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Title: Method and apparatus for inducing turbulent flow of a processing chamber cleaning gas

Abstract

Embodiments of the invention generally relate to apparatus and methods for cleaning chamber components using a cleaning plate. The cleaning plate is adapted to be positioned on a substrate support during a cleaning process, and includes a plurality of turbulence-inducing structures. The turbulence-inducing structures induce a turbulent flow of cleaning gas while the cleaning plate is rotated during a cleaning process. The cleaning plate increases the retention time of the cleaning gas near the showerhead during cleaning. Additionally, the cleaning plate reduces concentration gradients within the cleaning plate to provide a more effective clean. The method includes positioning a cleaning plate adjacent to a showerhead, and introducing cleaning gas to the space between the showerhead and the cleaning plate. A material deposited on the surface of the showerhead is then heated and vaporized in the presence of the cleaning gas, and then exhausted from the processing chamber.

Inventors:
; ; ; ; ; ; ; ; ; ; ;
Issue Date:
Research Org.:
Applied Materials, Inc., Santa Clara, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1531781
Patent Number(s):
8,910,644
Application Number:
13/041,230
Assignee:
Applied Materials, Inc. (Santa Clara, CA)
DOE Contract Number:  
EE0003331
Resource Type:
Patent
Resource Relation:
Patent File Date: 2011-03-04
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY; 47 OTHER INSTRUMENTATION

Citation Formats

Chung, Hua, Dong, Xizi, Maung, Kyawwin Jason, Hanawa, Hiroji, Kang, Sang Won, Quach, David H., Olgado, Donald J. K., Bour, David, Hsu, Wei-Yung, Tam, Alexander, Chang, Anzhong, and Acharya, Sumedh. Method and apparatus for inducing turbulent flow of a processing chamber cleaning gas. United States: N. p., 2014. Web.
Chung, Hua, Dong, Xizi, Maung, Kyawwin Jason, Hanawa, Hiroji, Kang, Sang Won, Quach, David H., Olgado, Donald J. K., Bour, David, Hsu, Wei-Yung, Tam, Alexander, Chang, Anzhong, & Acharya, Sumedh. Method and apparatus for inducing turbulent flow of a processing chamber cleaning gas. United States.
Chung, Hua, Dong, Xizi, Maung, Kyawwin Jason, Hanawa, Hiroji, Kang, Sang Won, Quach, David H., Olgado, Donald J. K., Bour, David, Hsu, Wei-Yung, Tam, Alexander, Chang, Anzhong, and Acharya, Sumedh. Tue . "Method and apparatus for inducing turbulent flow of a processing chamber cleaning gas". United States. https://www.osti.gov/servlets/purl/1531781.
@article{osti_1531781,
title = {Method and apparatus for inducing turbulent flow of a processing chamber cleaning gas},
author = {Chung, Hua and Dong, Xizi and Maung, Kyawwin Jason and Hanawa, Hiroji and Kang, Sang Won and Quach, David H. and Olgado, Donald J. K. and Bour, David and Hsu, Wei-Yung and Tam, Alexander and Chang, Anzhong and Acharya, Sumedh},
abstractNote = {Embodiments of the invention generally relate to apparatus and methods for cleaning chamber components using a cleaning plate. The cleaning plate is adapted to be positioned on a substrate support during a cleaning process, and includes a plurality of turbulence-inducing structures. The turbulence-inducing structures induce a turbulent flow of cleaning gas while the cleaning plate is rotated during a cleaning process. The cleaning plate increases the retention time of the cleaning gas near the showerhead during cleaning. Additionally, the cleaning plate reduces concentration gradients within the cleaning plate to provide a more effective clean. The method includes positioning a cleaning plate adjacent to a showerhead, and introducing cleaning gas to the space between the showerhead and the cleaning plate. A material deposited on the surface of the showerhead is then heated and vaporized in the presence of the cleaning gas, and then exhausted from the processing chamber.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2014},
month = {12}
}

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Works referenced in this record:

Gas distributor having directed gas flow and cleaning method
patent, October 2008


In situ plasma clean gas injection
patent, August 2001


Wafer probe plate holder
patent, October 1991