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Title: Atomic layer chemical patterns for block copolymer assembly

Abstract

Provided herein are methods of directed self-assembly (DSA) on atomic layer chemical patterns and related compositions. The atomic layer chemical patterns may be formed from two-dimensional materials such as graphene. The atomic layer chemical patterns provide high resolution, low defect directed self-assembly. For example, DSA on a graphene pattern can be used achieve ten times the resolution of DSA that is achievable on a three-dimensional pattern such as a polymer brush. Assembly of block copolymers on the atomic layer chemical patterns may also facilitate subsequent etch, as the atomic layer chemical patterns are easier to etch than conventional pattern materials.

Inventors:
; ; ; ; ;
Issue Date:
Research Org.:
Univ. of Chicago, IL (United States); Wisconsin Alumni Research Foundation, Madison, WI (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1532069
Patent Number(s):
9927706
Application Number:
15/215,016
Assignee:
The University of Chicago (Chicago, IL); Wisconsin Alumni Research Foundation (Madison, WI)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
C - CHEMISTRY C08 - ORGANIC MACROMOLECULAR COMPOUNDS C08K - Use of inorganic or non-macromolecular organic substances as compounding ingredients
DOE Contract Number:  
SC0006414
Resource Type:
Patent
Resource Relation:
Patent File Date: 2016-07-20
Country of Publication:
United States
Language:
English

Citation Formats

Nealey, Paul Franklin, Chang, Tzu-Hsuan, Xiong, Shisheng, Ma, Zhenqiang, Arnold, Michael Scott, and Jacobberger, Robert. Atomic layer chemical patterns for block copolymer assembly. United States: N. p., 2018. Web.
Nealey, Paul Franklin, Chang, Tzu-Hsuan, Xiong, Shisheng, Ma, Zhenqiang, Arnold, Michael Scott, & Jacobberger, Robert. Atomic layer chemical patterns for block copolymer assembly. United States.
Nealey, Paul Franklin, Chang, Tzu-Hsuan, Xiong, Shisheng, Ma, Zhenqiang, Arnold, Michael Scott, and Jacobberger, Robert. Tue . "Atomic layer chemical patterns for block copolymer assembly". United States. https://www.osti.gov/servlets/purl/1532069.
@article{osti_1532069,
title = {Atomic layer chemical patterns for block copolymer assembly},
author = {Nealey, Paul Franklin and Chang, Tzu-Hsuan and Xiong, Shisheng and Ma, Zhenqiang and Arnold, Michael Scott and Jacobberger, Robert},
abstractNote = {Provided herein are methods of directed self-assembly (DSA) on atomic layer chemical patterns and related compositions. The atomic layer chemical patterns may be formed from two-dimensional materials such as graphene. The atomic layer chemical patterns provide high resolution, low defect directed self-assembly. For example, DSA on a graphene pattern can be used achieve ten times the resolution of DSA that is achievable on a three-dimensional pattern such as a polymer brush. Assembly of block copolymers on the atomic layer chemical patterns may also facilitate subsequent etch, as the atomic layer chemical patterns are easier to etch than conventional pattern materials.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2018},
month = {3}
}

Works referenced in this record:

Method for Filling Holes with Metal Chalcogenide Material
patent-application, May 2008


Optimization of directed self-assembly hole shrink process with simplified model
journal, July 2014


Enabling nanotechnology with self assembled block copolymer patterns
journal, October 2003


Nanostructure and Optical Device Having Nanostructure
patent-application, May 2015


Block Copolymer Permeable Membrane with Visualized High-Density Straight Channels of Poly(ethylene oxide)
journal, February 2011


#-Dimensional Nanostructure Having Nanomaterials Stacked on Graphene Substrate and Fabrication Method Thereof
patent-application, May 2012


Two-Dimensional Materials and Uses Thereof
patent-application, November 2016


Device-oriented graphene nanopatterning by mussel-inspired directed block copolymer self-assembly
journal, December 2013


Optical Media Having Graphene Wear Protection Layers
patent-application, November 2013