Nano-sized silicon
Abstract
A method includes combining fumed silicon oxide with a metal to form silicon having an average particle size of less than approximately 100 nm. The silicon can be incorporated into an anode of a lithium ion cell.
- Inventors:
- Issue Date:
- Research Org.:
- Tiax LLC, Lexington, MA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1531763
- Patent Number(s):
- 8268481
- Application Number:
- 12/207,821
- Assignee:
- Tiax LLC (Lexington, MA)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01M - PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- DOE Contract Number:
- FG02-06ER84580
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2008-09-10
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Treger, Jack. Nano-sized silicon. United States: N. p., 2012.
Web.
Treger, Jack. Nano-sized silicon. United States.
Treger, Jack. Tue .
"Nano-sized silicon". United States. https://www.osti.gov/servlets/purl/1531763.
@article{osti_1531763,
title = {Nano-sized silicon},
author = {Treger, Jack},
abstractNote = {A method includes combining fumed silicon oxide with a metal to form silicon having an average particle size of less than approximately 100 nm. The silicon can be incorporated into an anode of a lithium ion cell.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2012},
month = {9}
}
Save to My Library
You must Sign In or Create an Account in order to save documents to your library.
Works referenced in this record:
Anode active material, method of preparing the same, and anode and lithium battery containing the material
patent-application, June 2006
- Im, Dong-min; Song, Mi-jeong; Park, Jin-hwan
- US Patent Application 11/219775; 20060134516
Lithium secondary battery
patent-application, December 2006
- Fujikawa, Masato; Kasamatsu, Shinji; Nishino, Hajime
- US Patent Application 11/339617; 20060286439
Works referencing / citing this record:
Processes for producing silicon
patent, November 2018
- Gigler, Peter; Stohrer, Juergen
- US Patent Document 10,118,829