Photo-definable self-assembled materials
Abstract
The present invention provides a mesoporous material comprising at least one region of mesoporous material patterned at a lithographic scale. The present invention also provides a method for forming a patterned mesoporous material comprising: coating a sol on a substrate to form a film, the sol comprising: at least one photoactivator generator, at least one material capable of being sol-gel processed; and exposing the film to light to form a patterned mesoporous material.
- Inventors:
- Issue Date:
- Research Org.:
- STC.UNM, Albuquerque, NM (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1531549
- Patent Number(s):
- 7332264
- Application Number:
- 10/373,565
- Assignee:
- STC.UNM (Albuquerque, NM)
- Patent Classifications (CPCs):
-
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- BF-4277
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2003-02-26
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Doshi, Dhaval, Fan, Hongyou, Huesing, Nicola, Hurd, Alan, and Brinker, Charles Jeffrey. Photo-definable self-assembled materials. United States: N. p., 2008.
Web.
Doshi, Dhaval, Fan, Hongyou, Huesing, Nicola, Hurd, Alan, & Brinker, Charles Jeffrey. Photo-definable self-assembled materials. United States.
Doshi, Dhaval, Fan, Hongyou, Huesing, Nicola, Hurd, Alan, and Brinker, Charles Jeffrey. Tue .
"Photo-definable self-assembled materials". United States. https://www.osti.gov/servlets/purl/1531549.
@article{osti_1531549,
title = {Photo-definable self-assembled materials},
author = {Doshi, Dhaval and Fan, Hongyou and Huesing, Nicola and Hurd, Alan and Brinker, Charles Jeffrey},
abstractNote = {The present invention provides a mesoporous material comprising at least one region of mesoporous material patterned at a lithographic scale. The present invention also provides a method for forming a patterned mesoporous material comprising: coating a sol on a substrate to form a film, the sol comprising: at least one photoactivator generator, at least one material capable of being sol-gel processed; and exposing the film to light to form a patterned mesoporous material.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2008},
month = {2}
}
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Photo-definable self-assembled materials
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