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Title: Material deposition techniques for control of solid state aperture surface properties

Abstract

The invention provides a method for molecular analysis. In the method, sidewalls are formed extending through a structure between two structure surfaces, to define an aperture. A layer of material is deposited on the aperture sidewalls and the two structure surfaces. The aperture with the deposited material layer is then configured in a liquid solution with a gradient in a chemical potential, between the two structure surfaces defining the aperture, that is sufficient to cause molecular translocation through the aperture.

Inventors:
; ; ; ; ;
Issue Date:
Research Org.:
Harvard Univ., Cambridge, MA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1531739
Patent Number(s):
8206568
Application Number:
11/015,349
Assignee:
President and Fellows of Harvard College (Cambridge, MA)
Patent Classifications (CPCs):
G - PHYSICS G01 - MEASURING G01N - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
DOE Contract Number:  
FG02-01ER45922
Resource Type:
Patent
Resource Relation:
Patent File Date: 2004-12-17
Country of Publication:
United States
Language:
English

Citation Formats

Branton, Daniel, Gordon, Roy G., Chen, Peng, Mitsui, Toshiyuki, Farmer, Damon B., and Golovchenko, Jene A.. Material deposition techniques for control of solid state aperture surface properties. United States: N. p., 2012. Web.
Branton, Daniel, Gordon, Roy G., Chen, Peng, Mitsui, Toshiyuki, Farmer, Damon B., & Golovchenko, Jene A.. Material deposition techniques for control of solid state aperture surface properties. United States.
Branton, Daniel, Gordon, Roy G., Chen, Peng, Mitsui, Toshiyuki, Farmer, Damon B., and Golovchenko, Jene A.. Tue . "Material deposition techniques for control of solid state aperture surface properties". United States. https://www.osti.gov/servlets/purl/1531739.
@article{osti_1531739,
title = {Material deposition techniques for control of solid state aperture surface properties},
author = {Branton, Daniel and Gordon, Roy G. and Chen, Peng and Mitsui, Toshiyuki and Farmer, Damon B. and Golovchenko, Jene A.},
abstractNote = {The invention provides a method for molecular analysis. In the method, sidewalls are formed extending through a structure between two structure surfaces, to define an aperture. A layer of material is deposited on the aperture sidewalls and the two structure surfaces. The aperture with the deposited material layer is then configured in a liquid solution with a gradient in a chemical potential, between the two structure surfaces defining the aperture, that is sufficient to cause molecular translocation through the aperture.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2012},
month = {6}
}

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