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Title: High registration particles-transferring system

Abstract

Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.

Inventors:
; ; ; ; ; ; ;
Issue Date:
Research Org.:
Xerox Corp., Norwalk, CT (United States); Palo Alto Research Center Inc., Palo Alto, CA (United States)
Sponsoring Org.:
USDOE Advanced Research Projects Agency - Energy (ARPA-E)
OSTI Identifier:
1637759
Patent Number(s):
10604843
Application Number:
15/591,959
Assignee:
Xerox Corporation (Norwalk, CT); Palo Alto Research Center Incorporated (Palo Alto, CA)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
DOE Contract Number:  
AR0000631
Resource Type:
Patent
Resource Relation:
Patent File Date: 05/10/2017
Country of Publication:
United States
Language:
English

Citation Formats

Wang, Yunda, Raychaudhuri, Sourobh, Lu, Jeng Ping, Chow, Eugene M., Bert, Julie A., Biegelsen, David, Gibson, George A., and Kalb, Jamie. High registration particles-transferring system. United States: N. p., 2020. Web.
Wang, Yunda, Raychaudhuri, Sourobh, Lu, Jeng Ping, Chow, Eugene M., Bert, Julie A., Biegelsen, David, Gibson, George A., & Kalb, Jamie. High registration particles-transferring system. United States.
Wang, Yunda, Raychaudhuri, Sourobh, Lu, Jeng Ping, Chow, Eugene M., Bert, Julie A., Biegelsen, David, Gibson, George A., and Kalb, Jamie. Tue . "High registration particles-transferring system". United States. https://www.osti.gov/servlets/purl/1637759.
@article{osti_1637759,
title = {High registration particles-transferring system},
author = {Wang, Yunda and Raychaudhuri, Sourobh and Lu, Jeng Ping and Chow, Eugene M. and Bert, Julie A. and Biegelsen, David and Gibson, George A. and Kalb, Jamie},
abstractNote = {Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2020},
month = {3}
}

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Works referenced in this record:

Xerographic micro-assembler
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Micro-assembler
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System for forming a micro-assembler
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