Polishing slurry preventing agglomeration of charged colloids without loss of surface activity
Abstract
A method for chemically stabilizing polishing slurries in aqueous suspension to prevent their agglomeration while maintaining their surface activity is disclosed. The method prevents the formation of irreversible particle agglomerates during drying and permits the subsequent re-suspension of dried particles with no impact on the particle size distribution. The stabilization method can be customized based on knowledge of the colloid surface charge at suspension pH conditions, addition of a charged species having like charge to the colloid at the suspension conditions, and control of the concentrations of the charged species and other ions in suspension.
- Inventors:
- Issue Date:
- Research Org.:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1568321
- Patent Number(s):
- 10287457
- Application Number:
- 14/437,453
- Assignee:
- Lawrence Livermore National Security, LLC (Livermore, CA)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C09 - DYES C09G - POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH
B - PERFORMING OPERATIONS B24 - GRINDING B24B - MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
- DOE Contract Number:
- AC52-07NA27344
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 10/16/2013
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Dylia-Spears, Rebecca, Feit, Michael, Miller, Phillip E., Steele, William A., Suratwala, Tayyab I., and Wong, Lana L. Polishing slurry preventing agglomeration of charged colloids without loss of surface activity. United States: N. p., 2019.
Web.
Dylia-Spears, Rebecca, Feit, Michael, Miller, Phillip E., Steele, William A., Suratwala, Tayyab I., & Wong, Lana L. Polishing slurry preventing agglomeration of charged colloids without loss of surface activity. United States.
Dylia-Spears, Rebecca, Feit, Michael, Miller, Phillip E., Steele, William A., Suratwala, Tayyab I., and Wong, Lana L. Tue .
"Polishing slurry preventing agglomeration of charged colloids without loss of surface activity". United States. https://www.osti.gov/servlets/purl/1568321.
@article{osti_1568321,
title = {Polishing slurry preventing agglomeration of charged colloids without loss of surface activity},
author = {Dylia-Spears, Rebecca and Feit, Michael and Miller, Phillip E. and Steele, William A. and Suratwala, Tayyab I. and Wong, Lana L.},
abstractNote = {A method for chemically stabilizing polishing slurries in aqueous suspension to prevent their agglomeration while maintaining their surface activity is disclosed. The method prevents the formation of irreversible particle agglomerates during drying and permits the subsequent re-suspension of dried particles with no impact on the particle size distribution. The stabilization method can be customized based on knowledge of the colloid surface charge at suspension pH conditions, addition of a charged species having like charge to the colloid at the suspension conditions, and control of the concentrations of the charged species and other ions in suspension.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2019},
month = {5}
}
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