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Title: Systems and methods for interferometric end point detection for a focused ion beam fabrication tool

Abstract

Various technologies for providing an operator of a focused ion beam (FIB) system with navigational and processing data are described herein. An exemplary system includes a broadband light source and a narrowband light source that emit light to a target of the FIB. An optical detector receives reflections of the broadband light from the target and outputs data that is used to generate two-dimensional images of the target in a region near a location of incidence of the FIB at the target. An interferometer receives reflections of the narrowband light from the target and outputs data indicative of an interference pattern of the narrowband reflections. A computing device computes a thickness of one or more material layers that make up the target based upon the interference pattern. A two-dimensional image of the target and an indication of the computed thickness are then displayed to the operator of the FIB.

Inventors:
; ; ;
Issue Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1600167
Patent Number(s):
10446369
Application Number:
15/623,239
Assignee:
National Technology & Engineering Solutions of Sandia, LLC (Albuquerque, NM)
Patent Classifications (CPCs):
G - PHYSICS G01 - MEASURING G01B - MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
DOE Contract Number:  
NA0003525
Resource Type:
Patent
Resource Relation:
Patent File Date: 06/14/2017
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY

Citation Formats

Phillips, Brian Scott, Ball, Steven Norris, Salazar, Gregory Paul, and Shul, Randy J. Systems and methods for interferometric end point detection for a focused ion beam fabrication tool. United States: N. p., 2019. Web.
Phillips, Brian Scott, Ball, Steven Norris, Salazar, Gregory Paul, & Shul, Randy J. Systems and methods for interferometric end point detection for a focused ion beam fabrication tool. United States.
Phillips, Brian Scott, Ball, Steven Norris, Salazar, Gregory Paul, and Shul, Randy J. Tue . "Systems and methods for interferometric end point detection for a focused ion beam fabrication tool". United States. https://www.osti.gov/servlets/purl/1600167.
@article{osti_1600167,
title = {Systems and methods for interferometric end point detection for a focused ion beam fabrication tool},
author = {Phillips, Brian Scott and Ball, Steven Norris and Salazar, Gregory Paul and Shul, Randy J.},
abstractNote = {Various technologies for providing an operator of a focused ion beam (FIB) system with navigational and processing data are described herein. An exemplary system includes a broadband light source and a narrowband light source that emit light to a target of the FIB. An optical detector receives reflections of the broadband light from the target and outputs data that is used to generate two-dimensional images of the target in a region near a location of incidence of the FIB at the target. An interferometer receives reflections of the narrowband light from the target and outputs data indicative of an interference pattern of the narrowband reflections. A computing device computes a thickness of one or more material layers that make up the target based upon the interference pattern. A two-dimensional image of the target and an indication of the computed thickness are then displayed to the operator of the FIB.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2019},
month = {10}
}

Works referenced in this record:

Focused ion beam metrology
patent, August 1998


Charged Particle Beam Processing System with Visual and Infrared Imaging
patent-application, January 2012


Multilayered device micro etching method and system
patent, October 1991


Dithering Methods and Apparatus for Wearable Display Device
patent-application, March 2018


Alternating Pulse Dual-Beam Apparatus, Methods and Systems for Voltage Contrast Behavior Assessment of Microcircuits
patent-application, March 2005


Multi-Layer Diffractive Eyepiece
patent-application, February 2018


Diffractive Eyepiece
patent-application, February 2018


Portable interferometric device
patent, March 2018


Scatterometry Alignment for Imprint Lithography
patent-application, February 2004


Alignment Methods for Imprint Lithography
patent-application, February 2004


Nanograting Method and Apparatus
patent-application, March 2018


Portable Interferometric Device
patent-application, June 2017


Focused ion beam processing
patent, January 1987


Pattern inspection apparatus and electron beam apparatus
patent, January 1995


Projector Architecture Incorporating Artifact Mitigation
patent-application, February 2018


Focused Particle Beam Systems and Methods Using a Tilt Column
patent-application, November 2002


Thermal Dissipation for Wearable Device
patent-application, February 2018


Portable interferometric device
patent, February 2017


Focused particle beam systems and methods using a tilt column
patent, March 2000


Ultra-Thin Optical Coatings and Devices and Methods of Using Ultra-Thin Optical Coatings
patent-application, April 2015


Focused ion beam system with coaxial scanning electron microscope
patent, May 2005


Method for making specimen and apparatus thereof
patent, August 1997


Portable Interferometric Device
patent-application, February 2015


Light-Field Pixel
patent-application, August 2012