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Title: Wafer-based charged particle accelerator, wafer components, methods, and applications

Abstract

A wafer-based charged particle accelerator includes a charged particle source and at least one RF charged particle accelerator wafer sub-assembly and a power supply coupled to the at least one RF charged particle accelerator wafer sub-assembly. The wafer-based charged particle accelerator may further include a beam current-sensor. The wafer-based charged particle accelerator may further include at least a second RF charged particle accelerator wafer sub-assembly and at least one ESQ charged particle focusing wafer. Fabrication methods are disclosed for RF charged particle accelerator wafer sub-assemblies, ESQ charged particle focusing wafers, and the wafer-based charged particle accelerator.

Inventors:
; ; ; ; ; ; ;
Issue Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1568732
Patent Number(s):
10,383,205
Application Number:
16/098,537
Assignee:
Cornell University (Ithaca, NY)
DOE Contract Number:  
AC02-05CH11231
Resource Type:
Patent
Resource Relation:
Patent File Date: 05/04/2017
Country of Publication:
United States
Language:
English

Citation Formats

Lal, Amit K., Schenkel, Thomas, Persaud, Arun, Ji, Qing, Seidl, Peter, Waldron, Will, Ardanuc, Serhan, and Kadayra Basavarajappa, Vinaya Kumar. Wafer-based charged particle accelerator, wafer components, methods, and applications. United States: N. p., 2019. Web.
Lal, Amit K., Schenkel, Thomas, Persaud, Arun, Ji, Qing, Seidl, Peter, Waldron, Will, Ardanuc, Serhan, & Kadayra Basavarajappa, Vinaya Kumar. Wafer-based charged particle accelerator, wafer components, methods, and applications. United States.
Lal, Amit K., Schenkel, Thomas, Persaud, Arun, Ji, Qing, Seidl, Peter, Waldron, Will, Ardanuc, Serhan, and Kadayra Basavarajappa, Vinaya Kumar. Tue . "Wafer-based charged particle accelerator, wafer components, methods, and applications". United States. https://www.osti.gov/servlets/purl/1568732.
@article{osti_1568732,
title = {Wafer-based charged particle accelerator, wafer components, methods, and applications},
author = {Lal, Amit K. and Schenkel, Thomas and Persaud, Arun and Ji, Qing and Seidl, Peter and Waldron, Will and Ardanuc, Serhan and Kadayra Basavarajappa, Vinaya Kumar},
abstractNote = {A wafer-based charged particle accelerator includes a charged particle source and at least one RF charged particle accelerator wafer sub-assembly and a power supply coupled to the at least one RF charged particle accelerator wafer sub-assembly. The wafer-based charged particle accelerator may further include a beam current-sensor. The wafer-based charged particle accelerator may further include at least a second RF charged particle accelerator wafer sub-assembly and at least one ESQ charged particle focusing wafer. Fabrication methods are disclosed for RF charged particle accelerator wafer sub-assemblies, ESQ charged particle focusing wafers, and the wafer-based charged particle accelerator.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2019},
month = {8}
}

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