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Title: Continuous, real time microwave plasma element sensor

Abstract

Microwave-induced plasma is described for continuous, real time trace element monitoring under harsh and variable conditions. The sensor includes a source of high power microwave energy and a shorted waveguide made of a microwave conductive, refractory material communicating with the source of the microwave energy to generate a plasma. The high power waveguide is constructed to be robust in a hot, hostile environment. It includes an aperture for the passage of gases to be analyzed and a spectrometer is connected to receive light from the plasma. Provision is made for real time in situ calibration. The spectrometer disperses the light, which is then analyzed by a computer. The sensor is capable of making continuous, real time quantitative measurements of desired elements, such as the heavy metals lead and mercury. 3 figs.

Inventors:
; ; ; ; ;
Issue Date:
Research Org.:
Battelle Memorial Institute, Columbus, OH (United States)
OSTI Identifier:
170445
Patent Number(s):
5,479,254
Application Number:
PAN: 8-141,857
Assignee:
PTO; SCA: 400102; PA: EDB-96:028717; SN: 96001517597
DOE Contract Number:  
AC06-76RL01830
Resource Type:
Patent
Resource Relation:
Other Information: PBD: 26 Dec 1995
Country of Publication:
United States
Language:
English
Subject:
40 CHEMISTRY; MICROWAVE EQUIPMENT; DESIGN; LEAD; QUANTITATIVE CHEMICAL ANALYSIS; MERCURY; PLASMA PRODUCTION; REAL TIME SYSTEMS; WAVEGUIDES; GAS ANALYSIS

Citation Formats

Woskov, P P, Smatlak, D L, Cohn, D R, Wittle, J K, Titus, C H, and Surma, J E. Continuous, real time microwave plasma element sensor. United States: N. p., 1995. Web.
Woskov, P P, Smatlak, D L, Cohn, D R, Wittle, J K, Titus, C H, & Surma, J E. Continuous, real time microwave plasma element sensor. United States.
Woskov, P P, Smatlak, D L, Cohn, D R, Wittle, J K, Titus, C H, and Surma, J E. Tue . "Continuous, real time microwave plasma element sensor". United States.
@article{osti_170445,
title = {Continuous, real time microwave plasma element sensor},
author = {Woskov, P P and Smatlak, D L and Cohn, D R and Wittle, J K and Titus, C H and Surma, J E},
abstractNote = {Microwave-induced plasma is described for continuous, real time trace element monitoring under harsh and variable conditions. The sensor includes a source of high power microwave energy and a shorted waveguide made of a microwave conductive, refractory material communicating with the source of the microwave energy to generate a plasma. The high power waveguide is constructed to be robust in a hot, hostile environment. It includes an aperture for the passage of gases to be analyzed and a spectrometer is connected to receive light from the plasma. Provision is made for real time in situ calibration. The spectrometer disperses the light, which is then analyzed by a computer. The sensor is capable of making continuous, real time quantitative measurements of desired elements, such as the heavy metals lead and mercury. 3 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1995},
month = {12}
}