Long length high temperature superconducting wires with uniform ion implanted pinning microstructures

Title: Long length high temperature superconducting wires with uniform ion implanted pinning microstructures

Abstract

A method for producing a long length high temperature superconductor wire, includes providing a substrate, having a surface with a length of at least 50 meters and a width. The surface supports a biaxially textured high temperature superconducting layer and the biaxially textured high temperature superconducting layer has a length and a width corresponding to the length and width of the surface of the substrate. The method includes irradiating the biaxially textured high temperature superconductor layer with an ion beam impinging uniformly along the length and across the width of the biaxially textured high temperature superconductor layer to produce a uniform distribution of pinning microstructures in the biaxially textured high temperature superconductor layer.

Inventors:: Rupich, Martin W.; Sathyamurthy, Srivatsan; Li, Qiang; Solovyov, Vyacheslav F.

Issue Date:: 2019-03-26

Research Org.:: American Superconductor Corp., Devens, MA (United States); Brookhaven Science Associates, LLC, Upton, NY (United States)

Sponsoring Org.:: USDOE Advanced Research Projects Agency - Energy (ARPA-E)

OSTI Identifier:: 1568121

Patent Number(s):: 10242770

Application Number:: 15/246,739

Assignee:: American Superconductor Corporation (Ayer, MA); Brookhaven Science Associates, LLC (Upton, NY)

Patent Classifications (CPCs):: H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01B - CABLES

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES

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H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01B - CABLES
H01B12/04 - Single wire
H01B13/003 - {using irradiation}

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
H01L39/249 - {Treatment of superconductive layers by irradiation, e.g. ion-beam, electron-beam, laser beam, X-rays

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01B - CABLES
H01B13/0036 - {Details}

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
H01L39/2483 - {Introducing flux pinning centres}

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01B - CABLES
H01B13/0016 - {for heat treatment}

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DOE Contract Number:: AR0000190; SC0012704

Resource Type:: Patent

Resource Relation:: Patent File Date: 08/25/2016

Country of Publication:: United States

Language:: English

Citation Formats


                    Rupich, Martin W., Sathyamurthy, Srivatsan, Li, Qiang, and Solovyov, Vyacheslav F. Long length high temperature superconducting wires with uniform ion implanted pinning microstructures.  United States: N. p., 2019. 
        Web.

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                    Rupich, Martin W., Sathyamurthy, Srivatsan, Li, Qiang, & Solovyov, Vyacheslav F. Long length high temperature superconducting wires with uniform ion implanted pinning microstructures.  United States.

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                    Rupich, Martin W., Sathyamurthy, Srivatsan, Li, Qiang, and Solovyov, Vyacheslav F. Tue .  
        "Long length high temperature superconducting wires with uniform ion implanted pinning microstructures".  United States.  https://www.osti.gov/servlets/purl/1568121.

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@article{osti_1568121,

  title        = {Long length high temperature superconducting wires with uniform ion implanted pinning microstructures},

  author       = {Rupich, Martin W. and Sathyamurthy, Srivatsan and Li, Qiang and Solovyov, Vyacheslav F.},

  abstractNote = {A method for producing a long length high temperature superconductor wire, includes providing a substrate, having a surface with a length of at least 50 meters and a width. The surface supports a biaxially textured high temperature superconducting layer and the biaxially textured high temperature superconducting layer has a length and a width corresponding to the length and width of the surface of the substrate. The method includes irradiating the biaxially textured high temperature superconductor layer with an ion beam impinging uniformly along the length and across the width of the biaxially textured high temperature superconductor layer to produce a uniform distribution of pinning microstructures in the biaxially textured high temperature superconductor layer.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2019},

  month        = {3}

}

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Works referenced in this record:

Method for fabricating high aspect ratio structures in perovskite material
patent, October 2003

Karapetrov, Goran T.; Kwok, Wai-Kwong; Crabtree, George W.
US Patent Document 6,638,895
URL: http://patft.uspto.gov/netacgi/nph-Parser?patentnumber=6638895

Oxide films with nanodot flux pinning centers
patent-application, July 2005

Rupich, Martin W.; Kodenkandath, Thomas; Zhang, Wei
US Patent Application 10/758710; 20050159298
URL: http://appft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PG01&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.html&r=1&f=G&l=50&s1=%2220050159298%22.PGNR.&OS=DN/20050159298&RS=DN/20050159298

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Title: Long length high temperature superconducting wires with uniform ion implanted pinning microstructures

Abstract

Citation Formats

Method for fabricating high aspect ratio structures in perovskite material patent, October 2003

Oxide films with nanodot flux pinning centers patent-application, July 2005

Method for fabricating high aspect ratio structures in perovskite material
patent, October 2003

Oxide films with nanodot flux pinning centers
patent-application, July 2005