Methods for forming composite coatings on MEMS devices

Title: Methods for forming composite coatings on MEMS devices

Abstract

The present invention provides unique methods of coating and novel coatings for MEMS devices. In general a two step process includes the coating of a first silane onto a substrate surface followed by a second treatment with or without a second silane and elevated temperatures.

Inventors:: Zhu, Xiaoyang

Issue Date:: 2007-04-10

Research Org.:: MicroSurfaces, Inc., Minneapolis, MN (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 1531525

Patent Number(s):: 7,201,937

Application Number:: 10/641,547

Assignee:: MicroSurfaces, Inc. (Minneapolis, MN)

DOE Contract Number:: BE-7471

Resource Type:: Patent

Resource Relation:: Patent File Date: 2003-08-15

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY

Citation Formats


                    Zhu, Xiaoyang. Methods for forming composite coatings on MEMS devices.  United States: N. p., 2007. 
        Web.

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                    Zhu, Xiaoyang. Methods for forming composite coatings on MEMS devices.  United States.

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                    Zhu, Xiaoyang. Tue .  
        "Methods for forming composite coatings on MEMS devices".  United States.  https://www.osti.gov/servlets/purl/1531525.

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@article{osti_1531525,

  title        = {Methods for forming composite coatings on MEMS devices},

  author       = {Zhu, Xiaoyang},

  abstractNote = {The present invention provides unique methods of coating and novel coatings for MEMS devices. In general a two step process includes the coating of a first silane onto a substrate surface followed by a second treatment with or without a second silane and elevated temperatures.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2007},

  month        = {4}

}

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Works referenced in this record:

Process for the photochemical vapor deposition of siloxane polymers
patent, November 1988

Leyden, Richard N.; Hall, James T.
US Patent Document 4,781,942
URL: http://patft.uspto.gov/netacgi/nph-Parser?patentnumber=4781942

Method of applying a monolayer lubricant to micromachines
patent, April 1995

Alley, Rodney L.; Howe, Roger T.; Komyopoulos, Kyriakos
US Patent Document 5,403,665
URL: http://patft.uspto.gov/netacgi/nph-Parser?patentnumber=5403665

Methods of forming microstructure devices
patent, June 2003

Leung, Toi Yue Becky; Chinn, Jeffrey D.
US Patent Document 6,576,489
URL: http://patft.uspto.gov/netacgi/nph-Parser?patentnumber=6576489

Process for wafer level treatment to reduce stiction and passivate micromachined surfaces and compounds used therefor
patent, January 2004

Martin, John R.
US Patent Document 6,674,140
URL: http://patft.uspto.gov/netacgi/nph-Parser?patentnumber=6674140

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Similar Records

Title: Methods for forming composite coatings on MEMS devices

Abstract

Citation Formats

Process for the photochemical vapor deposition of siloxane polymers patent, November 1988

Method of applying a monolayer lubricant to micromachines patent, April 1995

Methods of forming microstructure devices patent, June 2003

Process for wafer level treatment to reduce stiction and passivate micromachined surfaces and compounds used therefor patent, January 2004

Process for the photochemical vapor deposition of siloxane polymers
patent, November 1988

Method of applying a monolayer lubricant to micromachines
patent, April 1995

Methods of forming microstructure devices
patent, June 2003

Process for wafer level treatment to reduce stiction and passivate micromachined surfaces and compounds used therefor
patent, January 2004