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Title: Ordered nanoscale domains by infiltration of block copolymers

Abstract

A method of preparing tunable inorganic patterned nanofeatures by infiltration of a block copolymer scaffold having a plurality of self-assembled periodic polymer microdomains. The method may be used sequential infiltration synthesis (SIS), related to atomic layer deposition (ALD). The method includes selecting a metal precursor that is configured to selectively react with the copolymer unit defining the microdomain but is substantially non-reactive with another polymer unit of the copolymer. A tunable inorganic features is selectively formed on the microdomain to form a hybrid organic/inorganic composite material of the metal precursor and a co-reactant. The organic component may be optionally removed to obtain an inorganic feature s with patterned nanostructures defined by the configuration of the microdomain.

Inventors:
; ; ;
Issue Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1632621
Patent Number(s):
10577466
Application Number:
15/332,335
Assignee:
UChicago Argonne, LLC (Chicago, IL)
Patent Classifications (CPCs):
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE Y02E - REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
DOE Contract Number:  
AC02-06CH11357
Resource Type:
Patent
Resource Relation:
Patent File Date: 10/24/2016
Country of Publication:
United States
Language:
English
Subject:
77 NANOSCIENCE AND NANOTECHNOLOGY; 36 MATERIALS SCIENCE

Citation Formats

Darling, Seth B., Elam, Jeffrey W., Tseng, Yu-Chih, and Peng, Qing. Ordered nanoscale domains by infiltration of block copolymers. United States: N. p., 2020. Web.
Darling, Seth B., Elam, Jeffrey W., Tseng, Yu-Chih, & Peng, Qing. Ordered nanoscale domains by infiltration of block copolymers. United States.
Darling, Seth B., Elam, Jeffrey W., Tseng, Yu-Chih, and Peng, Qing. Tue . "Ordered nanoscale domains by infiltration of block copolymers". United States. https://www.osti.gov/servlets/purl/1632621.
@article{osti_1632621,
title = {Ordered nanoscale domains by infiltration of block copolymers},
author = {Darling, Seth B. and Elam, Jeffrey W. and Tseng, Yu-Chih and Peng, Qing},
abstractNote = {A method of preparing tunable inorganic patterned nanofeatures by infiltration of a block copolymer scaffold having a plurality of self-assembled periodic polymer microdomains. The method may be used sequential infiltration synthesis (SIS), related to atomic layer deposition (ALD). The method includes selecting a metal precursor that is configured to selectively react with the copolymer unit defining the microdomain but is substantially non-reactive with another polymer unit of the copolymer. A tunable inorganic features is selectively formed on the microdomain to form a hybrid organic/inorganic composite material of the metal precursor and a co-reactant. The organic component may be optionally removed to obtain an inorganic feature s with patterned nanostructures defined by the configuration of the microdomain.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2020},
month = {3}
}

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Works referenced in this record:

Method of forming high aspect ratio apertures
patent, January 2007


Complementary replacement of material
patent, July 2008