Title: Broad band tunable energy electron beam pulser

Abstract

An electromagnetic mechanical pulser implements a transverse wave metallic comb stripline TWMCS kicker having inwardly opposing teeth structured to retard a phase velocity of an RF traveling wave propagated therethrough to match the kinetic velocity of a continuous electron beam simultaneously propagated therethrough. The kicker imposes transverse oscillations onto the beam, which is subsequently chopped into pulses by an aperture. The RF phase velocity is substantially independent of RF frequency and amplitude, thereby enabling independent tuning of the electron pulse widths and repetition rate. The exterior surface of the kicker is conductive, thereby avoiding electron charging. In embodiments, various elements of the kicker and/or aperture can be mechanically varied to provide further tuning of the pulsed electron beam. A divergence suppression section can include a mirror TWMCS and/or magnetic quadrupoles. RF can be applied to a down-selecting TWMCS downstream of the aperture to reduce the pulse repetition rate.

Inventors:

Jing, Chunguang; Qiu, Jiaqi; Liu, Ao; Montgomery, Eric John; Zhao, Yubin; Rush, Wade; Kostin, Roman; Kanareykin, Alexei

Issue Date:

2019-12-24

Research Org.:

Euclid Techlabs, LLC, Solon, OH (United States)

Sponsoring Org.:

USDOE

OSTI Identifier:

1600432

Patent Number(s):

10515733

Application Number:

16/393,469

Assignee:

Euclid Techlabs, LLC (Solon, OH)

Patent Classifications (CPCs):

G - PHYSICS G21 - NUCLEAR PHYSICS G21K - TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS

Show more

G - PHYSICS G21 - NUCLEAR PHYSICS G21K - TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR

G21K1/043 - {changing time structure of beams by mechanical means, e.g. choppers, spinning filter wheels}

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS

H01J2237/0432 - High speed and short duration
H01J2237/0453 - multiple apertures
H01J2237/0455 - with variable aperture
H01J2237/083 - Beam forming
H01J2237/1512 - Travelling wave deflectors
H01J2237/24507 - Intensity, dose or other characteristics of particle beams or electromagnetic radiation
H01J2237/26 - Electron or ion microscopes
H01J37/045 - {Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge}
H01J37/06 - Electron sources

H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE

H05H13/00 - Magnetic resonance accelerators
H05H9/048 - {Lepton LINACS}

Show less

DOE Contract Number:  

SC0013121

Resource Type:

Patent

Resource Relation:

Patent File Date: 04/24/2019

Country of Publication:

United States

Language:

English