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Title: System and method for monitoring atomic absorption during a surface modification process

Abstract

A processing system monitors and/or controls a surface modification process occurring on a substrate within a processing chamber. An optical processing module having a light emission submodule to output a generated light signal and an optical detection submodule to detect a resultant light signal, is connected via fiber optic cables to light illuminating and light receiving components located within the chamber. A processor determines an amount of atomic absorption by an atomic element encountered by a probing beam passing between the illuminating and receiving components, based on the intensity of the generated light signal, the intensity of the received light signal and optionally the spontaneous emission of the atomic element in the absence of illumination by a probing beam. Based on the determined amount, the system derives a plurality of parameters of the modified substrate, their spatial and temporal uniformity, and information about process conditions in the processing chamber.

Inventors:
; ;
Issue Date:
Research Org.:
Accustrata, Inc., Rockville, MD (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1576336
Patent Number(s):
10,408,744
Application Number:
15/998,483
Assignee:
Accustrata, Inc. (Rockville, MD)
DOE Contract Number:  
SC0013241
Resource Type:
Patent
Resource Relation:
Patent File Date: 2018 Aug 16
Country of Publication:
United States
Language:
English

Citation Formats

Atanasoff, George, Metting, Christopher, and Von Bredow, Hasso. System and method for monitoring atomic absorption during a surface modification process. United States: N. p., 2019. Web.
Atanasoff, George, Metting, Christopher, & Von Bredow, Hasso. System and method for monitoring atomic absorption during a surface modification process. United States.
Atanasoff, George, Metting, Christopher, and Von Bredow, Hasso. Tue . "System and method for monitoring atomic absorption during a surface modification process". United States. https://www.osti.gov/servlets/purl/1576336.
@article{osti_1576336,
title = {System and method for monitoring atomic absorption during a surface modification process},
author = {Atanasoff, George and Metting, Christopher and Von Bredow, Hasso},
abstractNote = {A processing system monitors and/or controls a surface modification process occurring on a substrate within a processing chamber. An optical processing module having a light emission submodule to output a generated light signal and an optical detection submodule to detect a resultant light signal, is connected via fiber optic cables to light illuminating and light receiving components located within the chamber. A processor determines an amount of atomic absorption by an atomic element encountered by a probing beam passing between the illuminating and receiving components, based on the intensity of the generated light signal, the intensity of the received light signal and optionally the spontaneous emission of the atomic element in the absence of illumination by a probing beam. Based on the determined amount, the system derives a plurality of parameters of the modified substrate, their spatial and temporal uniformity, and information about process conditions in the processing chamber.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2019},
month = {9}
}

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