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Title: Thermal evaporation sources for wide-area deposition

Abstract

A thermal evaporation sources are described. These thermal evaporation sources include a crucible configured to contain a volume of evaporant and a vapor space above the evaporant.

Inventors:
;
Issue Date:
Research Org.:
JLN Solar, Inc., Mill Valley, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1650948
Patent Number(s):
10663228
Application Number:
15/645,927
Assignee:
JLN Solar, Inc. (Mill Valley, CA)
Patent Classifications (CPCs):
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
F - MECHANICAL ENGINEERING F27 - FURNACES F27B - FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL
DOE Contract Number:  
ADJ-1-30630-12
Resource Type:
Patent
Resource Relation:
Patent File Date: 07/10/2017
Country of Publication:
United States
Language:
English

Citation Formats

Birkmire, Robert W., and Hanket, Gregory M. Thermal evaporation sources for wide-area deposition. United States: N. p., 2020. Web.
Birkmire, Robert W., & Hanket, Gregory M. Thermal evaporation sources for wide-area deposition. United States.
Birkmire, Robert W., and Hanket, Gregory M. Tue . "Thermal evaporation sources for wide-area deposition". United States. https://www.osti.gov/servlets/purl/1650948.
@article{osti_1650948,
title = {Thermal evaporation sources for wide-area deposition},
author = {Birkmire, Robert W. and Hanket, Gregory M.},
abstractNote = {A thermal evaporation sources are described. These thermal evaporation sources include a crucible configured to contain a volume of evaporant and a vapor space above the evaporant.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2020},
month = {5}
}

Works referenced in this record:

Sources used in molecular beam epitaxy
patent, November 1999


Thermal evaporation sources for wide-area deposition
patent, August 2017


Thermal evaporation sources for wide-area deposition
patent, March 2015