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Title: Method and apparatus for temperature and voltage management control

Abstract

A method and apparatus for managing processing power determine a supply voltage to supply to a processing unit, such as a central processing unit (CPU) or graphics processing unit (GPU), based on temperature inversion based voltage, frequency, temperature (VFT) data. The temperature inversion based VFT data includes supply voltages and corresponding operating temperatures that cause the processing unit's transistors to operate in a temperature inversion region. In one example, the temperature inversion based VFT data includes lower supply voltages and corresponding higher temperatures in a temperature inversion region of a processing unit. The temperature inversion based VFT data is based on an operating frequency of the processing unit. The apparatus and method adjust a supply voltage to the processing unit based on the temperature inversion based VFT data.

Inventors:
; ;
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1650899
Patent Number(s):
10649514
Application Number:
15/274,697
Assignee:
Advanced Micro Devices, Inc. (Santa Clara, CA)
Patent Classifications (CPCs):
G - PHYSICS G06 - COMPUTING G06F - ELECTRIC DIGITAL DATA PROCESSING
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE Y02D - CLIMATE CHANGE MITIGATION TECHNOLOGIES IN INFORMATION AND COMMUNICATION TECHNOLOGIES [ICT], I.E. INFORMATION AND COMMUNICATION TECHNOLOGIES AIMING AT THE REDUCTION OF THIR OWN ENERGY USE
DOE Contract Number:  
AC52-07NA27344
Resource Type:
Patent
Resource Relation:
Patent File Date: 09/23/2016
Country of Publication:
United States
Language:
English

Citation Formats

Huang, Wei, Zu, Yazhou, and Paul, Indrani. Method and apparatus for temperature and voltage management control. United States: N. p., 2020. Web.
Huang, Wei, Zu, Yazhou, & Paul, Indrani. Method and apparatus for temperature and voltage management control. United States.
Huang, Wei, Zu, Yazhou, and Paul, Indrani. Tue . "Method and apparatus for temperature and voltage management control". United States. https://www.osti.gov/servlets/purl/1650899.
@article{osti_1650899,
title = {Method and apparatus for temperature and voltage management control},
author = {Huang, Wei and Zu, Yazhou and Paul, Indrani},
abstractNote = {A method and apparatus for managing processing power determine a supply voltage to supply to a processing unit, such as a central processing unit (CPU) or graphics processing unit (GPU), based on temperature inversion based voltage, frequency, temperature (VFT) data. The temperature inversion based VFT data includes supply voltages and corresponding operating temperatures that cause the processing unit's transistors to operate in a temperature inversion region. In one example, the temperature inversion based VFT data includes lower supply voltages and corresponding higher temperatures in a temperature inversion region of a processing unit. The temperature inversion based VFT data is based on an operating frequency of the processing unit. The apparatus and method adjust a supply voltage to the processing unit based on the temperature inversion based VFT data.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2020},
month = {5}
}

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Works referenced in this record:

Dynamic chip control
patent, March 2011