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Title: Method for atomic layer deposition

Abstract

An atomic layer deposition method is disclosed for preparing polypeptides. The method comprises providing a solid-phase support comprising a reactive amine monolayer in an atomic layer deposition (ALD) chamber. The solid-phase support is contacted with a first protected amino acid substituted with a protecting group by atomic layer deposition, wherein the protecting group is bonded to a non-side chain amino group of the protected amino acid. A carboxylic acid group of the first protected amino acid is reacted with the reactive amine monolayer, thereby coupling the first protected amino acid to the solid-phase support to produce a coupled-product.

Inventors:
; ; ;
Issue Date:
Research Org.:
STC.UNM, Albuquerque, NM (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1531980
Patent Number(s):
9605344
Application Number:
14/917,566
Assignee:
STC.UNM (Albuquerque, NM)
Patent Classifications (CPCs):
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
DOE Contract Number:  
FA 9550-10-1-0054; FG02-02ER15368
Resource Type:
Patent
Resource Relation:
Patent File Date: 2014-09-12
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 59 BASIC BIOLOGICAL SCIENCES

Citation Formats

Jiang, Ying-Bing, Cecchi, Joseph L., Fu, Yaqin, and Brinker, C. Jeffrey. Method for atomic layer deposition. United States: N. p., 2017. Web.
Jiang, Ying-Bing, Cecchi, Joseph L., Fu, Yaqin, & Brinker, C. Jeffrey. Method for atomic layer deposition. United States.
Jiang, Ying-Bing, Cecchi, Joseph L., Fu, Yaqin, and Brinker, C. Jeffrey. Tue . "Method for atomic layer deposition". United States. https://www.osti.gov/servlets/purl/1531980.
@article{osti_1531980,
title = {Method for atomic layer deposition},
author = {Jiang, Ying-Bing and Cecchi, Joseph L. and Fu, Yaqin and Brinker, C. Jeffrey},
abstractNote = {An atomic layer deposition method is disclosed for preparing polypeptides. The method comprises providing a solid-phase support comprising a reactive amine monolayer in an atomic layer deposition (ALD) chamber. The solid-phase support is contacted with a first protected amino acid substituted with a protecting group by atomic layer deposition, wherein the protecting group is bonded to a non-side chain amino group of the protected amino acid. A carboxylic acid group of the first protected amino acid is reacted with the reactive amine monolayer, thereby coupling the first protected amino acid to the solid-phase support to produce a coupled-product.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2017},
month = {3}
}

Works referenced in this record:

[Microwave-Assisted Peptide Synthesis]
patent-application, December 2004


    Works referencing / citing this record: