Methods for forming composite coatings on MEMS devices
Abstract
The present invention provides unique methods of coating and novel coatings for MEMS devices. In general a two step process includes the coating of a first silane onto a substrate surface followed by a second treatment with or without a second silane and elevated temperatures.
- Inventors:
- Issue Date:
- Research Org.:
- MicroSurfaces, Inc., Minneapolis, MN (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1531525
- Patent Number(s):
- 7201937
- Application Number:
- 10/641,547
- Assignee:
- MicroSurfaces, Inc. (Minneapolis, MN)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B81 - MICROSTRUCTURAL TECHNOLOGY B81C - PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
B - PERFORMING OPERATIONS B05 - SPRAYING OR ATOMISING IN GENERAL B05D - PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
- DOE Contract Number:
- BE-7471
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2003-08-15
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY
Citation Formats
Zhu, Xiaoyang. Methods for forming composite coatings on MEMS devices. United States: N. p., 2007.
Web.
Zhu, Xiaoyang. Methods for forming composite coatings on MEMS devices. United States.
Zhu, Xiaoyang. Tue .
"Methods for forming composite coatings on MEMS devices". United States. https://www.osti.gov/servlets/purl/1531525.
@article{osti_1531525,
title = {Methods for forming composite coatings on MEMS devices},
author = {Zhu, Xiaoyang},
abstractNote = {The present invention provides unique methods of coating and novel coatings for MEMS devices. In general a two step process includes the coating of a first silane onto a substrate surface followed by a second treatment with or without a second silane and elevated temperatures.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2007},
month = {4}
}
Works referenced in this record:
Process for the photochemical vapor deposition of siloxane polymers
patent, November 1988
- Leyden, Richard N.; Hall, James T.
- US Patent Document 4,781,942
Method of applying a monolayer lubricant to micromachines
patent, April 1995
- Alley, Rodney L.; Howe, Roger T.; Komyopoulos, Kyriakos
- US Patent Document 5,403,665
Method of coating micro-electromechanical devices
patent-application, February 2004
- Yang, Zhihao
- US Patent Application 10/225846; 20040037956
Materials and methods for forming hybrid organic-inorganic anti-stiction materials for micro-electromechanical systems
patent-application, January 2004
- Reid, Jason S.; Viswanathan, Nungavram S.
- US Patent Application 10/453933; 20040012061
Molecular Orientation and Grafting Density in Semifluorinated Self-Assembled Monolayers of Mono-, Di-, and Trichloro Silanes on Silica Substrates
journal, November 2002
- Genzer, Jan; Efimenko, Kirill; Fischer, Daniel A.
- Langmuir, Vol. 18, Issue 24
Methods of forming microstructure devices
patent, June 2003
- Leung, Toi Yue Becky; Chinn, Jeffrey D.
- US Patent Document 6,576,489
Surface processes in MEMS technology
journal, January 1998
- Maboudian, R.
- Surface Science Reports, Vol. 30, Issue 6-8
The Impact of Solution Agglomeration on the Deposition of Self-Assembled Monolayers
journal, October 2000
- Bunker, B. C.; Carpick, R. W.; Assink, R. A.
- Langmuir, Vol. 16, Issue 20
Methods for forming coatings on MEMS devices
patent-application, April 2004
- Zhu, Xiaoyang; Jun, Yongseok; Yan, Hongwei
- US Patent Application 10/269682; 20040071863
Adhesion hysteresis of silane coated microcantilevers
journal, December 2000
- de Boer, M. P.; Knapp, J. A.; Michalske, T. A.
- Acta Materialia, Vol. 48, Issue 18-19
Self-Assembly Is Not the Only Reaction Possible between Alkyltrichlorosilanes and Surfaces: Monomolecular and Oligomeric Covalently Attached Layers of Dichloro- and Trichloroalkylsilanes on Silicon
journal, September 2000
- Fadeev, Alexander Y.; McCarthy, Thomas J.
- Langmuir, Vol. 16, Issue 18
Process for wafer level treatment to reduce stiction and passivate micromachined surfaces and compounds used therefor
patent, January 2004
- Martin, John R.
- US Patent Document 6,674,140