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Title: Lift-off patterning processes employing energetically-stimulated local removal of solid-condensed-gas layers

Abstract

The invention provides a method for forming a patterned material layer on a structure, by condensing a vapor to a solid condensate layer on a surface of the structure and then localized removal of selected regions of the condensate layer by directing an ion beam at the selected regions, exposing the structure at the selected regions. A material layer is then deposited on top of the solid condensate layer and the exposed structure at the selected regions. Then the solid condensate layer and regions of the material layer that were deposited on the solid condensate layer are removed, leaving a patterned material layer on the structure.

Inventors:
; ; ; ;
Issue Date:
Research Org.:
Harvard Univ., Cambridge, MA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1531744
Patent Number(s):
8221595
Application Number:
12/381,502
Assignee:
President and Fellows of Harvard College (Cambridge, MA)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
DOE Contract Number:  
FG02-01ER45922
Resource Type:
Patent
Resource Relation:
Patent File Date: 2009-03-12
Country of Publication:
United States
Language:
English

Citation Formats

Branton, Daniel, Golovchenko, Jene A., King, Gavin M, MoberlyChan, Warren J, and Schurmann, Gregor M. Lift-off patterning processes employing energetically-stimulated local removal of solid-condensed-gas layers. United States: N. p., 2012. Web.
Branton, Daniel, Golovchenko, Jene A., King, Gavin M, MoberlyChan, Warren J, & Schurmann, Gregor M. Lift-off patterning processes employing energetically-stimulated local removal of solid-condensed-gas layers. United States.
Branton, Daniel, Golovchenko, Jene A., King, Gavin M, MoberlyChan, Warren J, and Schurmann, Gregor M. Tue . "Lift-off patterning processes employing energetically-stimulated local removal of solid-condensed-gas layers". United States. https://www.osti.gov/servlets/purl/1531744.
@article{osti_1531744,
title = {Lift-off patterning processes employing energetically-stimulated local removal of solid-condensed-gas layers},
author = {Branton, Daniel and Golovchenko, Jene A. and King, Gavin M and MoberlyChan, Warren J and Schurmann, Gregor M},
abstractNote = {The invention provides a method for forming a patterned material layer on a structure, by condensing a vapor to a solid condensate layer on a surface of the structure and then localized removal of selected regions of the condensate layer by directing an ion beam at the selected regions, exposing the structure at the selected regions. A material layer is then deposited on top of the solid condensate layer and the exposed structure at the selected regions. Then the solid condensate layer and regions of the material layer that were deposited on the solid condensate layer are removed, leaving a patterned material layer on the structure.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jul 17 00:00:00 EDT 2012},
month = {Tue Jul 17 00:00:00 EDT 2012}
}

Works referenced in this record:

"Sputtering" of Ice by MeV Light Ions
journal, April 1978


Linear and Nonlinear Processes in the Erosion of H 2 O Ice by Fast Light Ions
journal, November 1980


Growth of Dielectric Thin Films by Irradiation of Condensed Molecular Precursors with Synchrotron Radiation
journal, January 1992


Dry process for the production of microelectronic devices
patent, September 1982


Supercooled and glassy water
journal, October 2003


Novolak resin blends for photoresist applications
patent, December 1994


Dry etching method
patent, March 1993


Thickness dependent crystallization kinetics of sub-micron amorphous solid water films
journal, March 2003


Amorphous Water
journal, June 2004


Three dimensional imaging system
patent, January 2000


Nanolithography using field emission and conventional thermionic electron sources
journal, April 1989


Lift-off patterning processes employing energetically-stimulated local removal of solid-condensed-gas layers
patent-application, July 2009


Methods for modifying surfaces
patent-application, June 2007


Method for producing high quality thin layer films on substrates
patent, April 1994


Nanometer Patterning with Ice
journal, June 2005


Device and method for accurate etching and removal of thin film
patent, February 1994


Sublimation of vapor-deposited water ice below 170 K, and its dependence on growth conditions
journal, October 1993


On the mechanism of formation of amorphous condensates from the vapour phase (I). General theory
journal, October 1974


Dependence of the dissolution characteristics of As2S3 as a photoresist on the condensation rate and evaporation temperature
journal, May 1989


Etching of Si through a thick condensed XeF[sub 2] layer
journal, January 2000

  • Sebel, P. G. M.; Hermans, L. J. F.; Beijerinck, H. C. W.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 18, Issue 5
  • https://doi.org/10.1116/1.1288194

Carbon nanotube synthesis for nanopore devices
patent-application, May 2009


Method of manufacturing devices having superlattice structures
patent, January 1991