Bulk nanofabrication with single atomic plane precision via atomic-level sculpting of crystalline oxides
Abstract
A method for sculpting crystalline oxide structures for bulk nanofabrication is provided. The method includes the controlled electron beam induced irradiation of amorphous and liquid phase precursor solutions using a scanning transmission electron microscope. The atomically focused electron beam includes operating parameters (e.g., location, dwell time, raster speed) that are selected to provide a higher electron dose in patterned areas and a lower electron dose in non-patterned areas. Concurrently with the epitaxial growth of crystalline features, the present method includes scanning the substrate to provide information on the size of the crystalline features with atomic resolution. This approach provides for atomic level sculpting of crystalline oxide materials from a metastable amorphous precursor and the liquid phase patterning of nanocrystals.
- Inventors:
- Issue Date:
- Research Org.:
- Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1576390
- Patent Number(s):
- 10400351
- Application Number:
- 15/697,541
- Assignee:
- UT-Battelle, LLC (Oak Ridge, TN)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C30 - CRYSTAL GROWTH C30B - SINGLE-CRYSTAL-GROWTH
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- DOE Contract Number:
- AC05-00OR22725
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2017 Sep 07
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 36 MATERIALS SCIENCE; 77 NANOSCIENCE AND NANOTECHNOLOGY
Citation Formats
Borisevich, Albina Y., Jesse, Stephen, Kalinin, Sergei V., Lupini, Andrew R., Unocic, Raymond R., and He, Qian. Bulk nanofabrication with single atomic plane precision via atomic-level sculpting of crystalline oxides. United States: N. p., 2019.
Web.
Borisevich, Albina Y., Jesse, Stephen, Kalinin, Sergei V., Lupini, Andrew R., Unocic, Raymond R., & He, Qian. Bulk nanofabrication with single atomic plane precision via atomic-level sculpting of crystalline oxides. United States.
Borisevich, Albina Y., Jesse, Stephen, Kalinin, Sergei V., Lupini, Andrew R., Unocic, Raymond R., and He, Qian. Tue .
"Bulk nanofabrication with single atomic plane precision via atomic-level sculpting of crystalline oxides". United States. https://www.osti.gov/servlets/purl/1576390.
@article{osti_1576390,
title = {Bulk nanofabrication with single atomic plane precision via atomic-level sculpting of crystalline oxides},
author = {Borisevich, Albina Y. and Jesse, Stephen and Kalinin, Sergei V. and Lupini, Andrew R. and Unocic, Raymond R. and He, Qian},
abstractNote = {A method for sculpting crystalline oxide structures for bulk nanofabrication is provided. The method includes the controlled electron beam induced irradiation of amorphous and liquid phase precursor solutions using a scanning transmission electron microscope. The atomically focused electron beam includes operating parameters (e.g., location, dwell time, raster speed) that are selected to provide a higher electron dose in patterned areas and a lower electron dose in non-patterned areas. Concurrently with the epitaxial growth of crystalline features, the present method includes scanning the substrate to provide information on the size of the crystalline features with atomic resolution. This approach provides for atomic level sculpting of crystalline oxide materials from a metastable amorphous precursor and the liquid phase patterning of nanocrystals.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Sep 03 00:00:00 EDT 2019},
month = {Tue Sep 03 00:00:00 EDT 2019}
}
Works referenced in this record:
Charged Particle Beam Apparatus and Method for Operating a Charged Particle Beam Apparatus
patent-application, October 2008
- Frosien, Juergen; Banzhof, Helmut; Levin, Jacob
- US Patent Application 11/923407; 20080258060