Self-alignment features for III-V ridge process and angled facet die

Barwicz, Tymon; Martin, Yves C.; Orcutt, Jason S.

Title: Self-alignment features for III-V ridge process and angled facet die

Abstract

A method of forming a laser including device is provided that in one embodiment includes providing a laser chip including at least one ridge structure that provides an alignment features. The method further includes bonding a type IV photonics chip to the laser chip, wherein a vertical alignment feature from the type IV photonics chip is inserted in a recess relative to the at least one ridge structure that provides the alignment features of the laser structure.

Inventors:: Barwicz, Tymon; Martin, Yves C.; Orcutt, Jason S.

Issue Date:: 2019-11-26

Research Org.:: International Business Machines Corp., Armonk, NY (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 1600339

Patent Number(s):: 10490971

Application Number:: 15/618,958

Assignee:: International Business Machines Corporation (Armonk, NY)

Patent Classifications (CPCs):: H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01S - DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT

Show more

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01S - DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT
H01S5/04252 - {characterised by the material}
H01S2301/176 - Specific passivation layers on surfaces other than the emission facet
H01S5/22 - having a ridge or stripe structure

Show less

DOE Contract Number:: AR0000540

Resource Type:: Patent

Resource Relation:: Patent File Date: 06/09/2017

Country of Publication:: United States

Language:: English

Subject:: 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; 42 ENGINEERING

Citation Formats


                    Barwicz, Tymon, Martin, Yves C., and Orcutt, Jason S. Self-alignment features for III-V ridge process and angled facet die.  United States: N. p., 2019. 
        Web.

Copy to clipboard


                    Barwicz, Tymon, Martin, Yves C., & Orcutt, Jason S. Self-alignment features for III-V ridge process and angled facet die.  United States.

Copy to clipboard


                    Barwicz, Tymon, Martin, Yves C., and Orcutt, Jason S. Tue .  
        "Self-alignment features for III-V ridge process and angled facet die".  United States.  https://www.osti.gov/servlets/purl/1600339.

Copy to clipboard


                    
@article{osti_1600339,

  title        = {Self-alignment features for III-V ridge process and angled facet die},

  author       = {Barwicz, Tymon and Martin, Yves C. and Orcutt, Jason S.},

  abstractNote = {A method of forming a laser including device is provided that in one embodiment includes providing a laser chip including at least one ridge structure that provides an alignment features. The method further includes bonding a type IV photonics chip to the laser chip, wherein a vertical alignment feature from the type IV photonics chip is inserted in a recess relative to the at least one ridge structure that provides the alignment features of the laser structure.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2019},

  month        = {11}

}

Copy to clipboard

Patent:

View Patent

Save / Share:

Export Metadata

Save to My Library

Works referenced in this record:

Method of manufacturing a semiconductor device with outline of cleave marking regions and alignment or registration features
patent, August 2006

O'Gorman, James Christopher
US Patent Document 7,083,994
URL: http://patft.uspto.gov/netacgi/nph-Parser?patentnumber=7083994

Surface emitting and receiving photonic device with lens
patent, July 2007

Behfar, Alex A.; Schremer, Jr., Alfred T.; Stagarescu, Cristian B.
US Patent Document 7,245,645
URL: http://patft.uspto.gov/netacgi/nph-Parser?patentnumber=7245645

Process for forming the ridge structure of a self-aligned semiconductor laser
patent, October 1991

Harder, Christoph S.; Heuberger, Wilhelm; Hoh, Peter D.
US Patent Document 5,059,552
URL: http://patft.uspto.gov/netacgi/nph-Parser?patentnumber=5059552

High reliability etched-facet photonic devices
patent, July 2014

Behfar, Alex A.
US Patent Document 8,787,419
URL: http://patft.uspto.gov/netacgi/nph-Parser?patentnumber=8787419

Photonic chip mounting in a recess for waveguide alignment and connection
patent, May 2005

Zhou, Yan; Ho, Seng-Tiong
US Patent Document 6,888,989
URL: http://patft.uspto.gov/netacgi/nph-Parser?patentnumber=6888989

Assembly of electronic and optical devices
patent, June 2016

Barwicz, Tymon; Dang, Bing
US Patent Document 9,364,925
URL: http://patft.uspto.gov/netacgi/nph-Parser?patentnumber=9364925

Self-aligned optical waveguide to laser structure and method for making the same
patent, November 1993

Bona, Gian-Luca Luca; Gfeller, Fritz R.; Jaeckel, Heinz
US Patent Document 5,259,049
URL: http://patft.uspto.gov/netacgi/nph-Parser?patentnumber=5259049

Alignment apparatus and method for aligning stacked devices
patent, November 2007

Steinberg, Dan A.; Dautartas, Mindaugas; Rasnake, Jasean
US Patent Document 7,290,321
URL: http://patft.uspto.gov/netacgi/nph-Parser?patentnumber=7290321

Similar Records in DOE Patents and OSTI.GOV collections:

Method of fabricating vertically aligned group III-V nanowires

Patent Wang, George T; Li, Qiming

A top-down method of fabricating vertically aligned Group III-V micro- and nanowires uses a two-step etch process that adds a selective anisotropic wet etch after an initial plasma etch to remove the dry etch damage while enabling micro/nanowires with straight and smooth faceted sidewalls and controllable diameters independent of pitch. The method enables the fabrication of nanowire lasers, LEDs, and solar cells.
Full Text Available
Silicon cells made by self-aligned selective-emitter plasma-etchback process

Patent Ruby, Douglas S [Albuquerque, NM]; Schubert, William K [Albuquerque, NM]; Gee, James M [Albuquerque, NM]; ...

Photovoltaic cells and methods for making them are disclosed wherein the metallized grids of the cells are used to mask portions of cell emitter regions to allow selective etching of phosphorus-doped emitter regions. The preferred etchant is SF.sub.6 or a combination of SF.sub.6 and O.sub.2. This self-aligned selective etching allows for enhanced blue response (versus cells with uniform heavy doping of the emitter) while preserving heavier doping in the region beneath the gridlines needed for low contact resistance. Embodiments are disclosed for making cells with or without textured surfaces. Optional steps include plasma hydrogenation and PECVD nitride deposition, each ofmore » « less
Full Text Available
Silicon solar cells made by a self-aligned, selective-emitter, plasma-etchback process

Patent Ruby, Douglas S [Albuquerque, NM]; Schubert, William K [Albuquerque, NM]; Gee, James M [Albuquerque, NM]

A potentially low-cost process for forming and passivating a selective emitter. The process uses a plasma etch of the heavily doped emitter to improve its performance. The grids of the solar cell are used to mask the plasma etch so that only the emitter in the region between the grids is etched, while the region beneath the grids remains heavily doped for low contact resistance. This process is potentially low-cost because it requires no alignment. After the emitter etch, a silicon nitride layer is deposited by plasma-enhanced, chemical vapor deposition, and the solar cell is annealed in a forming gas.
Full Text Available
Process for forming shaped group III-V semiconductor nanocrystals, and product formed using process

Patent Alivisatos, A Paul [Oakland, CA]; Peng, Xiaogang [Fayetteville, AR]; Manna, Liberato [Palo del Colle, IT]

A process for the formation of shaped Group III-V semiconductor nanocrystals comprises contacting the semiconductor nanocrystal precursors with a liquid media comprising a binary mixture of phosphorus-containing organic surfactants capable of promoting the growth of either spherical semiconductor nanocrystals or rod-like semiconductor nanocrystals, whereby the shape of the semiconductor nanocrystals formed in said binary mixture of surfactants is controlled by adjusting the ratio of the surfactants in the binary mixture.
Full Text Available
Alignment and focus of mirrored facets of a heliosat

Patent Yellowhair, Julius E; Ho, Clifford Kuofei; Diver, Richard B; ...

Various technologies pertaining to aligning and focusing mirrored facets of a heliostat are described herein. Updating alignment and/or focus of mirrored facets is undertaken through generation of a theoretical image, wherein the theoretical image is indicative of a reflection of the target via the mirrored facets when the mirrored facets are properly aligned. This theoretical image includes reference points that are overlaid on an image of the target as reflected by the mirrored facets of the heliostat. A technician adjusts alignment/focus of a mirrored facet by causing reflected reference markings to become aligned with the reference points in the theoreticalmore » image. « less
Full Text Available

Similar Records

Title: Self-alignment features for III-V ridge process and angled facet die

Abstract

Citation Formats

Method of manufacturing a semiconductor device with outline of cleave marking regions and alignment or registration features patent, August 2006

Surface emitting and receiving photonic device with lens patent, July 2007

Process for forming the ridge structure of a self-aligned semiconductor laser patent, October 1991

High reliability etched-facet photonic devices patent, July 2014

Photonic chip mounting in a recess for waveguide alignment and connection patent, May 2005

Assembly of electronic and optical devices patent, June 2016

Self-aligned optical waveguide to laser structure and method for making the same patent, November 1993

Alignment apparatus and method for aligning stacked devices patent, November 2007

Method of manufacturing a semiconductor device with outline of cleave marking regions and alignment or registration features
patent, August 2006

Surface emitting and receiving photonic device with lens
patent, July 2007

Process for forming the ridge structure of a self-aligned semiconductor laser
patent, October 1991

High reliability etched-facet photonic devices
patent, July 2014

Photonic chip mounting in a recess for waveguide alignment and connection
patent, May 2005

Assembly of electronic and optical devices
patent, June 2016

Self-aligned optical waveguide to laser structure and method for making the same
patent, November 1993

Alignment apparatus and method for aligning stacked devices
patent, November 2007