Method and apparatus for inducing turbulent flow of a processing chamber cleaning gas
Abstract
Embodiments of the invention generally relate to apparatus and methods for cleaning chamber components using a cleaning plate. The cleaning plate is adapted to be positioned on a substrate support during a cleaning process, and includes a plurality of turbulence-inducing structures. The turbulence-inducing structures induce a turbulent flow of cleaning gas while the cleaning plate is rotated during a cleaning process. The cleaning plate increases the retention time of the cleaning gas near the showerhead during cleaning. Additionally, the cleaning plate reduces concentration gradients within the cleaning plate to provide a more effective clean. The method includes positioning a cleaning plate adjacent to a showerhead, and introducing cleaning gas to the space between the showerhead and the cleaning plate. A material deposited on the surface of the showerhead is then heated and vaporized in the presence of the cleaning gas, and then exhausted from the processing chamber.
- Inventors:
- Issue Date:
- Research Org.:
- Applied Materials, Inc., Santa Clara, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1531781
- Patent Number(s):
- 8910644
- Application Number:
- 13/041,230
- Assignee:
- Applied Materials, Inc. (Santa Clara, CA)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B08 - CLEANING B08B - CLEANING IN GENERAL
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
- DOE Contract Number:
- EE0003331
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2011-03-04
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY; 47 OTHER INSTRUMENTATION
Citation Formats
Chung, Hua, Dong, Xizi, Maung, Kyawwin Jason, Hanawa, Hiroji, Kang, Sang Won, Quach, David H., Olgado, Donald J. K., Bour, David, Hsu, Wei-Yung, Tam, Alexander, Chang, Anzhong, and Acharya, Sumedh. Method and apparatus for inducing turbulent flow of a processing chamber cleaning gas. United States: N. p., 2014.
Web.
Chung, Hua, Dong, Xizi, Maung, Kyawwin Jason, Hanawa, Hiroji, Kang, Sang Won, Quach, David H., Olgado, Donald J. K., Bour, David, Hsu, Wei-Yung, Tam, Alexander, Chang, Anzhong, & Acharya, Sumedh. Method and apparatus for inducing turbulent flow of a processing chamber cleaning gas. United States.
Chung, Hua, Dong, Xizi, Maung, Kyawwin Jason, Hanawa, Hiroji, Kang, Sang Won, Quach, David H., Olgado, Donald J. K., Bour, David, Hsu, Wei-Yung, Tam, Alexander, Chang, Anzhong, and Acharya, Sumedh. Tue .
"Method and apparatus for inducing turbulent flow of a processing chamber cleaning gas". United States. https://www.osti.gov/servlets/purl/1531781.
@article{osti_1531781,
title = {Method and apparatus for inducing turbulent flow of a processing chamber cleaning gas},
author = {Chung, Hua and Dong, Xizi and Maung, Kyawwin Jason and Hanawa, Hiroji and Kang, Sang Won and Quach, David H. and Olgado, Donald J. K. and Bour, David and Hsu, Wei-Yung and Tam, Alexander and Chang, Anzhong and Acharya, Sumedh},
abstractNote = {Embodiments of the invention generally relate to apparatus and methods for cleaning chamber components using a cleaning plate. The cleaning plate is adapted to be positioned on a substrate support during a cleaning process, and includes a plurality of turbulence-inducing structures. The turbulence-inducing structures induce a turbulent flow of cleaning gas while the cleaning plate is rotated during a cleaning process. The cleaning plate increases the retention time of the cleaning gas near the showerhead during cleaning. Additionally, the cleaning plate reduces concentration gradients within the cleaning plate to provide a more effective clean. The method includes positioning a cleaning plate adjacent to a showerhead, and introducing cleaning gas to the space between the showerhead and the cleaning plate. A material deposited on the surface of the showerhead is then heated and vaporized in the presence of the cleaning gas, and then exhausted from the processing chamber.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2014},
month = {12}
}
Works referenced in this record:
Gas distributor having directed gas flow and cleaning method
patent, October 2008
- Murugesh, Laxman; Krishnaraj, Padmanabhan; Dunham, Carl A.
- US Patent Document 7,431,772
Systems and methods for remote plasma clean
patent-application, February 2002
- Selbrede, Steven C.; Mackie, Neil M.; Zucker, Martin L.
- US Patent Application 09/896283; 20020020429
Container-Grater for a Friable Food Product
patent-application, November 2007
- Bisio, Stefano
- US Patent Application 11/667609; 20070267528
Substrate Treatment Equipment and Method of Treating Substrate Using the Same
patent-application, March 2012
- Oh, Jung-min; Lee, Kun-tack; Lee, Hyo-san
- US Patent Application 13/225696; 20120064727
In situ plasma clean gas injection
patent, August 2001
- Wing, James C.; McInerney, Edward J.
- US Patent Document 6,277,235
Chemical vapor deposition apparatus
patent-application, March 2007
- Ohori, Tatsuya; Shiina, Kazushige; Iyechika, Yasushi
- US Patent Application 11/514927; 20070051316
Wafer backside plate for use in a spin, rinse, and dry module and methods for making and implementing the same
patent, August 2006
- Smith, Stephen M.; Treur, Randolph E.
- US Patent Document 7,087,122
Plasma processing apparatus
patent-application, September 2003
- Saito, Susumu; Sugiyama, Norikazu
- US Patent Application 10/384520; 20030173029