Method and apparatus for wavefront sensing

Bahk, Seung-Whan

Title: Method and apparatus for wavefront sensing

Abstract

A method for performing optical wavefront sensing includes providing an amplitude transmission mask having a light input side, a light output side, and an optical transmission axis passing from the light input side to the light output side. The amplitude transmission mask is characterized by a checkerboard pattern having a square unit cell of size Λ. The method also includes directing an incident light field having a wavelength λ to be incident on the light input side and propagating the incident light field through the amplitude transmission mask. The method further includes producing a plurality of diffracted light fields on the light output side and detecting, at a detector disposed a distance L from the amplitude transmission mask, an interferogram associated with the plurality of diffracted light fields. The relation is satisfied, where n is an integer greater than zero.

Inventors:: Bahk, Seung-Whan

Issue Date:: 2019-08-06

Research Org.:: Ram Photonics, LLC, San Diego, CA (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 1568700

Patent Number(s):: 10371580

Application Number:: 15/903,489

Assignee:: Ram Photonics, LLC (San Diego, CA)

Patent Classifications (CPCs):: G - PHYSICS G01 - MEASURING G01J - MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

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G - PHYSICS G01 - MEASURING G01J - MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT
G01J2009/002 - {Wavefront phase distribution}
G01J9/0215 - {by shearing interferometric methods}

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
G03F7/706 - {Aberration measurement

G - PHYSICS G01 - MEASURING G01J - MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT
G01J9/02 - by interferometric methods

G - PHYSICS G01 - MEASURING G01B - MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS
G01B9/02 - Interferometers {for determining dimensional properties of, or relations between, measurement objects}

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DOE Contract Number:: FC52-08NA28302

Resource Type:: Patent

Resource Relation:: Patent File Date: 02/23/2018

Country of Publication:: United States

Language:: English

Subject:: 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS

Citation Formats


                    Bahk, Seung-Whan. Method and apparatus for wavefront sensing.  United States: N. p., 2019. 
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                    Bahk, Seung-Whan. Method and apparatus for wavefront sensing.  United States.

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                    Bahk, Seung-Whan. Tue .  
        "Method and apparatus for wavefront sensing".  United States.  https://www.osti.gov/servlets/purl/1568700.

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@article{osti_1568700,

  title        = {Method and apparatus for wavefront sensing},

  author       = {Bahk, Seung-Whan},

  abstractNote = {A method for performing optical wavefront sensing includes providing an amplitude transmission mask having a light input side, a light output side, and an optical transmission axis passing from the light input side to the light output side. The amplitude transmission mask is characterized by a checkerboard pattern having a square unit cell of size Λ. The method also includes directing an incident light field having a wavelength λ to be incident on the light input side and propagating the incident light field through the amplitude transmission mask. The method further includes producing a plurality of diffracted light fields on the light output side and detecting, at a detector disposed a distance L from the amplitude transmission mask, an interferogram associated with the plurality of diffracted light fields. The relation is satisfied, where n is an integer greater than zero.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2019},

  month        = {8}

}

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Works referenced in this record:

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Title: Method and apparatus for wavefront sensing

Abstract

Citation Formats

Optical pulse measurement using shearing interferometry, especially suitable for characterizing ultrashort pulses patent, October 2003

Complex index refraction tomography with sub λ/6-resolution patent, January 2015

Broadband ultrashort pulse measuring device using non-linear electronic components patent, February 2000

Method and apparatus for pattern analysis patent, November 1976

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Compact achromatic optical interferometer of the three-wave lateral shearing type patent, November 2010

Coded aperture imager comprising a coded diffractive mask patent, April 2011

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Frequency transform phase shifting interferometry patent, April 2005

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patent, October 2003

Complex index refraction tomography with sub λ/6-resolution
patent, January 2015

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patent, February 2000

Method and apparatus for pattern analysis
patent, November 1976

System and methods for wavefront measurement
patent, October 2008

Compact achromatic optical interferometer of the three-wave lateral shearing type
patent, November 2010

Coded aperture imager comprising a coded diffractive mask
patent, April 2011

Method for aligning first and second objects, relative to each other, and apparatus for practicing this method
patent, July 1989

Frequency transform phase shifting interferometry
patent, April 2005