SOFC interconnect barriers and methods of making same using masks
Abstract
A novel method to produce thin films spatially disposed on desired areas of workpieces is disclosed. Examples of include the formation of a yttria stabilized zirconia (YSZ) film formed on a desired portion of a stainless steel interconnect for solid oxide fuel cells by Atomic Layer Deposition (ALD). A number of methods to produce the spatially disposed YSZ film structures are described including polymeric and silicone rubber masks. The thin film structures have utility for preventing the reaction of glasses with metals, in particular alkali-earth containing glasses with ferritic stainless steels, allowing high temperature bonding of these materials.
- Inventors:
- Issue Date:
- Research Org.:
- Sonata Scientific LLC, Bethel, CT (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1632480
- Patent Number(s):
- 10541429
- Application Number:
- 15/790,023
- Assignee:
- Sonata Scientific LLC (Bethel, CT)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01M - PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE Y02E - REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- DOE Contract Number:
- SC0011274
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 10/22/2017
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 36 MATERIALS SCIENCE
Citation Formats
Roeder, Jeffrey F., and Van Buskirk, Peter C. SOFC interconnect barriers and methods of making same using masks. United States: N. p., 2020.
Web.
Roeder, Jeffrey F., & Van Buskirk, Peter C. SOFC interconnect barriers and methods of making same using masks. United States.
Roeder, Jeffrey F., and Van Buskirk, Peter C. Tue .
"SOFC interconnect barriers and methods of making same using masks". United States. https://www.osti.gov/servlets/purl/1632480.
@article{osti_1632480,
title = {SOFC interconnect barriers and methods of making same using masks},
author = {Roeder, Jeffrey F. and Van Buskirk, Peter C.},
abstractNote = {A novel method to produce thin films spatially disposed on desired areas of workpieces is disclosed. Examples of include the formation of a yttria stabilized zirconia (YSZ) film formed on a desired portion of a stainless steel interconnect for solid oxide fuel cells by Atomic Layer Deposition (ALD). A number of methods to produce the spatially disposed YSZ film structures are described including polymeric and silicone rubber masks. The thin film structures have utility for preventing the reaction of glasses with metals, in particular alkali-earth containing glasses with ferritic stainless steels, allowing high temperature bonding of these materials.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2020},
month = {1}
}
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