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Title: Permanent laser conditioning of thin film optical materials

Abstract

The invention comprises a method for producing optical thin films with a high laser damage threshold and the resulting thin films. The laser damage threshold of the thin films is permanently increased by irradiating the thin films with a fluence below an unconditioned laser damage threshold. 9 figs.

Inventors:
; ; ; ;
Issue Date:
Research Org.:
University of California
OSTI Identifier:
170490
Patent Number(s):
5,472,748
Application Number:
PAN: 7-597,228
Assignee:
Dept. of Energy, Washington, DC (United States)
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Resource Relation:
Other Information: PBD: 5 Dec 1995
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; OPTICAL SYSTEMS; MATERIALS; THIN FILMS; FABRICATION; LASERS; LASER RADIATION

Citation Formats

Wolfe, C R, Kozlowski, M R, Campbell, J H, Staggs, M, and Rainer, F. Permanent laser conditioning of thin film optical materials. United States: N. p., 1995. Web.
Wolfe, C R, Kozlowski, M R, Campbell, J H, Staggs, M, & Rainer, F. Permanent laser conditioning of thin film optical materials. United States.
Wolfe, C R, Kozlowski, M R, Campbell, J H, Staggs, M, and Rainer, F. Tue . "Permanent laser conditioning of thin film optical materials". United States.
@article{osti_170490,
title = {Permanent laser conditioning of thin film optical materials},
author = {Wolfe, C R and Kozlowski, M R and Campbell, J H and Staggs, M and Rainer, F},
abstractNote = {The invention comprises a method for producing optical thin films with a high laser damage threshold and the resulting thin films. The laser damage threshold of the thin films is permanently increased by irradiating the thin films with a fluence below an unconditioned laser damage threshold. 9 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1995},
month = {12}
}