Ordered nanoscale domains by infiltration of block copolymers
Abstract
A method of preparing tunable inorganic patterned nanofeatures by infiltration of a block copolymer scaffold having a plurality of self-assembled periodic polymer microdomains. The method may be used sequential infiltration synthesis (SIS), related to atomic layer deposition (ALD). The method includes selecting a metal precursor that is configured to selectively react with the copolymer unit defining the microdomain but is substantially non-reactive with another polymer unit of the copolymer. A tunable inorganic features is selectively formed on the microdomain to form a hybrid organic/inorganic composite material of the metal precursor and a co-reactant. The organic component may be optionally removed to obtain an inorganic feature s with patterned nanostructures defined by the configuration of the microdomain.
- Inventors:
- Issue Date:
- Research Org.:
- Argonne National Laboratory (ANL), Argonne, IL (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1632621
- Patent Number(s):
- 10577466
- Application Number:
- 15/332,335
- Assignee:
- UChicago Argonne, LLC (Chicago, IL)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C08 - ORGANIC MACROMOLECULAR COMPOUNDS C08F - MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
C - CHEMISTRY C08 - ORGANIC MACROMOLECULAR COMPOUNDS C08G - MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- DOE Contract Number:
- AC02-06CH11357
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 10/24/2016
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 77 NANOSCIENCE AND NANOTECHNOLOGY; 36 MATERIALS SCIENCE
Citation Formats
Darling, Seth B., Elam, Jeffrey W., Tseng, Yu-Chih, and Peng, Qing. Ordered nanoscale domains by infiltration of block copolymers. United States: N. p., 2020.
Web.
Darling, Seth B., Elam, Jeffrey W., Tseng, Yu-Chih, & Peng, Qing. Ordered nanoscale domains by infiltration of block copolymers. United States.
Darling, Seth B., Elam, Jeffrey W., Tseng, Yu-Chih, and Peng, Qing. Tue .
"Ordered nanoscale domains by infiltration of block copolymers". United States. https://www.osti.gov/servlets/purl/1632621.
@article{osti_1632621,
title = {Ordered nanoscale domains by infiltration of block copolymers},
author = {Darling, Seth B. and Elam, Jeffrey W. and Tseng, Yu-Chih and Peng, Qing},
abstractNote = {A method of preparing tunable inorganic patterned nanofeatures by infiltration of a block copolymer scaffold having a plurality of self-assembled periodic polymer microdomains. The method may be used sequential infiltration synthesis (SIS), related to atomic layer deposition (ALD). The method includes selecting a metal precursor that is configured to selectively react with the copolymer unit defining the microdomain but is substantially non-reactive with another polymer unit of the copolymer. A tunable inorganic features is selectively formed on the microdomain to form a hybrid organic/inorganic composite material of the metal precursor and a co-reactant. The organic component may be optionally removed to obtain an inorganic feature s with patterned nanostructures defined by the configuration of the microdomain.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2020},
month = {3}
}
Works referenced in this record:
VDD scalability of FinFET SRAMs: Robustness of different design options against LER-induced variations
journal, September 2010
- Baravelli, Emanuele; Marchi, Luca De; Speciale, Nicolò
- Solid-State Electronics, Vol. 54, Issue 9, p. 909-918
Generalized Gradient Approximation Made Simple
journal, October 1996
- Perdew, John P.; Burke, Kieron; Ernzerhof, Matthias
- Physical Review Letters, Vol. 77, Issue 18, p. 3865-3868
UHV transmission electron microscopy on the reconstructed surface of (111) gold: I. General features
journal, November 1981
- Tanishiro, Y.; Kanamori, H.; Takayanagi, K.
- Surface Science, Vol. 111, Issue 3, p. 395-413
Method of forming high aspect ratio apertures
patent, January 2007
- Donohoe, Kevin G.; Becker, David S.
- US Patent Document 7,163,641
25 nm mechanically buttressed high aspect ratio zone plates: Fabrication and performance
journal, January 2004
- Olynick, Deirdre L.; Harteneck, Bruce D.; Veklerov, Eugene
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 22, Issue 6
Statistical Modeling and Simulation of Threshold Variation Under Random Dopant Fluctuations and Line-Edge Roughness
journal, June 2011
- Ye, Yun; Liu, Frank; Chen, Min
- IEEE Transactions on Very Large Scale Integration (VLSI) Systems, Vol. 19, Issue 6
Electrical, optical, and structural properties of indium–tin–oxide thin films for organic light-emitting devices
journal, December 1999
- Kim, H.; Gilmore, C. M.; Piqué, A.
- Journal of Applied Physics, Vol. 86, Issue 11
Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes
journal, January 2004
- Goldfarb, Dario L.; Mahorowala, Arpan P.; Gallatin, Gregg M.
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 22, Issue 2
CD characterization of nanostructures in SEM metrology
journal, January 2007
- Frase, Carl Georg; Buhr, Egbert; Dirscherl, Kai
- Measurement Science and Technology, Vol. 18, Issue 2
Reduction of line edge roughness in the top surface imaging process
journal, November 1998
- Mori, Shigeyasu; Morisawa, Taku; Matsuzawa, Nobuyuki
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 16, Issue 6, Article No. 3739
Cyclic trimeric hydroxy, amido, phosphido, and arsenido derivatives of aluminum and gallium. X-ray structures of [tert-Bu2Ga(.mu.-OH)]3 and [tert-Bu2Ga(.mu.-NH2)]3
journal, January 1993
- Atwood, David A.; Cowley, Alan H.; Harris, Paul R.
- Organometallics, Vol. 12, Issue 1
Group Frequency Assignments for Major Infrared Bands Observed in Common Synthetic Polymers
book, January 2007
- Noda, I.; Dowrey, A. E.; Haynes, J. L.
- Physical Properties of Polymers Handbook
Optical Characterization and Process Control of Top Surface Imaging
journal, January 1999
- Luo, Ying-Ying; Stauffer, Craig; Ygartua, Carlos
- MRS Proceedings, Vol. 584
Characterization of tin doped indium oxide films prepared by electron beam evaporation
journal, January 1986
- Banerjee, Ratnabali; Das, Debajyoti; Ray, Swati
- Solar Energy Materials, Vol. 13, Issue 1
Enhanced Lithographic Imaging Layer Meets Semiconductor Manufacturing Specification a Decade Early
journal, April 2012
- Tseng, Yu-Chih; Mane, Anil U.; Elam, Jeffrey W.
- Advanced Materials, Vol. 24, Issue 19, p. 2608-2613
High Precision Etching of Si/SiO[sub 2] on a High-Density Helicon Etcher for Nanoscale Devices
journal, January 2003
- Dreeskornfeld, L.; Hartwich, J.; Kretz, J.
- Journal of The Electrochemical Society, Vol. 150, Issue 11
Nanoscopic Patterned Materials with Tunable Dimensions via Atomic Layer Deposition on Block Copolymers
journal, September 2010
- Peng, Qing; Tseng, Yu-Chih; Darling, Seth B.
- Advanced Materials, Vol. 22, Issue 45, p. 5129-5133
Block Copolymer Lithography: Periodic Arrays of 1011 Holes in 1 Square Centimeter
journal, May 1997
- Park, Miri; Harrison, Christopher; Chaikin, Paul M.
- Science, Vol. 276, Issue 5317, p. 1401-1404
A Route to Nanoscopic Materials via Sequential Infiltration Synthesis on Block Copolymer Templates
journal, May 2011
- Peng, Qing; Tseng, Yu-Chih; Darling, Seth B.
- ACS Nano, Vol. 5, Issue 6, p. 4600-4606
Etch properties of resists modified by sequential infiltration synthesis
journal, November 2011
- Tseng, Yu-Chih; Peng, Qing; Ocola, Leonidas E.
- Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 29, Issue 6, Article No. 06FG01
Methods Of Utilizing Block Copolymer To Form Patterns
patent-application, April 2010
- Sills, Scott; Millward, Dan
- US Patent Application 12/248219; 20100092873
Optimized surface silylation of chemically amplified epoxidized photoresists for micromachining applications
journal, April 2010
- Kontziampasis, D.; Beltsios, K.; Tegou, E.
- Journal of Applied Polymer Science, Vol. 117, Issue 4, p. 2189-2195
Hierarchical self-assembly of metal nanostructures on diblock copolymer scaffolds
journal, December 2001
- Lopes, Ward A.; Jaeger, Heinrich M.
- Nature, Vol. 414, Issue 6865, p. 735-738
Bilayer silylation process for 193-nm lithography
conference, June 1999
- Satou, Isao; Kuhara, Koichi; Endo, Masayuki
- SPIE Proceedings
Ordered Nanoscale Domains by Infiltration of Block Copolymers
patent-application, February 2012
- Darling, Seth B.; Elam, Jeffrey; Tseng, Yu-Chih
- US Patent Application 13/209190; 20120046421
Study on line edge roughness for electron beam acceleration voltages from 50 to 5 kV
journal, January 2009
- Rio, D.; Constancias, C.; Saied, M.
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 27, Issue 6
Line edge roughness of sub-100 nm dense and isolated features: Experimental study
journal, January 2003
- Ma, Yuansheng; Tsvid, G.; Cerrina, Franco
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 21, Issue 6
Study of the fundamental contributions to line edge roughness in a 193 nm, top surface imaging system
journal, January 2000
- Somervell, Mark H.; Fryer, David S.; Osborn, Brian
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 18, Issue 5
Temperature-Dependent Subsurface Growth during Atomic Layer Deposition on Polypropylene and Cellulose Fibers
journal, June 2010
- Jur, Jesse S.; Spagnola, Joseph C.; Lee, Kyoungmi
- Langmuir, Vol. 26, Issue 11
TRILAYER RESIST SCHEME FOR GATE ETCHING APPLICATIONS
patent-application, April 2009
- Fuller, Nicholas C.; Dalton, Timothy J.; Zhang, Ying
- US Patent Application 12/245946; 20090101985
Accurate vapor pressure equation for trimethylindium in OMVPE
journal, April 2008
- Shenai-Khatkhate, Deodatta V.; DiCarlo, Ronald L.; Ware, Robert A.
- Journal of Crystal Growth, Vol. 310, Issue 7-9
Toward reliable density functional methods without adjustable parameters: The PBE0 model
journal, April 1999
- Adamo, Carlo; Barone, Vincenzo
- The Journal of Chemical Physics, Vol. 110, Issue 13
Hydrolysis of tri-tert-butylaluminum: the first structural characterization of alkylalumoxanes [(R2Al)2O]n and (RAlO)n
journal, June 1993
- Mason, Mark R.; Smith, Janna M.; Bott, Simon G.
- Journal of the American Chemical Society, Vol. 115, Issue 12
Block Co-Polymer Photoresist
patent-application, August 2013
- Cooper, Gregory D.; Wehrenberg, Brian L.
- US Patent Application 13/764514; 20130207238
Indium Tin Oxide Films: State-of-the-Art In Synthesis and Properties
journal, January 1995
- Kumar, R.
- Materials Technology, Vol. 10, Issue 9-10
Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature
journal, November 2000
- Zhang, Keran; Zhu, Furong; Huan, C. H. A.
- Thin Solid Films, Vol. 376, Issue 1-2, p. 255-263
Complementary replacement of material
patent, July 2008
- Lin, Burn Jeng; Lin, Hua-Tai; Liu, Ru-Gun
- US Patent Document 7,399,709
Enhanced Block Copolymer Lithography Using Sequential Infiltration Synthesis
journal, July 2011
- Tseng, Yu-Chih; Peng, Qing; Ocola, Leonidas E.
- The Journal of Physical Chemistry C, Vol. 115, Issue 36, p. 17725-17729
High sensitive negative silylation process for 193nm lithography
journal, June 2000
- Endo, M.; Satou, I.; Watanabe, H.
- Microelectronic Engineering, Vol. 53, Issue 1-4, p. 485-488
Profile evolution during polysilicon gate etching with low-pressure high-density Cl2/HBr/O2 plasma chemistries
journal, May 2001
- Tuda, Mutumi; Shintani, Kenji; Ootera, Hiroki
- Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 19, Issue 3
Method of Controlling Orientation of Domains in Block Copolymer Films
patent-application, July 2009
- Cheng, Joy; Kim, Ho-Cheol; Sanders, Daniel P.
- US Patent Application 12/060516; 20090181171
Method for Forming a Block Copolymer Pattern
patent-application, August 2011
- Buriak, Jillian; Chai, Jinan; Harris, Kenneth
- US Patent Application 13/022584; 20110206905
Method for manufacturing porous structure and method for forming pattern
patent-application, October 2006
- Asakawa, Koji; Hiraoka, Toshiro; Akasaka, Yoshihiro
- US Patent Application 11/455916; 20060231525
Ab initio molecular simulations with numeric atom-centered orbitals
journal, November 2009
- Blum, Volker; Gehrke, Ralf; Hanke, Felix
- Computer Physics Communications, Vol. 180, Issue 11
Application of Plasmask R resist and the DESIRE process to lithography at 248 nm
journal, November 1990
- Hutton, Richard S.
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 8, Issue 6
XPS O 1s binding energies for polymers containing hydroxyl, ether, ketone and ester groups
journal, May 1991
- López, Gabriel P.; Castner, David G.; Ratner, Buddy D.
- Surface and Interface Analysis, Vol. 17, Issue 5
Analysis of Poly(methyl methacrylate) (PMMA) by XPS
journal, April 1996
- Girardeaux, Christophe; Pireaux, Jean-Jacques
- Surface Science Spectra, Vol. 4, Issue 2
SEQUENTIAL INFILTRATION SYNTHESIS FOR ADVANCED LITHOGRAPHY
patent-application, September 2012
- Darling, Seth B.; Elam, Jeffrey W.; Tseng, Yu-Chih
- US Patent Application 13/427619 ; 20120241411
An experimentally validated analytical model for gate line-edge roughness (LER) effects on technology scaling
journal, June 2001
- Diaz, C. H.
- IEEE Electron Device Letters, Vol. 22, Issue 6
Mobility analysis of surface roughness scattering in FinFET devices
journal, August 2011
- Lee, Jae Woo; Jang, Doyoung; Mouis, Mireille
- Solid-State Electronics, Vol. 62, Issue 1, p. 195-201
Nanoscopic Morphologies in Block Copolymer Nanorods as Templates for Atomic-Layer Deposition of Semiconductors
journal, April 2009
- Wang, Yong; Qin, Yong; Berger, Andreas
- Advanced Materials, Vol. 21, Issue 27, p. 2763-2766
Low-Temperature Al2O3 Atomic Layer Deposition
journal, February 2004
- Groner, M. D.; Fabreguette, F. H.; Elam, J. W.
- Chemistry of Materials, Vol. 16, Issue 4, p. 639-645
Triple patterning in 10nm node metal lithography
journal, November 2012
- Lucas, Kevin; Cork, Chris; Yu, Bei
- SPIE Newsroom
Hollow Inorganic Nanospheres and Nanotubes with Tunable Wall Thicknesses by Atomic Layer Deposition on Self-Assembled Polymeric Templates
journal, January 2007
- Ras, R. H. A.; Kemell, M.; de Wit, J.
- Advanced Materials, Vol. 19, Issue 1, p. 102-106
PRIME process for deep UV and E-beam lithography
journal, April 1990
- Pierrat, C.; Tedesco, S.; Vinet, F.
- Microelectronic Engineering, Vol. 11, Issue 1-4, p. 507-514
Atomic Layer Deposition of Indium Tin Oxide Thin Films Using Nonhalogenated Precursors
journal, February 2008
- Elam, Jeffrey W.; Baker, David A.; Martinson, Alex B. F.
- The Journal of Physical Chemistry C, Vol. 112, Issue 6
Ab initio study on the dimer structures of trimethylaluminum and dimethylaluminumhydride
journal, December 1994
- Hiraoka, Yoshiko Someya; Mashita, Masao
- Journal of Crystal Growth, Vol. 145, Issue 1-4
Role of oxygen vacancies in the high-temperature thermopower of indium oxide and indium tin oxide films
journal, January 2009
- Sarath Kumar, S. R.; Kasiviswanathan, S.
- Semiconductor Science and Technology, Vol. 24, Issue 2
Two-Dimensional Liquid Phase and the px.sqroot.3 Phase of Alkanethiol Self-Assembled Monolayers on Au(111)
journal, October 1994
- Poirier, G. E.; Tarlov, M. J.; Rushmeier, H. E.
- Langmuir, Vol. 10, Issue 10
Approaches to deep ultraviolet photolithography utilizing acid hardened resin photoresist systems
journal, November 1989
- Thackeray, James W.; Orsula, George W.; Bohland, John F.
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 7, Issue 6, Article No. 1620