization resists for additive manufacturing of radiopaque parts. United States: N. p., 2020. Web.
Saha, Sourabh Kumar, & Oakdale, James Spencer. Optically clear photo-polymerization resists for additive manufacturing of radiopaque parts. United States.
Saha, Sourabh Kumar, and Oakdale, James Spencer. Tue . "Optically clear photo-polymerization resists for additive manufacturing of radiopaque parts". United States. https://www.osti.gov/servlets/purl/1735288.
@article{osti_1735288,
title = {Optically clear photo-polymerization resists for additive manufacturing of radiopaque parts},
author = {Saha, Sourabh Kumar and Oakdale, James Spencer},
abstractNote = {According to one embodiment, a method includes contacting a triiodobenzoic acid with an oxalyl chloride in a solvent whereby triiodobenzoyl chloride is formed, contacting diethanolamine with triiodobenzoyl chloride where triiodobenzoic diol amine is formed, and forming an acrylate of triiodobenzoic diol amine with acryloyl chloride where an organoiodine compound is formed. According to another embodiment, an optically clear photopolymer resist blend for additive manufacturing includes a radiopaque pre-polymer compound where the compound includes at least one of the following: iodine, bromine, tin, lead, or bismuth. The resist blend also includes a photoinitiator, a polymerization inhibitor, and a base pre-polymer.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2020},
month = {9}
}

Patent:

Save / Share:

Works referenced in this record:

Inherently radiopaque bioresorbable polymers for multiple uses
patent, January 2009


X-ray opaque dental materials
patent, July 1998


Development and Testing of X-Ray Imaging-Enhanced Poly-L-Lactide Bone Screws
journal, October 2015


Wear Behaviour of the Pair Ti–6Al–4V–UHMWPE of Acrylic Bone Cements Containing Different Radiopaque Agents
journal, April 2004


X-ray-Computed Tomography Contrast Agents
journal, December 2012


New Intrinsically Radiopaque Hydrophilic Microspheres for Embolization: Synthesis and Characterization
journal, December 2007


Synthesis and Characterization of Dual Modality (CT/MRI) Core−Shell Microparticles for Embolization Purposes
journal, May 2010


Tailored 3D Mechanical Metamaterials Made by Dip-in Direct-Laser-Writing Optical Lithography
journal, April 2012


Radiopaque shape memory polymers for medical devices
patent, June 2015


Radiopaque polymers for medical devices
patent, October 2017


Two-photon polymerization initiators for three-dimensional optical data storage and microfabrication
journal, March 1999


Injectable Polymeric Microspheres with X-ray Visibility. Preparation, Properties, and Potential Utility as New Traceable Bulking Agents
journal, April 2003


Radio-Opaque and Surface-Functionalized Polymer Microparticles:  Potentially Safer Biomaterials for Different Injection Therapies
journal, November 2006


High refractive index and/or radio-opaque resins systems
patent, October 1997