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Title: Continuous, real time microwave plasma element sensor

Microwave-induced plasma is described for continuous, real time trace element monitoring under harsh and variable conditions. The sensor includes a source of high power microwave energy and a shorted waveguide made of a microwave conductive, refractory material communicating with the source of the microwave energy to generate a plasma. The high power waveguide is constructed to be robust in a hot, hostile environment. It includes an aperture for the passage of gases to be analyzed and a spectrometer is connected to receive light from the plasma. Provision is made for real time in situ calibration. The spectrometer disperses the light, which is then analyzed by a computer. The sensor is capable of making continuous, real time quantitative measurements of desired elements, such as the heavy metals lead and mercury. 3 figs.
Inventors:
; ; ; ; ;
Issue Date:
OSTI Identifier:
170445
Assignee:
PTO; SCA: 400102; PA: EDB-96:028717; SN: 96001517597
Patent Number(s):
US 5,479,254/A/
Application Number:
PAN: 8-141,857
Contract Number:
AC06-76RL01830
Resource Relation:
Other Information: PBD: 26 Dec 1995
Research Org:
Battelle Memorial Institute
Country of Publication:
United States
Language:
English
Subject:
40 CHEMISTRY; MICROWAVE EQUIPMENT; DESIGN; LEAD; QUANTITATIVE CHEMICAL ANALYSIS; MERCURY; PLASMA PRODUCTION; REAL TIME SYSTEMS; WAVEGUIDES; GAS ANALYSIS

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