High performance SRF accelerator structure and method
Abstract
A high performance accelerator structure and method of production. The method includes precision machining the inner surfaces of a pair of half-cells that are maintained in an inert atmosphere and at a temperature of 100 K or less. The method includes removing thin layers of the inner surfaces of the half-cells after which the roughness of the inner surfaces in measured with a profilimeter. Additional thin layers are removed until the inner surfaces of the half-cell measure less than 2 nm root mean square (RMS) roughness over a 1 mm2 area on the profilimeter. The two half-cells are welded together in an inert atmosphere to form an SRF cavity. The resultant SRF cavity includes a high accelerating gradient (Eacc) and a high quality factor (Q0).
- Inventors:
- Issue Date:
- Research Org.:
- Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1600314
- Patent Number(s):
- 10,485,090
- Application Number:
- 15/411,986
- Assignee:
- Jefferson Science Associates, LLC (Newport News, VA)
- DOE Contract Number:
- AC05-06OR23177
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 01/21/2017
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Myneni, Ganapati Rao. High performance SRF accelerator structure and method. United States: N. p., 2019.
Web.
Myneni, Ganapati Rao. High performance SRF accelerator structure and method. United States.
Myneni, Ganapati Rao. Tue .
"High performance SRF accelerator structure and method". United States. https://www.osti.gov/servlets/purl/1600314.
@article{osti_1600314,
title = {High performance SRF accelerator structure and method},
author = {Myneni, Ganapati Rao},
abstractNote = {A high performance accelerator structure and method of production. The method includes precision machining the inner surfaces of a pair of half-cells that are maintained in an inert atmosphere and at a temperature of 100 K or less. The method includes removing thin layers of the inner surfaces of the half-cells after which the roughness of the inner surfaces in measured with a profilimeter. Additional thin layers are removed until the inner surfaces of the half-cell measure less than 2 nm root mean square (RMS) roughness over a 1 mm2 area on the profilimeter. The two half-cells are welded together in an inert atmosphere to form an SRF cavity. The resultant SRF cavity includes a high accelerating gradient (Eacc) and a high quality factor (Q0).},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2019},
month = {11}
}
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