Sequential infiltration synthesis for enhancing multiple-patterning lithography

Darling, Seth B.; Elam, Jeffrey W.; Tseng, Yu-Chih

Advanced Search OptionsAdvanced Search queries use a traditional Term Search. For more info, see our FAQ.

All Fields:

Patent Title:

Abstract:

Assignee:

Inventor(s):

Patent Number:

Patent Classification (CPC):

All Classifications
A - human necessities
A01 - agriculture
A21 - baking
A22 - butchering
A23 - foods or foodstuffs
A24 - tobacco
A41 - wearing apparel
A42 - headwear
A43 - footwear
A44 - haberdashery
A45 - hand or travelling articles
A46 - brushware
A47 - furniture
A61 - medical or veterinary science
A62 - life-saving
A63 - sports
A99 - subject matter not otherwise provided for in this section
B - performing operations
B01 - physical or chemical processes or apparatus in general
B02 - crushing, pulverising, or disintegrating
B03 - separation of solid materials using liquids or using pneumatic tables or jigs
B04 - centrifugal apparatus or machines for carrying-out physical or chemical processes
B05 - spraying or atomising in general
B06 - generating or transmitting mechanical vibrations in general
B07 - separating solids from solids
B08 - cleaning
B09 - disposal of solid waste
B21 - mechanical metal-working without essentially removing material
B22 - casting
B23 - machine tools
B24 - grinding
B25 - hand tools
B26 - hand cutting tools
B27 - working or preserving wood or similar material
B28 - working cement, clay, or stone
B29 - working of plastics
B30 - presses
B31 - making articles of paper, cardboard or material worked in a manner analogous to paper
B32 - layered products
B33 - additive manufacturing technology
B41 - printing
B42 - bookbinding
B43 - writing or drawing implements
B44 - decorative arts
B60 - vehicles in general
B61 - railways
B62 - land vehicles for travelling otherwise than on rails
B63 - ships or other waterborne vessels
B64 - aircraft
B65 - conveying
B66 - hoisting
B67 - opening, closing {or cleaning} bottles, jars or similar containers
B68 - saddlery
B81 - microstructural technology
B82 - nanotechnology
B99 - subject matter not otherwise provided for in this section
C - chemistry
C01 - inorganic chemistry
C02 - treatment of water, waste water, sewage, or sludge
C03 - glass
C04 - cements
C05 - fertilisers
C06 - explosives
C07 - organic chemistry
C08 - organic macromolecular compounds
C09 - dyes
C10 - petroleum, gas or coke industries
C11 - animal or vegetable oils, fats, fatty substances or waxes
C12 - biochemistry
C13 - sugar industry
C14 - skins
C21 - metallurgy of iron
C22 - metallurgy
C23 - coating metallic material
C25 - electrolytic or electrophoretic processes
C30 - crystal growth
C40 - combinatorial technology
C99 - subject matter not otherwise provided for in this section
D - textiles
D01 - natural or man-made threads or fibres
D02 - yarns
D03 - weaving
D04 - braiding
D05 - sewing
D06 - treatment of textiles or the like
D07 - ropes
D10 - indexing scheme associated with sublasses of section d, relating to textiles
D21 - paper-making
D99 - subject matter not otherwise provided for in this section
E - fixed constructions
E01 - construction of roads, railways, or bridges
E02 - hydraulic engineering
E03 - water supply
E04 - building
E05 - locks
E06 - doors, windows, shutters, or roller blinds in general
E21 - earth drilling
E99 - subject matter not otherwise provided for in this section
F - mechanical engineering
F01 - machines or engines in general
F02 - combustion engines
F03 - machines or engines for liquids
F04 - positive - displacement machines for liquids
F05 - indexing schemes relating to engines or pumps in various subclasses of classes f01-f04
F15 - fluid-pressure actuators
F16 - engineering elements and units
F17 - storing or distributing gases or liquids
F21 - lighting
F22 - steam generation
F23 - combustion apparatus
F24 - heating
F25 - refrigeration or cooling
F26 - drying
F27 - furnaces
F28 - heat exchange in general
F41 - weapons
F42 - ammunition
F99 - subject matter not otherwise provided for in this section
G - physics
G01 - measuring
G02 - optics
G03 - photography
G04 - horology
G05 - controlling
G06 - computing
G07 - checking-devices
G08 - signalling
G09 - education
G10 - musical instruments
G11 - information storage
G12 - instrument details
G16 - information and communication technology [ict] specially adapted for specific application fields
G21 - nuclear physics
G99 - subject matter not otherwise provided for in this section
H - electricity
H01 - basic electric elements
H02 - generation
H03 - basic electronic circuitry
H04 - electric communication technique
H05 - electric techniques not otherwise provided for
H99 - subject matter not otherwise provided for in this section
Y - new / cross sectional technologies
Y02 - technologies or applications for mitigation or adaptation against climate change
Y04 - information or communication technologies having an impact on other technology areas
Y10 - technical subjects covered by former uspc

More Options ...

Title: Sequential infiltration synthesis for enhancing multiple-patterning lithography

Abstract

Simplified methods of multiple-patterning photolithography using sequential infiltration synthesis to modify the photoresist such that it withstands plasma etching better than unmodified resist and replaces one or more hard masks and/or a freezing step in MPL processes including litho-etch-litho-etch photolithography or litho-freeze-litho-etch photolithography.

Inventors:: Darling, Seth B.; Elam, Jeffrey W.; Tseng, Yu-Chih

Issue Date:: Tue Feb 25 00:00:00 EST 2020

Research Org.:: Argonne National Laboratory (ANL), Argonne, IL (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 1632615

Patent Number(s):: 10571803

Application Number:: 15/620,318

Assignee:: UChicago Argonne, LLC (Chicago, IL)

Patent Classifications (CPCs):: G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES

Show more

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
G03F7/0002 - {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping}
G03F7/405 - {Treatment with inorganic or organometallic reagents after imagewise removal}

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
H01L21/0273 - {characterised by the treatment of photoresist layers}
H01L21/3065 - Plasma etching
H01L21/3081 - {characterised by their composition, e.g. multilayer masks, materials}
H01L21/3086 - {characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment}

Show less

DOE Contract Number:: AC02-06CH11357

Resource Type:: Patent

Resource Relation:: Patent File Date: 06/12/2017

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE; 42 ENGINEERING; 37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY

Citation Formats


                    Darling, Seth B., Elam, Jeffrey W., and Tseng, Yu-Chih. Sequential infiltration synthesis for enhancing multiple-patterning lithography.  United States: N. p., 2020. 
        Web.

Copy to clipboard


                    Darling, Seth B., Elam, Jeffrey W., & Tseng, Yu-Chih. Sequential infiltration synthesis for enhancing multiple-patterning lithography.  United States.

Copy to clipboard


                    Darling, Seth B., Elam, Jeffrey W., and Tseng, Yu-Chih. Tue .  
        "Sequential infiltration synthesis for enhancing multiple-patterning lithography".  United States.  https://www.osti.gov/servlets/purl/1632615.

Copy to clipboard


                    
@article{osti_1632615,

  title        = {Sequential infiltration synthesis for enhancing multiple-patterning lithography},

  author       = {Darling, Seth B. and Elam, Jeffrey W. and Tseng, Yu-Chih},

  abstractNote = {Simplified methods of multiple-patterning photolithography using sequential infiltration synthesis to modify the photoresist such that it withstands plasma etching better than unmodified resist and replaces one or more hard masks and/or a freezing step in MPL processes including litho-etch-litho-etch photolithography or litho-freeze-litho-etch photolithography.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {Tue Feb 25 00:00:00 EST 2020},

  month        = {Tue Feb 25 00:00:00 EST 2020}

}

Copy to clipboard

Patent:

Save / Share:

Export Metadata

Save to My Library

Works referenced in this record:

VDD scalability of FinFET SRAMs: Robustness of different design options against LER-induced variations
journal, September 2010

Baravelli, Emanuele; Marchi, Luca De; Speciale, Nicolò
Solid-State Electronics, Vol. 54, Issue 9, p. 909-918
https://doi.org/10.1016/j.sse.2010.04.035

Generalized Gradient Approximation Made Simple
journal, October 1996

Perdew, John P.; Burke, Kieron; Ernzerhof, Matthias
Physical Review Letters, Vol. 77, Issue 18, p. 3865-3868
https://doi.org/10.1103/PhysRevLett.77.3865

UHV transmission electron microscopy on the reconstructed surface of (111) gold: I. General features
journal, November 1981

Tanishiro, Y.; Kanamori, H.; Takayanagi, K.
Surface Science, Vol. 111, Issue 3, p. 395-413
https://doi.org/10.1016/0039-6028(81)90397-6

Conductivity in transparent oxide semiconductors
journal, August 2011

King, P. D. C.; Veal, T. D.
Journal of Physics: Condensed Matter, Vol. 23, Issue 33
https://doi.org/10.1088/0953-8984/23/33/334214

Method of forming high aspect ratio apertures
patent, January 2007

Donohoe, Kevin G.; Becker, David S.
US Patent Document 7,163,641
URL: https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7163641

25 nm mechanically buttressed high aspect ratio zone plates: Fabrication and performance
journal, January 2004

Olynick, Deirdre L.; Harteneck, Bruce D.; Veklerov, Eugene
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 22, Issue 6
https://doi.org/10.1116/1.1815298

Statistical Modeling and Simulation of Threshold Variation Under Random Dopant Fluctuations and Line-Edge Roughness
journal, June 2011

Ye, Yun; Liu, Frank; Chen, Min
IEEE Transactions on Very Large Scale Integration (VLSI) Systems, Vol. 19, Issue 6
https://doi.org/10.1109/TVLSI.2010.2043694

Electrical, optical, and structural properties of indium–tin–oxide thin films for organic light-emitting devices
journal, December 1999

Kim, H.; Gilmore, C. M.; Piqué, A.
Journal of Applied Physics, Vol. 86, Issue 11
https://doi.org/10.1063/1.371708

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
patent-application, September 2010

Sera, Yuji; Okuda, Kazuhiro
US Patent Application 12/728501; 20100248476
URL: https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/20100248476

Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes
journal, January 2004

Goldfarb, Dario L.; Mahorowala, Arpan P.; Gallatin, Gregg M.
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 22, Issue 2
https://doi.org/10.1116/1.1667513

CD characterization of nanostructures in SEM metrology
journal, January 2007

Frase, Carl Georg; Buhr, Egbert; Dirscherl, Kai
Measurement Science and Technology, Vol. 18, Issue 2
https://doi.org/10.1088/0957-0233/18/2/S26

Reduction of line edge roughness in the top surface imaging process
journal, November 1998

Mori, Shigeyasu; Morisawa, Taku; Matsuzawa, Nobuyuki
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 16, Issue 6, Article No. 3739
https://doi.org/10.1116/1.590409

Plasma processing method
patent-application, May 2005

Yamaguchi, Tomoyo; Fuse, Takashi; Fujimoto, Kiwamu
US Patent Application 10/959152; 20050103748
URL: https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/20050103748

Cyclic trimeric hydroxy, amido, phosphido, and arsenido derivatives of aluminum and gallium. X-ray structures of [tert-Bu2Ga(.mu.-OH)]3 and [tert-Bu2Ga(.mu.-NH2)]3
journal, January 1993

Atwood, David A.; Cowley, Alan H.; Harris, Paul R.
Organometallics, Vol. 12, Issue 1
https://doi.org/10.1021/om00025a010

Optical Characterization and Process Control of Top Surface Imaging
journal, January 1999

Luo, Ying-Ying; Stauffer, Craig; Ygartua, Carlos
MRS Proceedings, Vol. 584
https://doi.org/10.1557/PROC-584-183

Characterization of tin doped indium oxide films prepared by electron beam evaporation
journal, January 1986

Banerjee, Ratnabali; Das, Debajyoti; Ray, Swati
Solar Energy Materials, Vol. 13, Issue 1
https://doi.org/10.1016/0165-1633(86)90024-9

Enhanced Lithographic Imaging Layer Meets Semiconductor Manufacturing Specification a Decade Early
journal, April 2012

Tseng, Yu-Chih; Mane, Anil U.; Elam, Jeffrey W.
Advanced Materials, Vol. 24, Issue 19, p. 2608-2613
https://doi.org/10.1002/adma.201104871

Method for making a chemical contrast pattern using block copolymers and sequential infiltration synthesis
patent, December 2014

Chapuis, Yves-Andre; Ruiz, Ricardo; Wan, Lei
US Patent Document 8,900,467
URL: https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/8900467

High Precision Etching of Si/SiO[sub 2] on a High-Density Helicon Etcher for Nanoscale Devices
journal, January 2003

Dreeskornfeld, L.; Hartwich, J.; Kretz, J.
Journal of The Electrochemical Society, Vol. 150, Issue 11
https://doi.org/10.1149/1.1614272

Nanoscopic Patterned Materials with Tunable Dimensions via Atomic Layer Deposition on Block Copolymers
journal, September 2010

Peng, Qing; Tseng, Yu-Chih; Darling, Seth B.
Advanced Materials, Vol. 22, Issue 45, p. 5129-5133
https://doi.org/10.1002/adma.201002465

Indium Oxide Atomic Layer Deposition Facilitated by the Synergy between Oxygen and Water
journal, April 2011

Libera, Joseph A.; Hryn, John N.; Elam, Jeffrey W.
Chemistry of Materials, Vol. 23, Issue 8
https://doi.org/10.1021/cm103637t

Block Copolymer Lithography: Periodic Arrays of 10¹¹ Holes in 1 Square Centimeter
journal, May 1997

Park, Miri; Harrison, Christopher; Chaikin, Paul M.
Science, Vol. 276, Issue 5317, p. 1401-1404
https://doi.org/10.1126/science.276.5317.1401

A Route to Nanoscopic Materials via Sequential Infiltration Synthesis on Block Copolymer Templates
journal, May 2011

Peng, Qing; Tseng, Yu-Chih; Darling, Seth B.
ACS Nano, Vol. 5, Issue 6, p. 4600-4606
https://doi.org/10.1021/nn2003234

Enhanced polymeric lithography resists via sequential infiltration synthesis
journal, July 2011

Tseng, Yu-Chih; Peng, Qing; Ocola, Leonidas E.
Journal of Materials Chemistry, Vol. 21, Issue 32, 11722-11725
https://doi.org/10.1039/c1jm12461g

Etch properties of resists modified by sequential infiltration synthesis
journal, November 2011

Tseng, Yu-Chih; Peng, Qing; Ocola, Leonidas E.
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 29, Issue 6, Article No. 06FG01
https://doi.org/10.1116/1.3640758

Methods Of Utilizing Block Copolymer To Form Patterns
patent-application, April 2010

Sills, Scott; Millward, Dan
US Patent Application 12/248219; 20100092873
URL: https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/20100092873

Optimized surface silylation of chemically amplified epoxidized photoresists for micromachining applications
journal, April 2010

Kontziampasis, D.; Beltsios, K.; Tegou, E.
Journal of Applied Polymer Science, Vol. 117, Issue 4, p. 2189-2195
https://doi.org/10.1002/app.31644

Hierarchical self-assembly of metal nanostructures on diblock copolymer scaffolds
journal, December 2001

Lopes, Ward A.; Jaeger, Heinrich M.
Nature, Vol. 414, Issue 6865, p. 735-738
https://doi.org/10.1038/414735a

Bilayer silylation process for 193-nm lithography
conference, June 1999

Satou, Isao; Kuhara, Koichi; Endo, Masayuki
SPIE Proceedings
https://doi.org/10.1117/12.350208

Methods of laser processing photoresist in a gaseous environment
patent, March 2015

Zafiropoulo, Arthur W.; Hawryluk, Andrew M.
US Patent Document 8,986,562
URL: https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/8986562

Ordered Nanoscale Domains by Infiltration of Block Copolymers
patent-application, February 2012

Darling, Seth B.; Elam, Jeffrey; Tseng, Yu-Chih
US Patent Application 13/209190; 20120046421
URL: https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/20120046421

Study on line edge roughness for electron beam acceleration voltages from 50 to 5 kV
journal, January 2009

Rio, D.; Constancias, C.; Saied, M.
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 27, Issue 6
https://doi.org/10.1116/1.3253650

Line edge roughness of sub-100 nm dense and isolated features: Experimental study
journal, January 2003

Ma, Yuansheng; Tsvid, G.; Cerrina, Franco
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 21, Issue 6
https://doi.org/10.1116/1.1624254

Study of the fundamental contributions to line edge roughness in a 193 nm, top surface imaging system
journal, January 2000

Somervell, Mark H.; Fryer, David S.; Osborn, Brian
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 18, Issue 5
https://doi.org/10.1116/1.1289547

Temperature-Dependent Subsurface Growth during Atomic Layer Deposition on Polypropylene and Cellulose Fibers
journal, June 2010

Jur, Jesse S.; Spagnola, Joseph C.; Lee, Kyoungmi
Langmuir, Vol. 26, Issue 11
https://doi.org/10.1021/la904604z

TRILAYER RESIST SCHEME FOR GATE ETCHING APPLICATIONS
patent-application, April 2009

Fuller, Nicholas C.; Dalton, Timothy J.; Zhang, Ying
US Patent Application 12/245946; 20090101985
URL: https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/20090101985

Accurate vapor pressure equation for trimethylindium in OMVPE
journal, April 2008

Shenai-Khatkhate, Deodatta V.; DiCarlo, Ronald L.; Ware, Robert A.
Journal of Crystal Growth, Vol. 310, Issue 7-9
https://doi.org/10.1016/j.jcrysgro.2007.11.196

Toward reliable density functional methods without adjustable parameters: The PBE0 model
journal, April 1999

Adamo, Carlo; Barone, Vincenzo
The Journal of Chemical Physics, Vol. 110, Issue 13
https://doi.org/10.1063/1.478522

Hydrolysis of tri-tert-butylaluminum: the first structural characterization of alkylalumoxanes [(R2Al)2O]n and (RAlO)n
journal, June 1993

Mason, Mark R.; Smith, Janna M.; Bott, Simon G.
Journal of the American Chemical Society, Vol. 115, Issue 12
https://doi.org/10.1021/ja00065a005

SELECTIVE ATOMIC LAYER DEPOSITION OF PASSIVATION LAYERS FOR SILICON-BASED PHOTOVOLTAIC DEVICES
patent-application, June 2013

VAIDYA, Kaushik; PONNEKANTI, Hari K.
US Patent Applicatioin 13/715767; 20130157409
URL: https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/20130157409

Integrated Silylation and Dry Development of Resist for sub-0.15.MU.m Top Surface Imaging Applications.
journal, January 1998

Vertommen, Johan; Klippert, Walter; Goethals, Anne-Marie
Journal of Photopolymer Science and Technology, Vol. 11, Issue 4
https://doi.org/10.2494/photopolymer.11.597

Block Co-Polymer Photoresist
patent-application, August 2013

Cooper, Gregory D.; Wehrenberg, Brian L.
US Patent Application 13/764514; 20130207238
URL: https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/20130207238

Method for line density multiplication using block copolymers and sequential infiltration synthesis
patent, August 2016

Arora, Hitesh; Ruiz, Ricardo
US Patent Document 9,416,447
URL: https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/9416447

Indium Tin Oxide Films: State-of-the-Art In Synthesis and Properties
journal, January 1995

Kumar, R.
Materials Technology, Vol. 10, Issue 9-10
https://doi.org/10.1080/10667857.1995.11752629

Ordered nanoscale domains by infiltration of block copolymers
patent, November 2016

Darling, Seth B.; Elam, Jeffrey W.; Tseng, Yu-Chih
US Patent Document 9,487,600
URL: https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/9487600

Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature
journal, November 2000

Zhang, Keran; Zhu, Furong; Huan, C. H. A.
Thin Solid Films, Vol. 376, Issue 1-2, p. 255-263
https://doi.org/10.1016/S0040-6090(00)01418-8

Complementary replacement of material
patent, July 2008

Lin, Burn Jeng; Lin, Hua-Tai; Liu, Ru-Gun
US Patent Document 7,399,709
URL: https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7399709

Enhanced Block Copolymer Lithography Using Sequential Infiltration Synthesis
journal, July 2011

Tseng, Yu-Chih; Peng, Qing; Ocola, Leonidas E.
The Journal of Physical Chemistry C, Vol. 115, Issue 36, p. 17725-17729
https://doi.org/10.1021/jp205532e

High sensitive negative silylation process for 193nm lithography
journal, June 2000

Endo, M.; Satou, I.; Watanabe, H.
Microelectronic Engineering, Vol. 53, Issue 1-4, p. 485-488
https://doi.org/10.1016/S0167-9317(00)00361-0

Profile evolution during polysilicon gate etching with low-pressure high-density Cl2/HBr/O2 plasma chemistries
journal, May 2001

Tuda, Mutumi; Shintani, Kenji; Ootera, Hiroki
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 19, Issue 3
https://doi.org/10.1116/1.1365135

Method for Forming a Block Copolymer Pattern
patent-application, August 2011

Buriak, Jillian; Chai, Jinan; Harris, Kenneth
US Patent Application 13/022584; 20110206905
URL: https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/20110206905

Method of Controlling Orientation of Domains in Block Copolymer Films
patent-application, July 2009

Cheng, Joy; Kim, Ho-Cheol; Sanders, Daniel P.
US Patent Application 12/060516; 20090181171
URL: https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/20090181171

Method for manufacturing porous structure and method for forming pattern
patent-application, October 2006

Asakawa, Koji; Hiraoka, Toshiro; Akasaka, Yoshihiro
US Patent Application 11/455916; 20060231525
URL: https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/20060231525

Ab initio molecular simulations with numeric atom-centered orbitals
journal, November 2009

Blum, Volker; Gehrke, Ralf; Hanke, Felix
Computer Physics Communications, Vol. 180, Issue 11
https://doi.org/10.1016/j.cpc.2009.06.022

Application of Plasmask R resist and the DESIRE process to lithography at 248 nm
journal, November 1990

Hutton, Richard S.
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 8, Issue 6
https://doi.org/10.1116/1.585105

XPS O 1s binding energies for polymers containing hydroxyl, ether, ketone and ester groups
journal, May 1991

López, Gabriel P.; Castner, David G.; Ratner, Buddy D.
Surface and Interface Analysis, Vol. 17, Issue 5
https://doi.org/10.1002/sia.740170508

Analysis of Poly(methyl methacrylate) (PMMA) by XPS
journal, April 1996

Girardeaux, Christophe; Pireaux, Jean-Jacques
Surface Science Spectra, Vol. 4, Issue 2
https://doi.org/10.1116/1.1247813

SEQUENTIAL INFILTRATION SYNTHESIS FOR ADVANCED LITHOGRAPHY
patent-application, September 2012

Darling, Seth B.; Elam, Jeffrey W.; Tseng, Yu-Chih
US Patent Application 13/427619 ; 20120241411
URL: https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/20120241411

An experimentally validated analytical model for gate line-edge roughness (LER) effects on technology scaling
journal, June 2001

Diaz, C. H.
IEEE Electron Device Letters, Vol. 22, Issue 6
https://doi.org/10.1109/55.924844

Mobility analysis of surface roughness scattering in FinFET devices
journal, August 2011

Lee, Jae Woo; Jang, Doyoung; Mouis, Mireille
Solid-State Electronics, Vol. 62, Issue 1, p. 195-201
https://doi.org/10.1016/j.sse.2011.04.020

Nanoscopic Morphologies in Block Copolymer Nanorods as Templates for Atomic-Layer Deposition of Semiconductors
journal, April 2009

Wang, Yong; Qin, Yong; Berger, Andreas
Advanced Materials, Vol. 21, Issue 27, p. 2763-2766
https://doi.org/10.1002/adma.200900136