Systems and methods for interferometric end point detection for a focused ion beam fabrication tool

Phillips, Brian Scott; Ball, Steven Norris; Salazar, Gregory Paul; Shul, Randy J.

Title: Systems and methods for interferometric end point detection for a focused ion beam fabrication tool

Abstract

Various technologies for providing an operator of a focused ion beam (FIB) system with navigational and processing data are described herein. An exemplary system includes a broadband light source and a narrowband light source that emit light to a target of the FIB. An optical detector receives reflections of the broadband light from the target and outputs data that is used to generate two-dimensional images of the target in a region near a location of incidence of the FIB at the target. An interferometer receives reflections of the narrowband light from the target and outputs data indicative of an interference pattern of the narrowband reflections. A computing device computes a thickness of one or more material layers that make up the target based upon the interference pattern. A two-dimensional image of the target and an indication of the computed thickness are then displayed to the operator of the FIB.

Inventors:: Phillips, Brian Scott; Ball, Steven Norris; Salazar, Gregory Paul; Shul, Randy J.

Issue Date:: 2019-10-15

Research Org.:: Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)

Sponsoring Org.:: USDOE National Nuclear Security Administration (NNSA)

OSTI Identifier:: 1600167

Patent Number(s):: 10446369

Application Number:: 15/623,239

Assignee:: National Technology & Engineering Solutions of Sandia, LLC (Albuquerque, NM)

Patent Classifications (CPCs):: H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS

G - PHYSICS G01 - MEASURING G01B - MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS

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H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
H01J2237/31749 - Focused ion beam
H01J2237/2482 - Optical means
H01J2237/3174 - Etching microareas
H01J37/3005 - {Observing the objects or the point of impact on the object}

G - PHYSICS G01 - MEASURING G01B - MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS
G01B11/0675 - {using interferometry}

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
H01J37/228 - {whereby illumination and light collection take place in the same area of the discharge}

G - PHYSICS G01 - MEASURING G01B - MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS
G01B11/0683 - {measurement during deposition or removal of the layer}
G01B11/14 - for measuring distance or clearance between spaced objects or spaced apertures

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
H01J2237/30466 - Detecting endpoint of process
H01J2237/31732 - Depositing thin layers on selected microareas
H01J37/3056 - {for microworking, e.g. etching of gratings, trimming of electrical components

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DOE Contract Number:: NA0003525

Resource Type:: Patent

Resource Relation:: Patent File Date: 06/14/2017

Country of Publication:: United States

Language:: English

Subject:: 46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY

Citation Formats


                    Phillips, Brian Scott, Ball, Steven Norris, Salazar, Gregory Paul, and Shul, Randy J. Systems and methods for interferometric end point detection for a focused ion beam fabrication tool.  United States: N. p., 2019. 
        Web.

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                    Phillips, Brian Scott, Ball, Steven Norris, Salazar, Gregory Paul, & Shul, Randy J. Systems and methods for interferometric end point detection for a focused ion beam fabrication tool.  United States.

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                    Phillips, Brian Scott, Ball, Steven Norris, Salazar, Gregory Paul, and Shul, Randy J. Tue .  
        "Systems and methods for interferometric end point detection for a focused ion beam fabrication tool".  United States.  https://www.osti.gov/servlets/purl/1600167.

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@article{osti_1600167,

  title        = {Systems and methods for interferometric end point detection for a focused ion beam fabrication tool},

  author       = {Phillips, Brian Scott and Ball, Steven Norris and Salazar, Gregory Paul and Shul, Randy J.},

  abstractNote = {Various technologies for providing an operator of a focused ion beam (FIB) system with navigational and processing data are described herein. An exemplary system includes a broadband light source and a narrowband light source that emit light to a target of the FIB. An optical detector receives reflections of the broadband light from the target and outputs data that is used to generate two-dimensional images of the target in a region near a location of incidence of the FIB at the target. An interferometer receives reflections of the narrowband light from the target and outputs data indicative of an interference pattern of the narrowband reflections. A computing device computes a thickness of one or more material layers that make up the target based upon the interference pattern. A two-dimensional image of the target and an indication of the computed thickness are then displayed to the operator of the FIB.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2019},

  month        = {10}

}

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Title: Systems and methods for interferometric end point detection for a focused ion beam fabrication tool

Abstract

Citation Formats

Pattern inspection apparatus and electron beam apparatus patent, January 1995

Focused particle beam systems and methods using a tilt column patent, March 2000

Multilayered device micro etching method and system patent, October 1991

Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface patent, July 2007

Portable interferometric device patent, March 2018

Portable Interferometric Device patent-application, February 2015

Quantitative differential interference contrast (DIC) devices for computed depth sectioning patent, February 2014

Portable interferometric device patent, February 2017

Method for making specimen and apparatus thereof patent, August 1997

Focused ion beam metrology patent, August 1998

Focused ion beam processing patent, January 1987

Focused ion beam system with coaxial scanning electron microscope patent, May 2005

Pattern inspection apparatus and electron beam apparatus
patent, January 1995

Focused particle beam systems and methods using a tilt column
patent, March 2000

Multilayered device micro etching method and system
patent, October 1991

Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface
patent, July 2007

Portable interferometric device
patent, March 2018

Portable Interferometric Device
patent-application, February 2015

Quantitative differential interference contrast (DIC) devices for computed depth sectioning
patent, February 2014

Portable interferometric device
patent, February 2017

Method for making specimen and apparatus thereof
patent, August 1997

Focused ion beam metrology
patent, August 1998

Focused ion beam processing
patent, January 1987

Focused ion beam system with coaxial scanning electron microscope
patent, May 2005