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Title: Controlling the emissive properties of materials-improved lasers and upconversion materials

Abstract

Systems and methods for producing crystalline materials by atomic layer deposition, allowing for high control of localized doping. Such materials may be fibers or films suitable for use in optoelectronics and lasers.

Inventors:
; ; ; ;
Issue Date:
Research Org.:
Argonne National Laboratory (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1531869
Patent Number(s):
8518179
Application Number:
13/385,661
Assignee:
UChicago Argonne, LLC (Chicago, IL)
Patent Classifications (CPCs):
C - CHEMISTRY C04 - CEMENTS C04B - LIME, MAGNESIA
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
DOE Contract Number:  
AC02-06CH11357
Resource Type:
Patent
Resource Relation:
Patent File Date: 2012-02-29
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY

Citation Formats

Proslier, Thomas, Becker, Nicholas G., Pellin, Michael J., Klug, Jeffrey, and Elam, Jeffrey W. Controlling the emissive properties of materials-improved lasers and upconversion materials. United States: N. p., 2013. Web.
Proslier, Thomas, Becker, Nicholas G., Pellin, Michael J., Klug, Jeffrey, & Elam, Jeffrey W. Controlling the emissive properties of materials-improved lasers and upconversion materials. United States.
Proslier, Thomas, Becker, Nicholas G., Pellin, Michael J., Klug, Jeffrey, and Elam, Jeffrey W. Tue . "Controlling the emissive properties of materials-improved lasers and upconversion materials". United States. https://www.osti.gov/servlets/purl/1531869.
@article{osti_1531869,
title = {Controlling the emissive properties of materials-improved lasers and upconversion materials},
author = {Proslier, Thomas and Becker, Nicholas G. and Pellin, Michael J. and Klug, Jeffrey and Elam, Jeffrey W.},
abstractNote = {Systems and methods for producing crystalline materials by atomic layer deposition, allowing for high control of localized doping. Such materials may be fibers or films suitable for use in optoelectronics and lasers.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Aug 27 00:00:00 EDT 2013},
month = {Tue Aug 27 00:00:00 EDT 2013}
}

Works referenced in this record:

Low-Temperature Al2O3 Atomic Layer Deposition
journal, February 2004


Optical data storage medium with super resolution layer
patent-application, September 2005


Atomic layer deposition on fibrous materials
patent-application, May 2008


Controlled nano-doping of ultra thin films
patent, June 2009


Method for fabricating a Fe-Si based thin film, and Fe-Si based thin film
patent-application, October 2004