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Title: Complementary junction heterostructure field-effect transistor

A complimentary pair of compound semiconductor junction heterostructure field-effect transistors and a method for their manufacture are disclosed. The p-channel junction heterostructure field-effect transistor uses a strained layer to split the degeneracy of the valence band for a greatly improved hole mobility and speed. The n-channel device is formed by a compatible process after removing the strained layer. In this manner, both types of transistors may be independently optimized. Ion implantation is used to form the transistor active and isolation regions for both types of complimentary devices. The invention has uses for the development of low power, high-speed digital integrated circuits. 10 figs.
Inventors:
; ; ;
Issue Date:
OSTI Identifier:
170479
Assignee:
Sandia Corp., Albuquerque, NM (United States) SNL; SCA: 426000; PA: EDB-96:029646; SN: 96001517601
Patent Number(s):
US 5,479,033/A/
Application Number:
PAN: 8-250,088
Contract Number:
AC04-94AL85000
Resource Relation:
Other Information: PBD: 26 Dec 1995
Research Org:
Sandia Corporation
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; FIELD EFFECT TRANSISTORS; DESIGN; MANUFACTURING; JUNCTION TRANSISTORS; CARRIER MOBILITY; OPTIMIZATION