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Title: Apparatus for controlling heat flow within a silicon melt

Abstract

An apparatus for controlling heat flow within a melt. The apparatus may include a crucible configured to contain the melt where the melt has an exposed surface. The apparatus may also include a heater disposed below a first side of the crucible and configured to supply heat through the melt to the exposed surface, and a heat diffusion barrier assembly comprising at least one heat diffusion barrier disposed within the crucible and defining an isolation region in the melt and an outer region in the melt.

Inventors:
; ; ; ;
Issue Date:
Research Org.:
Varian Semiconductor Equipment Associates, Inc, Gloucester, MA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1576302
Patent Number(s):
10415151
Assignee:
Varian Semiconductor Equipment Associates, Inc. (Gloucester, MA)
Patent Classifications (CPCs):
C - CHEMISTRY C30 - CRYSTAL GROWTH C30B - SINGLE-CRYSTAL-GROWTH
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
DOE Contract Number:  
EE0000595
Resource Type:
Patent
Resource Relation:
Patent File Date: 2014 Mar 27
Country of Publication:
United States
Language:
English

Citation Formats

Kellerman, Peter L., Carlson, Frederick M., Morrell, David, Moradian, Ala, and Desai, Nandish. Apparatus for controlling heat flow within a silicon melt. United States: N. p., 2019. Web.
Kellerman, Peter L., Carlson, Frederick M., Morrell, David, Moradian, Ala, & Desai, Nandish. Apparatus for controlling heat flow within a silicon melt. United States.
Kellerman, Peter L., Carlson, Frederick M., Morrell, David, Moradian, Ala, and Desai, Nandish. Tue . "Apparatus for controlling heat flow within a silicon melt". United States. https://www.osti.gov/servlets/purl/1576302.
@article{osti_1576302,
title = {Apparatus for controlling heat flow within a silicon melt},
author = {Kellerman, Peter L. and Carlson, Frederick M. and Morrell, David and Moradian, Ala and Desai, Nandish},
abstractNote = {An apparatus for controlling heat flow within a melt. The apparatus may include a crucible configured to contain the melt where the melt has an exposed surface. The apparatus may also include a heater disposed below a first side of the crucible and configured to supply heat through the melt to the exposed surface, and a heat diffusion barrier assembly comprising at least one heat diffusion barrier disposed within the crucible and defining an isolation region in the melt and an outer region in the melt.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2019},
month = {9}
}

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Works referenced in this record:

Method and apparatus for manufacturing silicon single crystals
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1,5-Benzothiazepine compounds
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Silicon ribbon growth wheel and method for heat flow control therein
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