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Title: Bulk nanofabrication with single atomic plane precision via atomic-level sculpting of crystalline oxides

Abstract

A method for sculpting crystalline oxide structures for bulk nanofabrication is provided. The method includes the controlled electron beam induced irradiation of amorphous and liquid phase precursor solutions using a scanning transmission electron microscope. The atomically focused electron beam includes operating parameters (e.g., location, dwell time, raster speed) that are selected to provide a higher electron dose in patterned areas and a lower electron dose in non-patterned areas. Concurrently with the epitaxial growth of crystalline features, the present method includes scanning the substrate to provide information on the size of the crystalline features with atomic resolution. This approach provides for atomic level sculpting of crystalline oxide materials from a metastable amorphous precursor and the liquid phase patterning of nanocrystals.

Inventors:
; ; ; ; ;
Issue Date:
Research Org.:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1576390
Patent Number(s):
10400351
Application Number:
15/697,541
Assignee:
UT-Battelle, LLC (Oak Ridge, TN)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
C - CHEMISTRY C30 - CRYSTAL GROWTH C30B - SINGLE-CRYSTAL-GROWTH
DOE Contract Number:  
AC05-00OR22725
Resource Type:
Patent
Resource Relation:
Patent File Date: 2017 Sep 07
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 36 MATERIALS SCIENCE; 77 NANOSCIENCE AND NANOTECHNOLOGY

Citation Formats

Borisevich, Albina Y., Jesse, Stephen, Kalinin, Sergei V., Lupini, Andrew R., Unocic, Raymond R., and He, Qian. Bulk nanofabrication with single atomic plane precision via atomic-level sculpting of crystalline oxides. United States: N. p., 2019. Web.
Borisevich, Albina Y., Jesse, Stephen, Kalinin, Sergei V., Lupini, Andrew R., Unocic, Raymond R., & He, Qian. Bulk nanofabrication with single atomic plane precision via atomic-level sculpting of crystalline oxides. United States.
Borisevich, Albina Y., Jesse, Stephen, Kalinin, Sergei V., Lupini, Andrew R., Unocic, Raymond R., and He, Qian. Tue . "Bulk nanofabrication with single atomic plane precision via atomic-level sculpting of crystalline oxides". United States. https://www.osti.gov/servlets/purl/1576390.
@article{osti_1576390,
title = {Bulk nanofabrication with single atomic plane precision via atomic-level sculpting of crystalline oxides},
author = {Borisevich, Albina Y. and Jesse, Stephen and Kalinin, Sergei V. and Lupini, Andrew R. and Unocic, Raymond R. and He, Qian},
abstractNote = {A method for sculpting crystalline oxide structures for bulk nanofabrication is provided. The method includes the controlled electron beam induced irradiation of amorphous and liquid phase precursor solutions using a scanning transmission electron microscope. The atomically focused electron beam includes operating parameters (e.g., location, dwell time, raster speed) that are selected to provide a higher electron dose in patterned areas and a lower electron dose in non-patterned areas. Concurrently with the epitaxial growth of crystalline features, the present method includes scanning the substrate to provide information on the size of the crystalline features with atomic resolution. This approach provides for atomic level sculpting of crystalline oxide materials from a metastable amorphous precursor and the liquid phase patterning of nanocrystals.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2019},
month = {9}
}

Patent:

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