Permanent laser conditioning of thin film optical materials
Abstract
The invention comprises a method for producing optical thin films with a high laser damage threshold and the resulting thin films. The laser damage threshold of the thin films is permanently increased by irradiating the thin films with a fluence below an unconditioned laser damage threshold. 9 figs.
- Inventors:
- Issue Date:
- Research Org.:
- Univ. of California (United States)
- OSTI Identifier:
- 170490
- Patent Number(s):
- 5472748
- Application Number:
- PAN: 7-597,228
- Assignee:
- Dept. of Energy, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Resource Relation:
- Other Information: PBD: 5 Dec 1995
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; 42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; OPTICAL SYSTEMS; MATERIALS; THIN FILMS; FABRICATION; LASERS; LASER RADIATION
Citation Formats
Wolfe, C R, Kozlowski, M R, Campbell, J H, Staggs, M, and Rainer, F. Permanent laser conditioning of thin film optical materials. United States: N. p., 1995.
Web.
Wolfe, C R, Kozlowski, M R, Campbell, J H, Staggs, M, & Rainer, F. Permanent laser conditioning of thin film optical materials. United States.
Wolfe, C R, Kozlowski, M R, Campbell, J H, Staggs, M, and Rainer, F. Tue .
"Permanent laser conditioning of thin film optical materials". United States.
@article{osti_170490,
title = {Permanent laser conditioning of thin film optical materials},
author = {Wolfe, C R and Kozlowski, M R and Campbell, J H and Staggs, M and Rainer, F},
abstractNote = {The invention comprises a method for producing optical thin films with a high laser damage threshold and the resulting thin films. The laser damage threshold of the thin films is permanently increased by irradiating the thin films with a fluence below an unconditioned laser damage threshold. 9 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1995},
month = {12}
}
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